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EP0459665A1 Expired / Lapsed EP ⏱️ 0.0 years remaining

Manufacturing method for a multilayer wiring board

Assignee: International Business Machines Corp
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Filing: 1991-05-16
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Granted: —
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Expires: 2011-05-16
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Abstract

Abstract A method of manufacturing a multilayer wiring board is provided in which interlayer connection is made between a first electric circuit and a second electric circuit, both electric circuits being formed on a substrate. Firstly a metal layer is applied onto the substrate and a photoresist is deposited onto the metal layer. Then the photoresist is partially removed to produce a resist hole and the remaining photoresist is selectively exposed in accordance with the desired pattern for the first electric circuit. Next a conductive pillar is formed in the resist hole, followed by the removal of the exposed remaining photoresist to reveal corresponding regions of the metal layer below. These regions of the metal layer are then etched to partly expose the substrate and to form said first electric circuit. All remaining photoresist is removed and an insulation layer is deposited on the first electric circuit, the exposed substrate, and the conductive pillar, such that only one end of the conductive pillar remains exposed. Then a second metal layer is deposited on the surface of the insulation layer and the exposed end of the conductive pillar to form the second electric layer cirrcuit. The above method facilitates accurate alignment between the first wiring circuit and the conductive pillar and hence enables high density circuits to be achieved. It also reduces the number of manufacturing steps required since the same photoresist layer is used in both the resist hole formation step and the circuit pattern formation step.

Inventors

  • 👤 Takahiro Murakami

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-10-31 16:46
CPC Classifications
H; H05; H05K; H05K3/00; H05K3/22; H05K3/24; H05K3/243; H05K3/46; H05K3/4644; H05K3/4647; H05K2201/00; H05K2201/03; H05K2201/0332; H05K2201/0335; H05K2201/0347; H05K2201/0364; H05K2201/0367; H05K2203/00; H05K2203/05; H05K2203/0502; H05K2203/0505; H05K2203/07; H05K2203/0703; H05K2203/0733; H05K3/02; H05K3/06; H05K3/061; H05K3/064; H10; H10W; H10W72/00; H10W72/071; H10W72/072; H10W72/20; H10W72/241; Y; Y10; Y10T; Y10T29/00; Y10T29/49; Y10T29/49002; Y10T29/49117; Y10T29/49124; Y10T29/49126; Y10T29/4913; Y10T29/49155; Y10T29/49156

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 195 words
A method of manufacturing a multilayer wiring board in which interlayer connection is made between a circuit electric circuit and a second electric circuit, both electric circuits being formed on a substrate (1), comprising the steps of applying a metal layer (2) onto said substrate (1) and a photoresist (3) onto said metal layer (2) and then partially removing said photoresist (3) to produce a resist hole (4), said method being characterised by the steps of: selectively exposing the remaining photoresist in accordance with a desired pattern for said first electric circuit; forming a conductive pillar (5) in said resist hole (4); removing the exposed remaining photoresist to reveal corresponding regions of said metal layer (2) and etching said regions to partly expose the substrate (1) and to form said first electric circuit (6); removing all remaining photoresist and applying an insulation layer (7) onto said first electric circuit (6), the exposed substrate, and said conductive pillar (5), such that only one end of said conductive pillar remains exposed; and applying a second metal layer (8) onto said insulation layer (7) and the exposed end of said conductive pillar to form said second electric circuit.
Claim 2
Dependent Claim 192 words
A method as claimed in Claim 1, comprising steps of: blanket coating said metal layer (2) onto said substrate (1); blanket coating said photoresist (3) onto said metal layer(2); exposing and developing said photoresist (3) to remove a portion of said photoresist thus defining a resist hole (4); selectively exposing the residual photoresist remaining after the exposure and development step to define a desired circuit pattern in accordance with said first electric circuit; forming said conductive pillar (5) in said resist hole (4); developing and removing the exposed residual photoresist; etching the metal layer exposed by the development of said residual photoresist to form said first electric circuit; removing said photoresist from on the metal layer constituting said first electric circuit; blanket coating an organic insulation layer (7) on said first electric circuit (6), the substrate exposed by etching and said conductive pillar (5); flattening the surface of said organic insulation layer (7) to expose one end of said conductive pillar (5); and depositing another metal layer (8) or an electronic part (10) on the exposed surface of said organic insulation layer and said conductive pillar to form said second electric circuit.
Claim 3
Dependent Claim 186 words
A method as claimed in Claim 1, comprising steps of: blanket coating said metal layer (2) onto said substrate (1); blanket coating said photoresist (3) onto said metal layer (2); exposing and developing said photoresist (3) to remove a portion of said photoresist thus defining a resist hole (4); forming said conductive pillar (5) in said resist hole (4); selectively exposing and developing the residual photoresist remaining after the exposure and development step to define a desired circuit pattern in accordance with said first electric circuit; etching the metal layer exposed by the development of said residual photoresist to form said first electric circuit; removing said photoresist from on the metal layer constituting said first electric circuit; blanket coating an organic insulation layer (7) on said first electric circuit (6), the substrate exposed by etching and said conductive pillar (5); flattening the surface of said insulation layer (7) to expose one end of said conductive pillar (5); and depositing another metal layer (8) or electronic part (10) on the exposed surface of said organic insulation layer and said conductive pillar to form said second electric circuit.
Claim 4
Independent Claim 16 words
A method as claimed in any preceding Claim, wherein said photoresist (3) is a positive photoresist.
Claim 5
Independent Claim 51 words
A method as claimed in any preceding claim, wherein, if said conductive pillar consists of the same material as said metal layer, a protective film consisting of a different material to that of said metal layer and conductive pillar is formed on the conductive pillar before said metal layer is etched.
Claim 6
Independent Claim 21 words
A method as claimed in any preceding Claim, wherein said metal layer (2) and second metal layer (8) are copper layers.
Claim 7
Dependent Claim 39 words
A method as claimed in Claim 5, wherein said metal layer (2) and conductive pillar (5) are made of copper, and said protective film comprises either tin, solder plating, an electrodeposited coat film, or an electrodeposited positive photoresist film.
Claim 8
Independent Claim 16 words
A method as claimed in any preceding claim, wherein said conductive pillar is formed by electro-plating.
Claim 9
Dependent Claim 15 words
A multilayer wiring board produced according to a method as claimed in any preceding claim.

References Cited (Backward Citations)

US3496072A Cited
US4673773A Cited
US4659587A Cited
EP0246447A2 Cited
US4920639A Cited

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