Patent EP0459260A2 successfully refreshed from Google Patents.
EP0459260A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Condensation products and radiation mixture produced thereof
Assignee: BASF SE
•
Filing: 1991-05-18
•
Granted: —
•
Expires: 2011-05-18
Abstract
Abstract The invention relates to a product of the condensation of a polymer containing phenolic groups and a di- or polymethylol compound containing at least one group of the formula <IMAGE> in which R is hydrogen or an acid-labile group, R<1>, R<2> and R<3> are hydrogen, OH, alkyl or a radical bonded to a polymer chain. This condensation product is suitable for the preparation of radiation-sensitive mixtures for photosensitive coating materials and relief structures.
Inventors
- 👤 Son Dr. Nguyen Kim
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-09 03:57
CPC Classifications
C; C08; C08G; C08G8/00; C08G8/38
Claims Analysis
Total Claims: 0
No claims parsed yet. Click Sync Now above to re-index claims from Google Patents.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.