Patent US4561670A successfully refreshed from Google Patents.
Patent US2898126A successfully refreshed from Google Patents.
Patent EP0500393A2 successfully refreshed from Google Patents.
EP0500393A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Imaging method for manufacture of microdevices
Assignee: Canon Inc
•
Filing: 1992-02-21
•
Granted: —
•
Expires: 2012-02-21
Abstract
Abstract An imaging method for imaging a fine pattern having linear features extending along orthogonal first and second directions, is disclosed which method is characterized by : providing a light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively; and illuminating the pattern with light from the light source.
Inventors
- 👤 Akiyoshi Kosugi Jigyosho Canon K.K. Suzuki
- 👤 Miyoko Kosugi Jigyosho Canon K.K. Noguchi
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-08 10:36
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70008; G03F7/7005; G03F7/70058; G03F7/70091; G03F7/701; G03F7/70108; G03F7/70125; G03F7/70133; G03F7/70216; G03F7/70241; G03F7/70483; G03F7/7055; G03F7/70558
Claims Analysis
Total Claims: 67
Claim 1
Independent Claim
66 words
An imaging method for imaging a fine pattern having linear features extending along orthogonal first and second directions, characterized by: providing a light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively; and illuminating the pattern with light from the light source.
Claim 2
Dependent Claim
66 words
An imaging method for imaging a fine pattern having linear features extending along orthogonal first and second directions, characterized by: providing a light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively; and illuminating the pattern with light from the light source.
Claim 3
Dependent Claim
19 words
A method according to Claim 1, wherein the intensity at each decreased intensity portion is decreased to about zero.
Claim 4
Dependent Claim
52 words
A method according to Claim 1, wherein the light source comprises four sections having substantially the same light intensity and being distributed in four quadrants defined by the center and the first and second axes, and wherein the four sections are disposed in an angularly symmetrical relationship with respect to the center.
Claim 5
Dependent Claim
19 words
A method according to Claim 3, wherein the intensity at each decreased intensity portion is decreased to about zero.
Claim 6
Independent Claim
27 words
A method according to any one of Claims 1 - 4, wherein the light source is provided by light from one of a lamp and a laser.
Claim 7
Independent Claim
109 words
A device for forming an image of a fine pattern having linear features extending in orthogonal first and second directions, said device comprising: a primary light source; an illumination optical system for illuminating the pattern, said illumination optical system having means for forming, with light from said primary light source, a secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively; and a projection optical system,for projecting, on a predetermined plane, an image of the pattern illuminated with light from said secondary light source.
Claim 8
Independent Claim
109 words
A device for forming an image of a fine pattern having linear features extending in orthogonal first and second directions, said device comprising: a primary light source; an illumination optical system for illuminating the pattern, said illumination optical system having means for forming, with light from said primary light source, a secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively; and a projection optical system,for projecting, on a predetermined plane, an image of the pattern illuminated with light from said secondary light source.
Claim 9
Dependent Claim
19 words
A device according to Claim 6, wherein the intensity at each decreased intensity portion is decreased to about zero.
Claim 10
Dependent Claim
53 words
A device according to Claim 6, wherein said secondary light source comprises four sections having substantially the same light intensity and being distributed in four quadrants defined by the center and the first and second axes, and wherein the four sections are disposed in an angularly symmetrical relationship with respect to the center.
Claim 11
Dependent Claim
19 words
A device according to Claim 8, wherein the intensity at each decreased intensity portion is decreased to about zero.
Claim 12
Dependent Claim
95 words
A device according to Claim 8 or 9, wherein said secondary light source forming means includes (i) an optical integrator having a light receiving surface and a light emitting surface, for receiving with said light receiving surface the lightfrom said primary light source and dividing the received light to provide a plurality of light beams from said light emitting surface, and (ii) stop means having four apertures disposed adjacent to one of said light receiving surface and said light emitting surface of said optical integrator to define the four sections of said secondary light source.
Claim 13
Dependent Claim
96 words
A device according to Claim 8 or 9, wherein said secondary light source forming means includes (i) an optical integrator having a light receiving surface and a light emitting surface, for receiving with said light receiving surface the tight from said primary light source and dividing the received light to provide a plurality of light beams from said light emitting surface, and (ii) stop means of cross-like shape disposed adjacent to one of said light receiving surface and said light emitting surface of said optical integrator to define the four sections of said secondary light source.
Claim 14
Dependent Claim
84 words
In a microdevice manufacturing method including a step for imaging on a workpiece a fine pattern having linear features extending along orthogonal first and second directions to print the fine pattern on the workpiece, the improvements residing in: providing a light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively; and illuminating the pattern with light from the light source.
Claim 15
Dependent Claim
84 words
In a microdevice manufacturing method including a step for imaging on a workpiece a fine pattern having linear features extending along orthogonal first and second directions to print the fine pattern on the workpiece, the improvements residing in: providing a light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively; and illuminating the pattern with light from the light source.
Claim 16
Dependent Claim
19 words
A method according to Claim 12, wherein the intensity at each decreased intensity portion is decreased to about zero.
Claim 17
Dependent Claim
52 words
A method according to Claim 12, wherein the light source comprises four sections having substantially the same light intensity and being distributed in four quadrants defined by the center and the first and second axes, and wherein the four sections are disposed in an angularly symmetrical relationship with respect to the center.
Claim 18
Dependent Claim
19 words
A method according to Claim 14, wherein the intensity at each decreased intensity portion is decreased to about zero.
Claim 19
Independent Claim
30 words
A method according to any one of Claims 12 - 15, wherein the light source is provided by ultraviolet light from one of a mercury lamp and an excimer laser.
Claim 20
Dependent Claim
135 words
A microdevice manufacturing projection exposure apparatus for projecting an image of a pattern of an original on a workpiece, said apparatus comprising: an X-Y stage for supporting thereon the workpiece and being movable along X and Y directions in an X-Y coordinate system defined in said apparatus; means for forming, with light from a primary light source, a secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the X and Y directions, respectively; a condensing optical system for illuminating the pattern of the original with light from said secondary light source; and a projection optical system for projecting on the workpiece an image of the pattern illuminated with the light from said secondary light source.
Claim 21
Dependent Claim
135 words
A microdevice manufacturing projection exposure apparatus for projecting an image of a pattern of an original on a workpiece, said apparatus comprising: an X-Y stage for supporting thereon the workpiece and being movable along X and Y directions in an X-Y coordinate system defined in said apparatus; means for forming, with light from a primary light source, a secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the X and Y directions, respectively; a condensing optical system for illuminating the pattern of the original with light from said secondary light source; and a projection optical system for projecting on the workpiece an image of the pattern illuminated with the light from said secondary light source.
Claim 22
Dependent Claim
19 words
An apparatus according to Claim 17, wherein the intensity at each decreased intensity portion is decreased to about zero.
Claim 23
Dependent Claim
53 words
An apparatus according to Claim 17, wherein said secondary light source comprises four sections having substantially the same light intensity and being distributed in four quadrants defined by the center and the first and second axes, and wherein the four sections are disposed in an angularly symmetrical relationship with respect to the center.
Claim 24
Dependent Claim
19 words
An apparatus according to Claim 19, wherein the intensity at each decreased intensity portion is decreased to about zero.
Claim 25
Dependent Claim
96 words
An apparatus according to Claim 19 or 20, wherein said secondary light source forming means includes (i) an optical integrator having a light receiving surface and a light emitting surface, for receiving with said light receiving surface the light from said primary light source and dividing the received light to provide a plurality of light beams from said light emitting surface, and (ii) stop means having four apertures disposed adjacent to one of said light receiving surface and said light emitting surface of said optical integrator to define the four sections of said secondary light source.
Claim 26
Dependent Claim
96 words
An apparatus according to Claim 19 or 20, wherein said secondary light source forming means includes (i) an optical integrator having a light receiving surface and a light emitting surface, for receiving with said light receiving surface the light from said primary light source and dividing the received light to provide a plurality of light beams from said light emitting surface, and (ii) stop means of cross-like shape disposed adjacent to one of said light receiving surface and said light emitting surface of said optical integrator to define the four sections of said secondary light source.
Claim 27
Independent Claim
25 words
An apparatus according to any one of Claims 17 - 22, further comprising means for detecting a light intensity distribution of said secondary light source.
Claim 28
Dependent Claim
146 words
A microdevice manufacturing projection exposure apparatus for projecting an image of a pattern of an original on a workpiece, said apparatus comprising: an X-Y stage for supporting thereon the workpiece and being movable along X and Y directions in an X-Y coordinate system defined in said apparatus; means for selectively forming, with light from a primary light source, different secondary light sources of different light intensity distributions including a particular secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the X and Y directions, respectively; a condensing optical system for illuminating the pattern of the original with light from a secondary light source selectively formed by said selectively forming means; and a projection optical system for projecting an image of the illuminated pattern on the workpiece.
Claim 29
Dependent Claim
146 words
A microdevice manufacturing projection exposure apparatus for projecting an image of a pattern of an original on a workpiece, said apparatus comprising: an X-Y stage for supporting thereon the workpiece and being movable along X and Y directions in an X-Y coordinate system defined in said apparatus; means for selectively forming, with light from a primary light source, different secondary light sources of different light intensity distributions including a particular secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the X and Y directions, respectively; a condensing optical system for illuminating the pattern of the original with light from a secondary light source selectively formed by said selectively forming means; and a projection optical system for projecting an image of the illuminated pattern on the workpiece.
Claim 30
Dependent Claim
108 words
An apparatus according to Claim 24, wherein said selectively forming means includes (i) an optical integrator having a light receiving surface and a light emitting surface, for receiving with said light receiving surface the light from said primary light source and dividing the received light to provide a plurality of light beams from said light emitting surface, and (ii) first and second stop means each being disposed adjacent to one of said light receiving surface and said light emitting surface of said optical integrator, said first stop means having four off-axis apertures for defining said particular secondary light source, and said second stop means having an on-axis aperture.
Claim 31
Dependent Claim
54 words
An apparatus according to Claim 25, wherein said particular secondary light source comprises four sections having substantially the same light intensity and being distributed in four quadrants defined by the center and the first and second axes, and wherein the four sections are disposed in an angularly symmetrical relationship with respect to the center.
Claim 32
Dependent Claim
27 words
An apparatus according to Claim 25 or 26, wherein the intensity at each decreased intensity portion of said particular secondary light source is decreased to about zero.
Claim 33
Dependent Claim
89 words
In a method of imaging a fine pattern having linear features extending in orthogonal first and second directions, wherein the pattern is illuminated with light obliquely with respect to the pattern, the improvements residing in that: the strength of illumination of the pattern in a first plane of incidence including the first direction and the strength of illumination of the pattern in a second plane of incidence including the second direction are made lower than that in a third plane of incidence other than the first and second planes.
Claim 34
Dependent Claim
89 words
In a method of imaging a fine pattern having linear features extending in orthogonal first and second directions, wherein the pattern is illuminated with light obliquely with respect to the pattern, the improvements residing in that: the strength of illumination of the pattern in a first plane of incidence including the first direction and the strength of illumination of the pattern in a second plane of incidence including the second direction are made lower than that in a third plane of incidence other than the first and second planes.
Claim 35
Dependent Claim
31 words
A method according to Claim 28, wherein, in each of the first plane of incidence and the second plane of incidence, the illumination of the pattern with light is substantially blocked.
Claim 36
Dependent Claim
39 words
A method according to Claim 28 or 29, wherein the predetermined plane of incidence is defined with an angle of about 45 degrees with respect to one of the first plane of incidence and the second plane of incidence.
Claim 37
Dependent Claim
93 words
In a method of manufacturing microdevices wherein a fine pattern having linear features extending in orthogonal first and second directions is illuminated with light obliquely with respect to the pattern and wherein the illuminated pattern is imaged and printed on a workpiece, the improvements residing in that: the strength of illumination in a predetermined plane of incidence is made greater than that in a first plane of incidence including the first direction and that in a second plane of incidence including the second direction and intersecting with the first plane of incidence perpendicularly.
Claim 38
Dependent Claim
93 words
In a method of manufacturing microdevices wherein a fine pattern having linear features extending in orthogonal first and second directions is illuminated with light obliquely with respect to the pattern and wherein the illuminated pattern is imaged and printed on a workpiece, the improvements residing in that: the strength of illumination in a predetermined plane of incidence is made greater than that in a first plane of incidence including the first direction and that in a second plane of incidence including the second direction and intersecting with the first plane of incidence perpendicularly.
Claim 39
Dependent Claim
31 words
A method according to Claim 31, wherein, in each of the first plane of incidence and the second plane of incidence, the illumination of the pattern with light is substantially blocked.
Claim 40
Dependent Claim
33 words
A method according to Claim 31 or 32, wherein the predetermined plane of incidence is defined with an angle of about 45 degrees with respect to one of the first and second directions.
Claim 41
Dependent Claim
82 words
In a method of imaging a fine pattern having linear features each extending in a predetermined direction, wherein the pattern is illuminated with light obliquely with respect to the pattern, the improvements residing in that: the illumination of the pattern with light along a path in a plane of incidence including the predetermined direction is substantially blocked; and the pattern is illuminated with light along a pair of paths which are symmetrical with each other with respect to the plane of incidence.
Claim 42
Dependent Claim
82 words
In a method of imaging a fine pattern having linear features each extending in a predetermined direction, wherein the pattern is illuminated with light obliquely with respect to the pattern, the improvements residing in that: the illumination of the pattern with light along a path in a plane of incidence including the predetermined direction is substantially blocked; and the pattern is illuminated with light along a pair of paths which are symmetrical with each other with respect to the plane of incidence.
Claim 43
Dependent Claim
93 words
In a method of manufacturing microdevices wherein a fine pattern having linear features each extending in a predetermined direction is illuminated with light obliquely with respect to the pattern and wherein the illuminated pattern is imaged and printed on a workpiece, the improvements residing in that: the illumination of the pattern with light along a path in a plane of incidence including the predetermined direction is substantially blocked; and the pattern is illuminated with light along a pair of paths which are symmetrical with each other with respect to the plane of incidence.
Claim 44
Dependent Claim
93 words
In a method of manufacturing microdevices wherein a fine pattern having linear features each extending in a predetermined direction is illuminated with light obliquely with respect to the pattern and wherein the illuminated pattern is imaged and printed on a workpiece, the improvements residing in that: the illumination of the pattern with light along a path in a plane of incidence including the predetermined direction is substantially blocked; and the pattern is illuminated with light along a pair of paths which are symmetrical with each other with respect to the plane of incidence.
Claim 45
Dependent Claim
153 words
A projection exposure apparatus for projecting on a workpiece an image of an original having a pattern of linearfeatures, said apparatus comprising: an X-Y stage for supporting thereon the workpiece and being movable along X and Y directions in an X-Y coordinate system defined in said apparatus; means for illuminating the mask with light obliquely with respect to the mask, wherein a beam component of the light in a first plane of incidence including the X direction and a beam component of the light in a second plane of incidence including the Y direction and intersecting with the first plane of incidence perpendicularly, each has a strength made lower than that of a beam component of light in a third plane of incidence other than the first and second planes; and a projection optical system for projecting on the workpiece an image of the patter of the mask illuminated by said illuminating means.
Claim 46
Dependent Claim
153 words
A projection exposure apparatus for projecting on a workpiece an image of an original having a pattern of linearfeatures, said apparatus comprising: an X-Y stage for supporting thereon the workpiece and being movable along X and Y directions in an X-Y coordinate system defined in said apparatus; means for illuminating the mask with light obliquely with respect to the mask, wherein a beam component of the light in a first plane of incidence including the X direction and a beam component of the light in a second plane of incidence including the Y direction and intersecting with the first plane of incidence perpendicularly, each has a strength made lower than that of a beam component of light in a third plane of incidence other than the first and second planes; and a projection optical system for projecting on the workpiece an image of the patter of the mask illuminated by said illuminating means.
Claim 47
Dependent Claim
32 words
An apparatus according to Claim 36, wherein the strength of each of the beam components in the first plane of incidence and the second plane of incidence is decreased to about zero.
Claim 48
Dependent Claim
33 words
An apparatus according to Claim 36 or 37, wherein the predetermined plane of incidence is defined with an angle of about 45 degrees with respect to one of the X and Y directions.
Claim 49
Dependent Claim
126 words
A projection exposure apparatus for projecting on a workpiece an image of an original having a grating pattern, said apparatus comprising: an X-Y stage for supporting thereon the workpiece and being movable along X and Y directions in an X-Y coordinate system defined in said apparatus; means for illuminating the pattern of the mask with light obliquely with respect to the pattern and along a pair of paths which are symmetric with each other with respect to a predetermined plane of incidence including the X direction, while substantially blocking the illumination of the pattern along a path in the predetermined plane of incidence; and a projection optical system for projecting on the workpiece an image of the patter of the mask illuminated by said illuminating means.
Claim 50
Dependent Claim
126 words
A projection exposure apparatus for projecting on a workpiece an image of an original having a grating pattern, said apparatus comprising: an X-Y stage for supporting thereon the workpiece and being movable along X and Y directions in an X-Y coordinate system defined in said apparatus; means for illuminating the pattern of the mask with light obliquely with respect to the pattern and along a pair of paths which are symmetric with each other with respect to a predetermined plane of incidence including the X direction, while substantially blocking the illumination of the pattern along a path in the predetermined plane of incidence; and a projection optical system for projecting on the workpiece an image of the patter of the mask illuminated by said illuminating means.
Claim 51
Dependent Claim
25 words
An apparatus according to Claim 39, wherein the strength of a beam beam component in the predetermined plane of incidence is decreased to about zero.
Claim 52
Dependent Claim
46 words
An illumination method in image projection, for illuminating a fine pattern of an original, characterized by: providing a light intensity distribution having decreased intensity portions at a center thereof and on first and second orthogonal axes with respect to which the original is to be placed.
Claim 53
Dependent Claim
46 words
An illumination method in image projection, for illuminating a fine pattern of an original, characterized by: providing a light intensity distribution having decreased intensity portions at a center thereof and on first and second orthogonal axes with respect to which the original is to be placed.
Claim 54
Dependent Claim
21 words
A method according to Claim 41, wherein the strength at each of the decreased intensity portions is decreased to about zero.
Claim 55
Dependent Claim
82 words
An illumination method in image projection, for obliquely illuminating with light a fine pattern of an original placed with reference to first and second orthogonal axes, characterized in that: the strength of illumination of the pattern in a first plane of incidence including the first axis and the strength of illumination of the pattern in a second plane of incidence including the second axis are made lower than that in a third plane of incidence other than the first and second planes.
Claim 56
Dependent Claim
82 words
An illumination method in image projection, for obliquely illuminating with light a fine pattern of an original placed with reference to first and second orthogonal axes, characterized in that: the strength of illumination of the pattern in a first plane of incidence including the first axis and the strength of illumination of the pattern in a second plane of incidence including the second axis are made lower than that in a third plane of incidence other than the first and second planes.
Claim 57
Dependent Claim
23 words
A method according to Claim 43, wherein the illumination of the pattern along each of the first and second planes is substantially blocked.
Claim 58
Dependent Claim
28 words
A microdevice manufactured in accordance with a method as defined in any one of Claims 1 - 5, 12 - 16, 28 - 35 and 41 - 44.
Claim 59
Dependent Claim
25 words
A microdevice manufactured by using a device or an apparatus as defined in any one of Claims 6 - 11, 17 - 27 and 36-40.
Claim 60
Independent Claim
38 words
A method or apparatus for imaging onto an image plane an original having pattern components extending in a first direction, comprising illuminating the original from a direction which is oblique in a direction transverse to the first direction.
Claim 61
Independent Claim
38 words
A method or apparatus for imaging onto an image plane an original having pattern components extending in a first direction, comprising illuminating the original from a direction which is oblique in a direction transverse to the first direction.
Claim 62
Independent Claim
37 words
A method or apparatus for imaging onto an image plane an original having pattern components extending in a first direction comprising illuminating the original from directions symmetric with each other about a plane including the first direction.
Claim 63
Independent Claim
37 words
A method or apparatus for imaging onto an image plane an original having pattern components extending in a first direction comprising illuminating the original from directions symmetric with each other about a plane including the first direction.
Claim 64
Dependent Claim
19 words
A method or apparatus according to claim 48 in which the original is illuminated from different directions in turn.
Claim 65
Dependent Claim
21 words
A method or apparatus according to claim 48 in which the original is illuminated from different directions at the same time.
Claim 66
Dependent Claim
33 words
Apparatus for imaging an original onto an image plane in which the original is illuminated from directions symmetric with each other about a plane, the apparatus comprising means for changing the said plane.
Claim 67
Dependent Claim
33 words
Apparatus for imaging an original onto an image plane in which the original is illuminated from directions symmetric with each other about a plane, the apparatus comprising means for changing the said plane.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.