Patent EP0427220A2 successfully refreshed from Google Patents.
EP0427220A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Copper halide imaging system for electronic applications
Assignee: EIDP Inc
•
Filing: 1990-11-07
•
Granted: —
•
Expires: 2010-11-07
Abstract
Abstract A highly photosensitive element made from fine particles of highly purified copper halide is described. These purified particles may be made by ball-milling an aqueous slurry of relatively insoluble copper halide and then decanting and washing said particles, or be dissolution in an acidic solution of acetonitrile and recovering the particles of pure copper halide therefrom. Elements made using the material of this invention are suitable for the preparation of printed circuits, for example.
Inventors
- 👤 Carl William Reinbold
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-08 04:50
CPC Classifications
C; C01; C01G; C01G3/00; C01G3/04; G; G03; G03C; G03C1/00; G03C1/72; G03C1/725; C01G3/05; H; H05; H05K; H05K3/00; H05K3/10; H05K3/18; H05K3/181; H05K3/182; H05K3/185
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
127 words
A process for preparing highly photosensitive purified copper halide from crude halide material comprising the steps of: a) aqueous ball-millint of said crude copper halide in the presence of 1-5% by weight of an acid or 1-10% by weight stannous chloride on a percentage basis of crude copper halide to obtain a slurry of fine, uniform particles, to remove impurities therefrom followed removing said water and drying said particles; or, b) dissolving said crude copper halide in acetonitrile in the presence of 1-10% by weight of an acid or stannous chloride on a percentage basis of crude copper halide and recovering fine particles of pure copper halide therefrom; followed by sensitizing said copper halide particles made according to a) or b) by contacting said particles with ammonia.
Claim 2
Dependent Claim
127 words
A process for preparing highly photosensitive purified copper halide from crude halide material comprising the steps of: a) aqueous ball-millint of said crude copper halide in the presence of 1-5% by weight of an acid or 1-10% by weight stannous chloride on a percentage basis of crude copper halide to obtain a slurry of fine, uniform particles, to remove impurities therefrom followed removing said water and drying said particles; or, b) dissolving said crude copper halide in acetonitrile in the presence of 1-10% by weight of an acid or stannous chloride on a percentage basis of crude copper halide and recovering fine particles of pure copper halide therefrom; followed by sensitizing said copper halide particles made according to a) or b) by contacting said particles with ammonia.
Claim 3
Dependent Claim
12 words
The process of Claim 1 wherein said copper halide is copper chloride.
Claim 4
Dependent Claim
24 words
The process of Claim 1 wherein said photosensitive salt is dispersed in a binder and coated on a support to form a photosensitive element.
Claim 5
Dependent Claim
11 words
The process of Claim 3 wherein said binder is polyvinyl alcohol.
Claim 6
Dependent Claim
31 words
The process of Claim 1 wherein said photosensitive salt is dispersed in a liquid and made into a slurry, said slurry being applied on a support to form a photosensitive element.
Claim 7
Dependent Claim
21 words
The process of Claim 5 wherein said liquid is selected from the group consisting of acetonitrile, water, toluene or mixtures thereof.
Claim 8
Dependent Claim
19 words
The proces of Claim 3 wherein said coating to form a photosensitive is photosensitized by contact with ammonia fumes.
Claim 9
Dependent Claim
33 words
An element made according to the process of Claim 7 wherein said element is imagewise exposed, developed, fixed and dried and said image is enhanced by the application of a conductive material thereon.
Claim 10
Dependent Claim
17 words
The element of Claim 8 wherein said image is enhanced by the electroless application of copper thereon.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.