Photosensitive mixture

Abstract

Abstract Liquid mixtures containing a) 5-25% by weight of a monomeric aliphatic or cycloaliphatic di(meth)acrylate having a molecular weight (MW) of not more than 800, b) 0-15% by weight of a monomeric poly(meth)acrylate having a functionality of not less than 3 and an MW of not more than 600, c) 0-20% by weight of a mono(meth)acrylate or a mono-N-vinyl compound having an MW of not more than 500, d) 20-60% by weight of a urethane (meth)acrylate having a functionality of 2 to 4 and an MW of 500 to 10000, e) 10-50% by weight of a monomeric or oligomeric di(meth)acrylate based on bisphenol A or bisphenol F, f) 0.1-10% by weight of a photoinitiator and g) 0-5% by weight of standard additives, the proportion of the components a) to g) totalling 100% by weight, are photosensitive mixtures which can be polymerised by means of actinic irradiation and are suitable, preferably, for producing three-dimensional products by means of the stereolithographic process.

Inventors

• 👤 Max Dr. Hunziker
• 👤 Manfred Dr. Hofmann
• 👤 Adrian Dr. Schulthess
• 👤 Paul Dr. Bernhard
• 👤 Bernd Dr. Klingert
• 👤 Rolf Dr. Wiesendanger

Bibliographic Details