Treatment of copper foil for printed circuits
Abstract
Abstract A process for the treatment of a copper foil for printed circuits comprises forming, over the surface of the copper foil to be treated, of an electroplating alloy deposit selected from the group consisting of electroplating deposits of binary alloys composed of 20 - 40 mg/dm<2> copper and 100 - 3000 mu g/dm<2> cobalt and of ternary alloys of 20 - 40 mg/dm<2> copper, 100 -3000 mu g/dm<2> cobalt, and 100 - 1000 mu g/dm<2> nickel. The copper foil treated has heat resistance, peel strength, and resistance to hydrochloric acid comparable to the Cu-Ni-treated foils. It can be etched with a CuCl2 etchant to form 150 mu m or finer-pitch printed circuits and is also etchable with alkalies. Its magnetizability is below the permissible upper limit.
Inventors
- 👤 Eiji C/O Nikko Gould Foil Co. Ltd. Hino
- 👤 Keisuke Nikko Gould Foil Co. Ltd. Yamanishi
Bibliographic Details
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