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EP0508748A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Wafer centering system

Assignee: Eaton Corp
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Filing: 1992-04-08
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Granted: —
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Expires: 2012-04-08
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Abstract

Abstract A system for positioning a wafer (12) at a station within a wafer processing system such that the center of mass of the wafer coincides with the center of the rotatable chuck (22) at the station. A signal representative of the position of the wafer with respect to the rotatable chuck is produced by a sensor (54) and is utilized to determine a vector which defines distance and direction of the centering error between the center of rotation of the chuck and the center of mass of the wafer. The chuck and wafer are rotationally indexed through an angle to align the foregoing vector with a line which approximates the arcuate path traversed by the center of mass of the wafer when it is subsequently conveyed within the system. A transfer arm (44) is utilized to convey the wafer through the foregoing arcuate path with respect to the chuck so that the center of mass of the wafer coincides with the center of rotation of the chuck when the wafer is subsequently placed on same.

Inventors

  • 👤 Brad Lee Bellamy

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-09 04:56
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/50; H10P72/06; H10P72/0606; H10P72/30; H10P72/38

Claims Analysis

Total Claims: 17
Claim 1
Independent Claim 120 words
Apparatus for centering a wafer (12) in a wafer processing system comprising: means (40, 42) for transferring the wafer between stations (22, 30, 32) within the wafer processing system, said transferring means being rotatable from a first position to a second position; and means for determining the position of the wafer at a station, said determining means producing a signal representative of the position of said wafer with respect to said station, said station and the wafer being rotationally indexable to substantially align the wafer and the center of said station with the arcuate path traversed by the wafer relative to said station when the wafer is transported by said transferring means from said first position to said second position.
Claim 2
Dependent Claim 25 words
The apparatus as defined in claim 1 wherein said transferring means is a transfer arm (40) rotatable about a pivot point adjacent one and thereof.
Claim 3
Dependent Claim 25 words
The apparatus as defined in claim 1 wherein said determining means is a sensing device (54) located in proximity to the wafer and said station.
Claim 4
Dependent Claim 21 words
The apparatus as defined to claim 1 wherein said determining means is a sensing device (54) located within said transferring means.
Claim 5
Dependent Claim 35 words
The apparatus as defined in claim 2 wherein said determining means is a sensing device (54) located within said transfer arm and positioned so as to be adjacent the opposite end of said transfer arm.
Claim 6
Dependent Claim 22 words
The apparatus as defined in claim 1 wherein said determining means produces said signal in response to the rotation of said wafer.
Claim 7
Dependent Claim 36 words
The apparatus as defined in claim 1 further including means (52) for securing the wafer to said transferring means when the wafer is transported by said transferring means from said first position to said second position.
Claim 8
Dependent Claim 21 words
The apparatus as defined in claim 7 wherein said securing means comprises vacuum applied to the wafer by said transferring means.
Claim 9
Dependent Claim 25 words
The apparatus as defined in claim 8 wherein said vacuum is applied to the wafer through a vacuum port (52) located in said transferring means.
Claim 10
Dependent Claim 20 words
The apparatus as defined in claim 1 wherein said station is a wafer processing station in said wafer processing system.
Claim 11
Dependent Claim 71 words
The apparatus as defined in claim 1 wherein said station (22) and the wafer are rotationally indexable to substantially align a vector defining the distance and direction between the geometric center of the wafer and the center of rotation of said station with the arcuate path traversed by the wafer relative to said station when the wafer is transported by said transferring means from said first position to said second position.
Claim 12
Dependent Claim 73 words
The apparatus as defined in claim 1 wherein said station (22) and the wafer (12) are rotationally indexable to substantially align a vector defining the distance and direction between the center of mass of the wafer and the center of rotation of said station with the arcuate path traversed by the wafer relative to said station when the wafer is transported by said transferring means from said first position to said second position.
Claim 13
Dependent Claim 154 words
Apparatus for centering a wafer (12) in a wafer Processing system comprising: means for transferring the wafer between stations within the wafer processing system, said transferring means being a transfer arm (44) rotatable from a first position to a second position; and means (54) for determining the position of the wafer at a station, said determining means being located within said transfer arm and producing a signal in response to the rotation of said wafer, said signal being representative of the position of said wafer with respect to said station, said station and the wafer being rotationally indexable to substantially align a vector defining the distance and direction between the center of the mass of the wafer and the center of rotation of said station with the arcuate path traversed by the wafer relative to said station when the wafer is transported by said transfer arm from said first position to said second position.
Claim 14
Dependent Claim 152 words
Apparatus for centering a wafer (12) in a wafer processing system comprising: means for transferring the wafer between stations within the wafer processing system, said transferring means being a transfer arm (44) rotatable from a first position to a second position; and means (54) for determining the position of the wafer at a station, said determining means being located within said transfer arm and producing a signal in response to the rotation of said wafer, said signal being representative of the position of said wafer with respect to said station, said station and the wafer being rotationally indexable to substantially align a vector defining the distance and direction between the geometric center of the wafer and the center of rotation of said station with the arcuate path traversed by the wafer relative to said station when the wafer is transported by said transfer arm from said first position to said second position.
Claim 15
Independent Claim 122 words
A method for centering a wafer (12) in a wafer processing system comprising the steps of: placing a wafer on a rotatable chuck (22) at a wafer processing station within the wafer processing system; rotating the chuck with the wafer thereon; producing a signal in response to the rotation of said wafer, said signal being representative of the position of the center of the wafer with respect to the center of rotation of the chuck; removing the wafer from the chuck; moving the wafer so that its center substantially coincides with the center of rotation of the chuck; and replacing the wafer on the chuck so that said center of the wafer substantially coincides with the center of rotation of the chuck.
Claim 16
Dependent Claim 17 words
The method as defined in claim 15 wherein said center of the wafer is its geometric center.
Claim 17
Dependent Claim 18 words
The method as defined in claim 15 wherein said center of the wafer is its center of mass.

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