Patent EP0433983A2 successfully refreshed from Google Patents.
EP0433983A2
Expired / Lapsed
EP
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Copper etch process using halides
Assignee: Texas Instruments Inc
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Filing: 1990-12-18
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Granted: —
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Expires: 2010-12-18
Abstract
Abstract An etch process for etching copper layers that is useable in integrated circuit fabrication is disclosed which utilizes halides to react with copper, preferrably using photoenergizing and photodirecting assistance of high intensity ultraviolet light, to produce a product which is either volatile or easily removed in solution. The process is anisotropic. <IMAGE>
Inventors
- 👤 Monte A. Douglas
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-31 08:30
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/26; H10P50/264; H10P50/266; H10P50/267; H10P95/00; C; C23; C23F; C23F4/00; C23F4/02; H05; H05K; H05K3/00; H05K3/02; H05K3/06; H05K3/067
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
67 words
A process for anisotropically etching a copper layer on a substrate in a closed chamber to form patterned conductors comprising the steps of: masking areas of said copper layer which areas are not intended to be etched; introducing a halogen radical to said copper layer in said closed chamber to form a copper halogen reaction product after said halogen radical has been irradiated by high intensity light.
Claim 2
Dependent Claim
26 words
The process of Claim 1 further comprising the step of: heating said substrate to a temperature at which said copper halogen reaction product is substantially volatile.
Claim 3
Dependent Claim
20 words
The process of Claim 1 further comprising the step of: washing said substrate to remove said copper halogen reaction product.
Claim 4
Dependent Claim
12 words
The process of Claim 2 wherein said substrate is heated above 2000°C.
Claim 5
Dependent Claim
13 words
The process of Claim 1 wherein said halogen radical is a chlorine radical.
Claim 6
Dependent Claim
13 words
The process of Claim 1 wherein said high intensity light is ultraviolet light.
References Cited (Backward Citations)
No citation records indexed.
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