Apparatus for producing superconducting oxide film by MOCVD process

Abstract

Abstract An apparatus for producing a superconducting oxide film with stable properties by a chemical vapor phase growth process, suitable for mass production, is provided with a gas analyzer comprising a differential pressure meter (38) between a raw material gas collector tube (35) provided in a transfer line (8) for leading a raw material gas to a film forming chamber and a bypass line (37), a dilution gas line (49) interlocked with the differential pressure meter (38) and for leading a dilution gas to the raw material gas collector tube (35), a gas separation column (42) branched from the bypass line, a gas detector (31) connected to the gas separation column (42), flow rate controllers (50) for carrier gases (43) and (44) and a thermostat (13) for heating all the lines. Amounts of raw materials gases can be readily measured and controlled and thus superconducting oxide films of stable properties in a constant metal composition ratio can be continuously produced, and thus the present apparatus is suitable for mass production of tape form, superconducting materials. <IMAGE>

Inventors

• 👤 Kazutoshi Higashiyama
• 👤 Takahisa Ushida
• 👤 Izumi Hirabayashi
• 👤 Shoji Tanaka

Bibliographic Details