A double chamber vacuum plant for deposition processes of thin layers

Abstract

Abstract Double chamber vacuum plant for the deposition processes of thin layers, essentially consisting of (Figure.1) two or are deposition chambers (1), one or more pumping groups (2). and an unique complex (4) for the control, to operate and to carry into effect the process. The aforesaid plant have to be used in a laboratory into which must be carried out thin layers treatment. This plant finds an advantageous employment in the production sector and in the research and development departments. Compared to the previous techniques, the innovation of the presented invention resides to the double chamber or muultichamber configura­tion, therefore, it is due to its configuration that can be obtained a nett increasing of the productivity. Besides, it is possible to specialize the two or more chambers for the deposition materials and differentiated processes.

Inventors

• 👤 Carlo Misiano
• 👤 Enrico Simonetti

Bibliographic Details