Patent EP0469469A2 successfully refreshed from Google Patents.
EP0469469A2
Expired / Lapsed
EP
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Processing method for manufacturing a semiconductor device
Assignee: Tokyo Electron Ltd
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Filing: 1991-07-25
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Granted: —
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Expires: 2011-07-25
Abstract
Abstract A processing method includes the steps of placing an object (6) to be processed on a susceptor (2) arranged in a hermetic container(1), preliminarily introducing a small amount of heat transfer medium gas to a gap between the object (6) to be processed and the susceptor (2) while evacuating the gap, introducing the heat transfer medium gas to the gap until a pressure thereof reaches a predetermined value while controlling the pressure thereof by controlling an evacuation amount from the gap, and processing the object (6) to be processed.
Inventors
- 👤 Izumi Arai
- 👤 Yoshifumi A202 Hachibanchi-Corpo Tahara
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-09 04:41
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/24; H10P50/242; H10P72/00; H10P72/70; H10P72/76; H10P72/7604; H10P72/7606; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32532; H01J37/3255; H01J37/32715; H01J37/32798; H01J37/32816; H01J37/32834; H10P72/04; H10P72/0402; H10P72/0418; H10P72/0421; H10P72/0431; H10P72/0434
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
86 words
A processing method comprising the steps of placing an object (6) to be processed on a susceptor (2) arranged in a hermetic container (1), preliminarily introducing a small amount of heat transfer medium gas into a gap between the object (6) to be processed and said susceptor (2), introducing the heat transfer medium gas to the gap until a pressure thereof reaches a predetermined value while controlling the pressure of the heat transfer medium gas in the gap, and processing the object (6) to be processed.
Claim 2
Dependent Claim
86 words
A processing method comprising the steps of placing an object (6) to be processed on a susceptor (2) arranged in a hermetic container (1), preliminarily introducing a small amount of heat transfer medium gas into a gap between the object (6) to be processed and said susceptor (2), introducing the heat transfer medium gas to the gap until a pressure thereof reaches a predetermined value while controlling the pressure of the heat transfer medium gas in the gap, and processing the object (6) to be processed.
Claim 3
Dependent Claim
86 words
A processing method comprising the steps of placing an object (6) to be processed on a susceptor (2) arranged in a hermetic container (1), preliminarily introducing a small amount of heat transfer medium gas to a gap between the object (6) to be processed and said susceptor (2), introducing the heat transfer medium gas to the gap until a pressure thereof reaches a predetermined value while controlling the pressure thereof by controlling an evacuation amount from the gap, and processing the object (6) to be processed.
Claim 4
Dependent Claim
86 words
A processing method comprising the steps of placing an object (6) to be processed on a susceptor (2) arranged in a hermetic container (1), preliminarily introducing a small amount of heat transfer medium gas to a gap between the object (6) to be processed and said susceptor (2), introducing the heat transfer medium gas to the gap until a pressure thereof reaches a predetermined value while controlling the pressure thereof by controlling an evacuation amount from the gap, and processing the object (6) to be processed.
Claim 5
Dependent Claim
27 words
A method according to claim 1, characterized in that the heat transfer medium gas is a gas selected from the group consisting of nitrogen, helium, and argon.
Claim 6
Dependent Claim
27 words
A method according to claim 1, characterized in that said susceptor (2) and the object (6) to be processed have uniform load curved surfaces opposing each other.
Claim 7
Dependent Claim
31 words
A method according to claim 1, characterized in that said susceptor (2) and the object (6) to be processed have opposing faces on which a synthetic resin film (5) is formed.
Claim 8
Dependent Claim
27 words
A method according to claim 1, characterized in that a periphery of the object (6) to be processed is held by being urged against said susceptor (2).
Claim 9
Dependent Claim
18 words
A method according to claim 1, selected from the group consisting of etching, ashing, ion implantation, and sputtering.
Claim 10
Dependent Claim
83 words
A processing apparatus comprising a first electrode (2) constituting a susceptor for holding an object (6) to be processed thereon, a second electrode (3) arranged to oppose said first electrode (2), and means for generating a plasma between said first and second electrodes (2, 3) and processing the object (6) to be processed by the plasma, wherein an inorganic insulating film (26) is formed on said first electrode (2), and an elastic insulating film (5) is formed on said inorganic insulating film (26).
Claim 11
Dependent Claim
83 words
A processing apparatus comprising a first electrode (2) constituting a susceptor for holding an object (6) to be processed thereon, a second electrode (3) arranged to oppose said first electrode (2), and means for generating a plasma between said first and second electrodes (2, 3) and processing the object (6) to be processed by the plasma, wherein an inorganic insulating film (26) is formed on said first electrode (2), and an elastic insulating film (5) is formed on said inorganic insulating film (26).
Claim 12
Dependent Claim
28 words
An apparatus according to claim 8, characterized in that said inorganic insulating film (26) is an oxide film obtained by oxidizing a surface of said first electrode (2).
Claim 13
Dependent Claim
28 words
An apparatus according to claim 8, characterized in that said first electrode (2) is made of aluminum, and said inorganic insulating film (26) is an aluminum oxide film.
Claim 14
Dependent Claim
26 words
An apparatus according to claim 8, characterized in that said first electrode (2) and the object (6) to be processed have opposing uniform load curved surfaces.
Claim 15
Dependent Claim
33 words
An apparatus according to claim 8, characterized in that said inorganic insulating film (26) and the object (6) to be processed have opposing surfaces on which a synthetic resin film (6) is formed.
Claim 16
Dependent Claim
28 words
An apparatus according to claim 8, characterized by further comprising means (8) for holding the object to be processed by urging a periphery thereof against said susceptor (2).
Claim 17
Dependent Claim
26 words
An apparatus according to claim 8, selected from the group consisting of an etching apparatus, an ashing apparatus, an ion implantation apparatus, and a sputtering apparatus.
Claim 18
Dependent Claim
82 words
A heat transfer method comprising the steps of arranging an object (6) to which heat is transferred on a base material arranged in a hermetic container, preliminarily introducing a small amount of heat transfer medium gas to a gap between the object to which heat is transferred and said base member, and introducing the heat transfer medium gas to the gap until a pressure thereof reaches a predetermined value while controlling the pressure of the heat transfer medium gas in the gap.
Claim 19
Dependent Claim
82 words
A heat transfer method comprising the steps of arranging an object (6) to which heat is transferred on a base material arranged in a hermetic container, preliminarily introducing a small amount of heat transfer medium gas to a gap between the object to which heat is transferred and said base member, and introducing the heat transfer medium gas to the gap until a pressure thereof reaches a predetermined value while controlling the pressure of the heat transfer medium gas in the gap.
References Cited (Backward Citations)
No citation records indexed.
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