Patent EP0515079A1 successfully refreshed from Google Patents.
EP0515079A1
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EP
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Resist materials and processes of their use
Assignee: AT&T Inc
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Filing: 1992-05-12
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Granted: —
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Expires: 2012-05-12
Abstract
Abstract Resist materials sensitive to actinic radiation are formed from an acid generator and a material sensitive to acid. The acid from the acid generator interacts with the acid sensitive material to produce a change in solubility. Particularly useful acid generators included benzyl and naphthylmethyl sulfones.
Inventors
- 👤 James Edward Hanson
- 👤 Anthony Edward Novembre
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-01 07:18
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/0045; G03F7/26; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/114; Y10S430/122
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
104 words
A process for fabricating a device, said process comprising the steps of forming a resist layer on a device substrate, exposing said resist to actinic radiation in a desired pattern or relief, and developing said pattern, wherein said resist comprises an acid generating material that generates an acid upon said exposure to induce a solubility change in said resist characterized in that said acid generating material comprises a composition represented by the formula: where x is either zero or one; A is an aromatic cyclic, a carbonyl, or cyano moiety, and R₁, R₂, R₃, and R₅ are chosen so that said acid is stable.
Claim 2
Dependent Claim
14 words
The process of claim 1 wherein R₁, R₂, R₃ and R₅ are all hydrogen.
Claim 3
Dependent Claim
11 words
The process of claim 1 wherein A is phenyl or naphthyl.
Claim 4
Dependent Claim
15 words
The process of claim 3 wherein R₄ or R₆ substituents on A is a halogen.
Claim 5
Dependent Claim
14 words
The process of claim 3 wherein R₄ or R₆ substituents on A is methoxy.
Claim 6
Dependent Claim
31 words
The process of claim 1 wherein R₄ or R₆ substituents on A is chosen to be acid labile so that an acid generating material also functions as said acid sensitive material.
Claim 7
Dependent Claim
21 words
The process of claim 1 wherein R₁, R₂, R₃ and R₅ are individually either hydrogen, lower alkyl, or substituted lower alkyl.
Claim 8
Dependent Claim
23 words
The process of claim 1 wherein R₄ or R₆ substituents on A are chosen to yield desired radiation sensitivity, solubility, or reactivity properties.
Claim 9
Dependent Claim
14 words
The process of claim 1 wherein said acid interacts with an acid sensitive material.
References Cited (Backward Citations)
DE3813722A1
Cited
EP0330386A2
Cited
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