Patent EP0458325A1 successfully refreshed from Google Patents.
EP0458325A1
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Negative photosensitive composition and method for forming a resist pattern
Assignee: Mitsubishi Chemical Corp
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Filing: 1991-05-23
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Granted: —
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Expires: 2011-05-23
Abstract
Abstract A negative photosensitive composition comprising an alkali-soluble resin, a photo-acid-generating material and a crosslinking agent for the alkali-soluble resin, which acts under an acidic condition, wherein said photo-acid-generating material is at least one member selected from the group consisting of a C₁-C₈ paraffin hydrocarbon or C₅-C₇ cycloparaffin hydrocarbon substituted by at least two bromine or iodine atoms, an oxadiazole derivative of the following formula (I), a s-triazine derivative of the following formula (II), a sulfone compound of the following formula (III) and a carboxylic acid derivative of the following formula (IV): wherein R¹ is alkyl, alkenyl or an aromatic group, which may have a substituent, and each of X¹, X² and X³, which are independent from one another, is hydrogen or halogen, provided that at least two of X¹, X² and X³ are halogens; wherein each of R², R³ and R⁴, which are independent from one another, is alkyl, aryl or alkenyl, which may have a substituent, provided that at least one of R², R³ and R⁴ is di- or tri-bromo or di- or tri-iodomethyl; wherein R⁵ is alkyl, cycloalkyl, alkenyl or an aromatic group, which may have a substituent, and each of X⁴, X⁵ and X⁶, which are independent from one another, is hydrogen, bromine or alkyl which may have a substituent, provided that at least two of X⁴, X⁵ and X⁶ are bromine; R⁶―COO―R⁷ (IV) wherein each of R⁶ and R⁷, which are independent from each other, is alkyl, alkenyl or an aromatic group, which may have a substituent, provided that at least one of R⁶ and R⁷ is substituted by halogen, and R⁶ and R⁷ are substituted by a total of at least two halogens.
Inventors
- 👤 Tameichi Ochiai
- 👤 Noriaki Takahashi
- 👤 Tomoyo Ishiguro
- 👤 Mika Yoshizawa
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-29 16:59
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/38; G03F7/004; G03F7/0045; G03F7/027; G03F7/028; G03F7/029; G03F7/0295
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
278 words
A negative photosensitive composition comprising an alkali-soluble resin, a photo-acid-generating material and a crosslinking agent for the alkali-soluble resin, which acts under an acidic condition, wherein said photo-acid-generating material is at least one member selected from the group consisting of a C₁-C₈ paraffin hydrocarbon or C₅-C₇ cycloparaffin hydrocarbon substituted by at least two bromine or iodine atoms, an oxadiazole derivative of the following formula (I), a s-triazine derivative of the following formula (II), a sulfone compound of the following formula (III) and a carboxylic acid derivative of the following formula (IV): wherein R¹ is alkyl, alkenyl or an aromatic group, which may have a substituent, and each of X¹, X² and X³, which are independent from one another, is hydrogen or halogen, provided that at least two of X¹, X² and X³ are halogens; wherein each of R², R³ and R⁴, which are independent from one another, is alkyl, aryl or alkenyl, which may have a substituent, provided that at least one of R², R³ and R⁴ is di- or tri-bromo or di- or tri-iodomethyl; wherein R⁵ is alkyl, cycloalkyl, alkenyl or an aromatic group, which may have a substituent, and each of X⁴, X⁵ and X⁶, which are independent from one another, is hydrogen, bromine or alkyl which may have a substituent, provided that at least two of X⁴, X⁵ and X⁶ are bromine; R⁶―COO―R⁷ (IV) wherein each of R⁶ and R⁷, which are independent from each other, is alkyl, alkenyl or an aromatic group, which may have a substituent, provided that at least one of R⁶ and R⁷ is substituted by halogen, and R⁶ and R⁷ are substituted by a total of at least two halogens.
Claim 2
Dependent Claim
32 words
The negative photosensitive composition according to Claim 1, wherein the photo-acid-generating material is a C₁-C₆ paraffin hydrocarbon or C₅-C₇ cycloparaffin hydrocarbon, which is substituted by at least two bromine or iodine atoms.
Claim 3
Dependent Claim
45 words
The negative photosensitive composition according to Claim 1, wherein the photo-acid-generating material is an oxadiazole derivative of the formula (I) wherein R¹ is C₁-C₆ alkyl, C₂-C₆ alkenyl or an aromatic group, which may be substituted by nitro, cyano, halogen, C₁-C₄ alkyl, C₁-C₄ alkoxy or phenyl.
Claim 4
Dependent Claim
56 words
The negative photosensitive composition according to Claim 1, wherein the photo-acid-generating material is a triazine derivative of the formula (II) wherein each of R², R³ and R⁴, which are independent from one another, is C₁-C₆ alkyl, C₂-C₆ alkenyl or aryl, which may be substituted by bromine, iodine, C₁-C₄ alkyl, C₁-C₄ alkoxy, aryl or C₁-C₄ alkoxy-substituted aryl.
Claim 5
Dependent Claim
76 words
The negative photosensitive composition according to Claim 1, wherein the photo-acid-generating material is a sulfone compound of the formula (III) wherein R⁵ is C₁-C₆ alkyl, C₂-C₆ alkenyl, C₅-C₇ cycloalkyl or an aromatic group, which may be substituted by nitro, cyano, bromine, C₁-C₄ alkyl, C₁-C₄ alkoxy or phenyl, and each of X⁴, X⁵ and X⁶, which are independent from one another, is hydrogen, bromine or C₁-C₅ alkyl which may be substituted by bromine, C₁-C₃ alkoxy or phenyl.
Claim 6
Dependent Claim
50 words
The negative photosensitive composition according to Claim 1, wherein the photo-acid-generating material is a carboxylic acid derivative of the formula (IV) wherein each of R⁶ and R⁷ is C₁-C₆ alkyl, C₂-C₆ alkenyl or an aromatic group, which may be substituted by nitro, cyano, halogen, C₁-C₄ alkoxy, C₁-C₄ haloalkoxy or phenyl.
Claim 7
Dependent Claim
21 words
The negative photosensitive composition according to Claim 1, wherein the alkali-soluble resin is a novolak resin or a polyvinyl phenol derivative.
Claim 8
Dependent Claim
61 words
The negative photosensitive composition according to Claim 1, wherein the crosslinking agent is a compound having at least two groups of the following formula (V) per molecule, or a compound having at least one group of the following formula (VI) per molecule: ―N(CH₂OQ')₂ (VI) wherein each of Q and Q', which are independent from each other, is hydrogen or C₁-C₄ alkyl.
Claim 9
Dependent Claim
49 words
The negative photosensitive composition according to Claim 1, wherein the photo-acid-generating material is in an amount of from 0.05 to 20 parts by weight and the crosslinking agent is in an amount of from 1 to 50 parts by weight, per 100 parts by weight of the alkali-soluble resin.
Claim 10
Dependent Claim
49 words
A negative photosensitive composition comprising an alkali-soluble resin, a photo-acid-generating material and a crosslinking agent for the alkali-soluble resin, which acts under an acidic condition, wherein said photo-acid-generating material is a C₁-C₈ paraffin hydrocarbon or C₅-C₇ cycloparaffin hydrocarbon, which is substituted by at least two bromine or iodine atoms.
Claim 11
Dependent Claim
81 words
A negative photosensitive composition comprising an alkali-soluble resin, a photo-acid-generating material and a crosslinking agent for the alkali-soluble resin, which acts under an acidic condition, wherein said photo-acid-generating material is an oxadiazole derivative of the following formula (I): wherein R¹ is alkyl, alkenyl or an aromatic group, which may have a substituent, and each of X¹, X² and X³, which are independent from one another, is hydrogen or halogen, provided that at least two of X¹, X² and X³ are halogens.
Claim 12
Dependent Claim
79 words
A negative photosensitive composition comprising an alkali-soluble resin, a photo-acid-generating material and a crosslinking agent for the alkali-soluble resin, which acts under an acidic condition, wherein said photo-acid-generating material is a s-triazine derivative of the following formula (II): wherein each of R², R³ and R⁴, which are independent from one another, is alkyl, aryl or alkenyl, which may have a substituent, provided that at least one of R², R³ and R⁴ is di- or tri-bromo or di- or tri-iodomethyl.
Claim 13
Dependent Claim
88 words
A negative photosensitive composition comprising an alkali-soluble resin, a photo-acid-generating material and a crosslinking agent for the alkali-soluble resin, which acts under an acidic condition, wherein said photo-acid-generating material is a sulfone compound of the following formula (III): wherein R⁵ is alkyl, cycloalkyl, alkenyl or an aromatic group, which may have a substituent, and each of X⁴, X⁵ and X⁶, which are independent from one another, is hydrogen, bromine or alkyl which may have a substituent, provided that at least two of X⁴, X⁵ and X⁶ are bromine.
Claim 14
Dependent Claim
92 words
A negative photosensitive composition comprising an alkali-soluble resin, a photo-acid-generating material and a crosslinking agent for the alkali-soluble resin, which acts under an acidic condition, wherein said photo-acid-generating material is a carboxylic acid derivative of the following formula (IV): R⁶―COO―R⁷ (IV) wherein each of R⁶ and R⁷, which are independent from each other, is alkyl, alkenyl or an aromatic group, which may have a substituent, provided that at least one of R⁶ and R⁷ is substituted by halogen, and R⁶ and R⁷ are substituted by a total of at least two halogens.
Claim 15
Independent Claim
336 words
A method for forming a resist pattern on a substrate for a semiconductor, which comprises the step of (1) coating on the substrate a negative photosensitive composition comprising an alkali-soluble resin, a crosslinking agent for the alkali-soluble resin, which acts under an acidic condition, and at least one photo-acid-generating material selected from the group consisting of a C₁-C₈ paraffin hydrocarbon or C₅-C₇ cycloparaffin hydrocarbon substituted by at least two bromine or iodine atoms, an oxadiazole derivative of the following formula (I), a s-triazine derivative of the following formula (II), a sulfone compound of the following formula (III) and a carboxylic acid derivative of the following formula (IV): wherein R¹ is alkyl, alkenyl or an aromatic group, which may have a substituent, and each of X¹, X² and X³, which are independent from one another, is hydrogen or halogen, provided that at least two of X¹, X² and X³ are halogens; wherein each of R², R³ and R⁴, which are independent from one another, is alkyl, aryl or alkenyl, which may have a substituent, provided that at least one of R², R³ and R⁴ is di- or tri-bromo or di- or tri-iodomethyl; wherein R⁵ is alkyl, cycloalkyl, alkenyl or an aromatic group, which may have a substituent, and each of X⁴, X⁵ and X⁶, which are independent from one another, is hydrogen, bromine or alkyl which may have a substituent, provided that at least two of X⁴, X⁵ and X⁶ are bromine; R⁶―COO―R⁷ (IV) wherein each of R⁶ and R⁷, which are independent from each other, is alkyl, alkenyl or an aromatic group, which may have a substituent, provided that at least one of R⁶ and R⁷ is substituted by halogen, and R⁵ and R⁷ are substituted by a total of at least two halogens, (2) heating and drying it, (3) subjecting it to exposure by means of a mercury lamp or excimer laser, (4) subjecting it to heat treatment and (5) developing it with an alkali aqueous solution to form a resist pattern on the substrate.
References Cited (Backward Citations)
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