System for processing lithographic information

Claim 2

A system according to claim 1, wherein said information gathering apparatus includes a measuring device for measuring the process precision of the substrate processed in each of said plural exposure apparatus, and a machine controller for locally controlling said exposure apparatus and a photoresist processing apparatus for said substrate.

Claim 3

A system according to claim 1, wherein said exposure apparatus includes a measuring sensor for self measurement of the process precision of said processed substrate, and said information gathering apparatus includes an information input unit for entering, through a computer of said exposure apparatus, said specific information and information measured by said measuring sensor.

Claim 4

A lithography information control system for gathering and storing information required in plural exposure machines operated by a host computer which collectively manages a lithography process and information obtained from said exposure machines, comprising: (a) machine control means for analyzing a process program instructed by said host computer and providing each of said exposure machines with operating information for operating said each exposure machine according to said process; (b) internal computers respectively provided in said plural exposure machines, each of said internal computers being adapted to activate, in said exposure machine, at least one of a function for changing mask and sensitive plate, an alignment function for said mask and sensitive plate, and a function for exposing said plate to the pattern of said mask; and (c) a data processor for gathering said process program and said operation information through a communication channel from at least either of said machine control means and said internal computer; wherein said data processor is adapted to gather, in succession, events occurring in each of said plural exposure machines, and to prepare history data on operating status, result of plate processing and error generation status in each of said exposure machines.

Claim 5

A lithography information control system for gathering and controlling information required in an exposure process including a host computer which collectively manages a lithography process and plural exposure machines operated by the instructions from said host computer, or information newly obtained in said exposure process, comprising: (a) machine control means for analyzing a process program instructed by said host computer and generating operating information required in the operation of each of said plural exposure machines; (b) master data processing means for gathering operating information received from said machine control means, independently from the management system by said host computer, and analyzing thus gathered information; (c) measurement means for measuring a pattern formed on an exposed plate processed in at least one designated in advance among said plural exposure machines and transmitting the result of said measurement to said master data processing means independently from the management system by said host computer; and (d) information modifying means provided in said master data processing means, adapted to modify at least a part of said gathered operating information according to the difference between the result of measurement obtained from said measurement means and a target value set in said process program, and transmitting thus modified operating information to said machine control means; wherein each of said plural exposure machines maintains optimum exposure process in response to said modified operating information, under the collective management by the process program of said host computer.

Claim 6

A lithography information control system including plural exposure machines each including an alignment device for alignment of a substrate to be exposed, and a host computer for controlling the operation of said plural exposure machines according to a process program for process management, comprising: (a) master data porcessing means for setting a pilot exposure process in at least one designated in advance among said plural exposure machines, according to the process program by said host computer; (b) an internal computer provided in said designated exposure machine, adapted to operate said alignment device for said pilot exposure process according to said process program; (c) measuring means for detecting information relating to the precision of alignment of plate by said alignment device by measuring a pattern formed on exposed plate obtained in said pilot exposure process, and transmitting said information on the precision of alignment to said master data processing means; and (d) information modifying means provided in said master data processing means, adapted to receive said information on the precision of alignment, and, if a precision set in said process program is not reached, to modify at least a part of operating conditions of said exposure machines designated in said process program, independently from the management system by said host computer.