Patent EP0568993A2 successfully refreshed from Google Patents.
EP0568993A2
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Chemical amplification resist composition
Assignee: KH Neochem Co Ltd
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Filing: 1993-05-05
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Granted: —
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Expires: 2013-05-05
Abstract
Abstract There is described a chemical amplification resist composition which comprises squarylium compounds represented by the formula (I): wherein R 1 and R 2 are the same or different and represent substituted or unsubstituted aminophenyl, 9-julodidyl, Y=CH-(wherein Y represents substituted or unsubstituted heterocyclic group containing nitrogen ),or a group: (wherein Z 1 and Z 2 are the same or different and represent substituted or unsubstituted phenyl), photochemical acid generator and binders.
Inventors
- 👤 Tsuguo Yamaoka
- 👤 Kenichi Koseki
- 👤 Mitsuharu Obara
- 👤 Ikuo Shimizu
- 👤 Yukiyoshi Ito
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-24 19:12
CPC Classifications
C; C08; C08F; C08F2/00; C08F2/46; C08F2/48; C08F2/50; G; G03; G03F; G03F7/00; G03F7/004; G03F7/0045; G03F7/027; G03F7/028; G03F7/031; G03F7/038; G03F7/0382; G03F7/039; G03F7/0392; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/114; Y10S430/115; Y10S430/12; Y10S430/121
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
68 words
A chemical amplification resist composition which comprises squarylium compounds represented by the formula (I): wherein R 1 and R 2 are the same or different and represent substituted or unsubstituted aminophenyl, 9- julolidyl, Y=CH-(wherein Y represents substituted or unsubstituted heterocyclic group containing nitrogen), or a group: (wherein Z 1 and Z 2 are the same or different and represent substituted or unsubstituted phenyl), photochemical acid generator and binders.
Claim 2
Dependent Claim
68 words
A chemical amplification resist composition which comprises squarylium compounds represented by the formula (I): wherein R 1 and R 2 are the same or different and represent substituted or unsubstituted aminophenyl, 9- julolidyl, Y=CH-(wherein Y represents substituted or unsubstituted heterocyclic group containing nitrogen), or a group: (wherein Z 1 and Z 2 are the same or different and represent substituted or unsubstituted phenyl), photochemical acid generator and binders.
Claim 3
Dependent Claim
137 words
The chemical amplification resist composition according to claim 1, wherein the aminophenyl group, phenyl group and 9-julolidyl group are optionally substituted with the same or different one to three substituents selected from alkyl having 1 to 6 carbon atoms, alkoxy having 1 to 6 carbon atoms, aryl having 6 to 10 carbon atoms, aralkyl having 7 to 10 carbon atoms, halogen, nitro, hydroxy and amino, and the heterocyclic group containing nitrogen is selected from indolin-2-ylidene, benz[e]indolin-2-ylidene, 2-benzothiazolinylidene, naphtho[2,1-d]thiazol-2(3H)-ylidene, naphtho[1,2-d]thiazoI-2(1 H)-ylidene, 1,4-dihydroquinolin-4-ylidene,1,2-dihydroquinolin-2-ylidene, 2,3-dihydro-1 H-imidazo[4,5-b]-quinoxalin-2-ylidene and 2-benzoselenazolinylidene, said heterocyclic group containing nitrogen being optionally substituted with the same or different one to three substituents selected from alkyl having 1 to 6 carbon atoms, alkoxy having 1 to 6 carbon atoms, aryl having 6 to 10 carbon atoms, aralkyl having 7 to 10 carbon atoms, halogen, nitro, hydroxy and amino.
Claim 4
Dependent Claim
15 words
The chemical amplification resist composition according to claim 1, the squarylium compound is selected from
Claim 7
Dependent Claim
45 words
The chemical amplification resist composition according to any of claims 1 to 3, wherein the photochemical acid generator is selected from s-triazine compounds substituted with at least one trihalomethyl groups, iron-arene complexes, onium salt, aryldiazonium salt, diazoketones, o-nitrobenzyl ester, sulfonic acid ester and silanol-aluminium complex.
Claim 8
Dependent Claim
25 words
The chemical amplification resist composition according to claim 4, wherein the optical acid producing agent is s-triazine compound substituted with at least one trihalomethyl groups.
Claim 9
Dependent Claim
27 words
The chemical amplification resist composition according to claim 5, wherein the s-triazine compound substituted with at least one trihalomethyl groups is selected from 2,4,6-tris(trichloromethyl)-s-triazine, 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine and 2-(4-methoxy-1-naphthalenyl)-4,6-bis-(trichloromethyl)-s-triazine.
Claim 10
Dependent Claim
31 words
The chemical amplification resist composition according to any of claims 4 to 6, wherein the ion-allene compound is a salt of PF 68 of (η 6 -isopropylbenzene) (η 5 -cyclopentadienyl)iron (II).
Claim 11
Dependent Claim
33 words
The chemical amplification resist composition according to any of claims 4 to 7, wherein the onium salt is selected from diaryliodonium salt, triarylsulfonium salt, triarylselenonium salt, dialkylphenacylsulfonium salt, dialkyl-4-hydroxyphenylsulfonium salt and iodonium salt.
Claim 12
Dependent Claim
22 words
The chemical amplification resist composition according to any of claims 4 to 8, wherein the o-nitrobenzyl ester is 9,1 0-diethoxyanthracen-2-sulfonic acid-p-nitrobenzyl ester.
Claim 13
Dependent Claim
25 words
The chemical amplification resist composition according to any of claims 4 to 9, wherein the sulfonic ester is selected from a-hydroxymethylbenzoinsulfonic acid ester and N-hydroxyimidosulfonate.
Claim 14
Dependent Claim
135 words
The chemical amplification resist composition according to any of claims 1 to 10, wherein the binder is selected from acrylic acid or ester thereof, methacrylic acid or ester thereof, (anhydrous) maleic acid or ester thereof, acrylonitrile, styrene, a-alkylstyrene, a-acetoxystyrene,hydroxystyrene, a-alkylhydrox- ystyrene, a-acetoxyhydroxystyrene, or the substituted compounds obtained by protecting the hydroxy groups of the above compounds with a protecting group easily hydrolyzable by acid treatment, or cyclic analogues thereof, vinyl acetate, vinyl chloride, vinylidene chloride, butadiene, crotonic acid, itaconic acid, N-substituted maleimide, vinyl benzoate, or copolymer of the above esters, polyethylene oxide, polyvinyl pyrrolidone, polyamide, polyurethane, polyethylene terephtalate, acetyl cellulose, methyl cellulose, ethyl cellulose, polyvinyl butyrate, chlorinated polyolefine, polyalkylene, polyaldehyde, polycarbonate, epoxy resin, cresol novolak resin, melamine resin, alkyd resin, modified polyvinyl alcohol, and block or graft copolymer or modified polymer by combination of them.
References Cited (Backward Citations)
No citation records indexed.
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