Patent EP0505094A1 successfully refreshed from Google Patents.
EP0505094A1
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Speed stabilised positive-acting photoresist compositions
Assignee: 3M Co
•
Filing: 1992-03-12
•
Granted: —
•
Expires: 2012-03-12
Abstract
Abstract A positive-acting photoresist comprising in one or more layers (i) a resin binder, (ii) a photo-acid generator, and (iii) an acid-cleavable compound, characterised in that the photoresist medium further comprises as a speed stabilising agent one or more compounds having a nucleus of general formula (I): in which; R represents a hydrogen atom or an optionally substituted alkyl group comprising up to 10 carbon atoms.
Inventors
- 👤 Stephen Newman
- 👤 Robert J. c/o 3M Centre Hauri
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-01 07:50
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/0045; G03F7/022; G03F7/0226
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
65 words
A positive-acting photoresist comprising in one or more layers (i) a resin binder, (ii) a photo-acid generator, and (iii) an acid-cleavable compound, characterised in that the photoresist medium further comprises as a speed stabilising agent one or more compounds having a nucleus of general formula (I): in which; R represents a hydrogen atom or an optionally substituted alkyl group comprising up to 10 carbon atoms.
Claim 2
Dependent Claim
74 words
A positive-acting photoresist as claimed in Claim 1 in which R represents a substituted alkyl group possessing one or more substituents selected from hydroxy, nitro groups, halogen atoms, alkoxy groups comprising up to 5 carbon atoms and ester groups comprising up to 5 carbon atoms and the phenyl ring of the speed stabilising agent possesses one or more substituents selected from nitro groups, halogen atoms and alkyl groups comprising up to 10 carbon atoms.
Claim 3
Dependent Claim
35 words
A positive-acting photoresist as claimed in Claims 1 or 2 in which the speed stabilising agent is selected from benzene sulphonamide, N-ethyl-p-toluene sulphonamide, N-ethyl-o-toluene sulphonamide, N-butyl-p-toluene sulphonamide, o-tolune sulphonamide , p-toluene sulphonamide and mixtures thereof.
Claim 4
Dependent Claim
32 words
A positive-acting photoresist as claimed in any preceding Claim in which the compound(s) of general formula (I) comprise up to 25% by weight of the total solids content of the photosensitive medium.
Claim 5
Dependent Claim
29 words
A positive-acting photoresist as claimed in any preceding Claim in which the resin binder is selected from resoles, novolacs and mixture thereof, a hydroxystyrene copolymer or a derivative thereof.
Claim 6
Dependent Claim
52 words
A positive-acting photoresist as claimed in any preceding Claim in which the photo-acid generator comprises from 0.1 to 20.0 % by weight of the photosensitive medium and is selected from sulphonium salts, iodonium salts, phosphonium salts, diazonium salts, quinone diazide sulfochlorides, bis(trichloromethyl)-s-triazines, trichloromethylpyrones, mixtures of organometals and organohalogen compounds and combinations thereof.
Claim 7
Dependent Claim
70 words
A positive-acting photoresist as claimed in Claim 6 in which the photo-acid generator is an iodonium salt of general formula (II): in which; Ar¹ and Ar² independently represent aromatic or hetero-aromatic groups comprising up to 10 ring atoms which may be linked together to include the iodine atom within a ring structure, and X ⊖ is an anion such that HX is an acid of ka not greater than 3.
Claim 8
Dependent Claim
65 words
A positive-acting photoresist as claimed in any preceding Claim in which the acid-cleavable compound comprises from 5 to 30% by weight and is selected from adducts of vinyl ethers with phenols or sulphonamides, polyacetals, polyketals, enol ethers, N-acyliminocarbonates, polymeric orthoesters, t-alkyl esters and carbonates, cyclic acetals and ketals of beta-ketocarbonyl compounds, silyl ether compounds, silyl ureido compounds and pyranyl or furanyl ethers of a bisphenol.
Claim 9
Dependent Claim
104 words
A positive-acting photoresist as claimed in Claim 8 in which the acid-cleavable compound has a nucleus of general formula (III): in which; n is 0, 1, 2 or 3, each R¹, R² and R³ independently represents a hydrogen atom or an alkyl group comprising up to 4 carbon atoms, R⁴ and R⁵ independently represent a hydrogen atom or one or more ring substituents selected from halogen atoms, alkyl groups comprising up to 4 carbon atoms, alkoxy groups comprising up to 4 carbon atoms and combinations thereof, and A represents a bond or a divalent linking group comprising up to 10 atoms other than hydrogen.
Claim 10
Dependent Claim
26 words
A positive-acting photoresist as claimed in Claim 9 in which the compound of general formula (III) has a nucleus of one of the following structures: and,
Claim 11
Dependent Claim
18 words
A photoresist as claimed in any preceding Claim further comprising up to 15% by weight of a sensitiser.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.