Patent EP0480616A2 successfully refreshed from Google Patents.
EP0480616A2
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EP
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Projection exposure apparatus with a device for compensating aberration of a projection lens
Assignee: Canon Inc
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Filing: 1991-10-01
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Granted: —
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Expires: 2011-10-01
Abstract
Abstract A projection exposure apparatus which images a pattern (26) formed on an original (2) onto a substrate (4) at a predetermined magnification to form a pattern image on the substrate, includes an original support member (25), a substrate support member (5), and a projection lens (3) disposed between these support members for imaging the pattern onto the substrate. In the projection exposure apparatus, a partial deviation of positions of portions of the pattern image from regular positions are obtained in at least one of directions along and perpendicular to a surface of the pattern image, and the partial deviation is eliminated by deforming at least one of the original and the substrate based on the thus obtained result. <IMAGE>
Inventors
- 👤 Yasuyuki c/o Canon Kabushiki Kaisha Unno
- 👤 Seiji c/o Canon Kabushiki Kaisha Orii
- 👤 Masami c/o Canon Kabushiki Kaisha Yonekawa
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-09 23:28
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70691; G03F7/707; G03F7/70708; G03F7/70216; G03F7/70258; G03F7/703; G03F7/708; G03F7/70858; G03F7/70866; G03F7/70875; G03F7/70883; G03F7/70891
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
140 words
A projection exposure apparatus in which a pattern formed on an original is imaged onto a substrate at a predetermined magnification to form a pattern image on the substrate, said apparatus comprising: first support means for supporting the original; second support means for supporting the substrate; a projection lens disposed between said first and second support means for imaging the pattern onto the substrate; deforming means for deforming the original in its surface direction; arithmetric means for calculating a deviation between an original geometric shape of the pattern formed on the original and a geometric shape of the pattern image formed on the substrate; and control means for controlling said deforming means based on the deviation calculated by said arithmetric means so that the geometric shape of the pattern image is coincided with the original geometric shape of the pattern.
Claim 2
Dependent Claim
106 words
A projection exposure apparatus according to claim 1, wherein said arithmetric means comprises a memory for storing data which are obtained by measuring a relationship between a symmetrical distortion of the projection lens and time elapsed from a start of exposure, and a timer for measuring the time elapsed from the start of exposure, and wherein said arithmetric means reads the data by inputting into said memory the time measured by said timer and calculates based on the read data the deviation between the original geometric shape of the pattern formed on the original and the geometric shape of the pattern image formed on the substrate.
Claim 3
Dependent Claim
100 words
A projection exposure apparatus according to claim 1, wherein said arithmetric means comprises a temperature sensor disposed at the projection lens and a memory for storing data which are obtained by measuring a relationship between a symmetrical distortion of the projection lens and temperature indicated by said sensor, and wherein said arithmetric means reads the data by inputting into said memory the temperature indicated by said sensor and calculates based on the read data the deviation between the original geometric shape of the pattern formed on the original and the geometric shape of the pattern image formed on the substrate.
Claim 4
Dependent Claim
150 words
A projection exposure apparatus in which a pattern formed on an original is imaged onto a substrate at a predetermined magnification to form a pattern image on the substrate, said apparatus comprising: first support means for supporting the original: second support means for supporting the substrate; a projection lens disposed between said first and second support means for imaging the original onto the substrate; measuring means for measuring respective positions of image surfaces of plural detection marks formed on the original by use of an exposure light transmitted through said projection lens; curving means for curving an exposure surface of the substrate by displacing portions of the surstrate where the detection marks are transferred in a direction perpendicular to an exposure surface of the substrate; and driving means for driving said curving means based on the respective positions of image surfaces of the detection marks measured by said measuring means.
Claim 5
Dependent Claim
177 words
A projection exposure apparatus according to claim 4, wherein said measuring means comprises a reflection mirror to be interposed between the projection lens and the substrate at a time of measuring the positions of image surfaces of the detection marks for reflecting the exposure light trnasmitted through the projection lens at right angles, light receiving means for receiving exposure lights transmitted through the detection marks out of the exposure light reflected by the reflection lens moving means for moving the light receiving means in a direction of an optical axis of the exposure light reflected by the reflection mirror, detection means for detecting the position of the light receiving means in the direction of the optical axis, arithmetric means for measuring the positions of image surfaces of the detection marks based on outputs of said light receiving means and said detection means and outputting to said driving means differences between the position of image surface of a reference detection mark of one of the detection marks and the positions of image surfaces of the other detection marks.
Claim 6
Dependent Claim
125 words
A projection exposure apparatus in which a pattern formed on an original is imaged onto a substrate at a predetermined magnification to form a pattern image on the substrate, said apparatus comprising: first support means for supporting the original; second support means for supporting the substrate; a projection lens disposed between said first and second support means for imaging the pattern onto the substrate; obtaining means for obtaining a partial deviation of positions of portions of the pattern image from regular positions in at least one of directions along and perpendicular to a surface of the pattern image; and eliminating means for eliminating the partial deviation based on an output of said obtaining means by deforming at least one of the original and the substrate.
Claim 7
Independent Claim
156 words
A method for imaging a pattern formed on an original onto a substrate at a predetermined magnification to form a pattern image on the substrate using a projection lens in a projection exposure apparatus, said method comprising the steps of: measuring a manner of change of a symmerical distortion of the projection lens; calculating a deviation between an original geometric shape of the pattern formed on the original and a geometric shape of the pattern image formed on the substrate based on the manner of change of the symmetrical distortion of the projection lens measured in said measuring step; deforming the original in its surface direction based on the deviation calculated in said calculating step so that the geometric shape of the pattern image is coincided with the original geometric shape of the pattern on the original; and imaging the pattern on the original onto the substrate using an exposure light transmitted through the projection lens.
Claim 8
Independent Claim
158 words
A method for imaging a pattern formed on an original onto a substrate at a predetermined magnification to form a pattern image on the substrate using a projection lens in a projection exposure apparatus, said method comprising the steps of: providing plural detection marks on the original; measuring respective positions of image surfaces of the plural detection marks formed on the original by use of an exposure light transmitted through the projection lens to detect a curvature of field of the projection lens; curving an exposure surface of the substrate by displacing portions of the substrate where the detection marks are transferred in a direction perpendicular to the exposure surface of the substrate based on the respective image surfaces of the detection marks measured in said measuring step to compensate for the curvature of field of the projection lens; and imaging the pattern on the original onto the substrate using the exposure light transmitted through the projection lens.
Claim 9
Independent Claim
114 words
A method for imaging a pattern formed on an original onto a substrate at a predetermined magnification to form a pattern image on the substrate using a projection lens in a projection exposure apparatus, said method comprising the steps of: obtaining a partial deviation of positions of portions of the pattern image from regular positions in at least one of directions along and perpendicular to a surface of the pattern image; eliminating the partial deviation by deforming at least one of the original and the substrate based on a result obtained in said obtaining step; and imaging the pattern on the original onto the substrate using an exposure light transmitted through the projection lens.
Claim 10
Independent Claim
39 words
A method or apparatus for projecting an image from an original onto an object surface in which at least one of the original and the object surface is physically distorted to compensate for optical distortion in the projection system.
Claim 11
Dependent Claim
21 words
A method or apparatus according to claim 10 in which the physical distortion comprises flexing the original or the object surface.
Claim 12
Dependent Claim
26 words
A method or apparatus according to claim 10 or claim 11 in which the physical distortion comprises compressing or expanding the original or the object surface.
Claim 13
Independent Claim
29 words
A method or apparatus according to any of claims 10 to 12 in which the optical distortion comprises non-uniformity of magnification or reduction of the original in the image.
Claim 14
Independent Claim
27 words
A method or apparatus according to any of claims 10 to 13 in which the optical distortion comprises non-planarity of the surface of focus of the image.
References Cited (Backward Citations)
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