Patent EP0385480A2 successfully refreshed from Google Patents.
EP0385480A2
Expired / Lapsed
EP
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Aperture pattern printing plate for shadow mask and method of manufacturing the same
Assignee: Toshiba Corp
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Filing: 1990-03-01
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Granted: —
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Expires: 2010-03-01
Abstract
Abstract An aperture pattern printing plate (11) comprises a transparent plate (5), and an opaque layer (10) formed on this transparent plate (5) in parts corresponding to the apertures in the effective area of the shadow mask. This opaque layer (11) has a thickness of 3 to 50 µm, and it is formed in such a way that it projects from the surface of the transparent plate (5). A resist pattern is formed on a shadow mask substrate using the aperture pattern printing plate (11). The shadow mask substrate is etched using the resust pattern as etching mask to manufacture a shadow mask.
Inventors
- 👤 Yasuhisa C/O Intellectual Property Div. Ohtake
- 👤 Yasushi C/O Intellectual Property Div. Magaki
- 👤 Mitsuaki C/O Intellectual Property Div. Yamazaki
- 👤 Seiji C/O Intellectual Property Div. Sagou
- 👤 Hiroshi C/O Intellectual Property Div. Tanaka
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-08 12:35
CPC Classifications
H; H01; H01J; H01J29/00; H01J29/02; H01J29/06; H01J29/07; H01J9/00; H01J9/02; H01J9/14; H01J9/142
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
46 words
An aperture pattern printing plate (11) comprising a transparent plate (5) and an opaque pattern (10) corresponding to the apertures of the shadow mask, characterized in that said opaque layer (11) has a thickness of 3 to 50 µm and projects from said transparent plate (5).
Claim 2
Dependent Claim
46 words
An aperture pattern printing plate (11) comprising a transparent plate (5) and an opaque pattern (10) corresponding to the apertures of the shadow mask, characterized in that said opaque layer (11) has a thickness of 3 to 50 µm and projects from said transparent plate (5).
Claim 3
Dependent Claim
34 words
An aperture printing plate (11) according to claim 1, characterized in that the parts of the surface of said transparent plate (5), other than those where said opaque layer (11) is formed, are bare.
Claim 4
Dependent Claim
24 words
A pattern printing plate (11) according to claim 1, characterized in that the thickness of said opaque layer (10) is 5 to 30 µm.
Claim 5
Dependent Claim
22 words
A pattern printing plate (11) according to claim 1, characterized in that the gaps in said opaque layer (10) constitute air passages.
Claim 6
Dependent Claim
20 words
A pattern printing plate (11) according to claim 1, characterized in that said transparent plate (5) consists essentially of glass.
Claim 7
Dependent Claim
24 words
A pattern printing plate (11) according to claim 1, characterized in that said transparent layer (4) is formed by exposing a transparent photosensitive emulsion.
Claim 8
Dependent Claim
46 words
An aperture printing plate (31, 41) according to claim 1, characterized in that a discontinuous transparent layer (73, 93) is formed in parts of said transparent plate (65, 85) corresponding to the non-effective area of the shadow mask such that it projects from said transparent plate.
Claim 9
Dependent Claim
24 words
An aperture printing plate (31, 41) according to claim 7, characterized in that the gaps in said transparent layer (73, 93) constitute air passages.
Claim 10
Independent Claim
148 words
A method of manufacturing an aperture printing plate (11) comprising the steps of bringing a transparent plate (5) having an unexposed photosensitive layer (4) formed on at least one of the principal surfaces thereof, into close contact with an original plate (1) having opaque areas corresponding to the apertures in the effective area of a shadow mask; performing a 1st exposure to said photosensitive layer (4) through the original plate; and developing said photosensitive layer (4) to render the parts subjected to said 1st exposure opaque, characterized in that said method comprises also the steps of removing said opaque layer (5) by etching; performing a 2nd exposure of the unexposed transparent layer (4) remaining on the transparent plate (11); and developing the exposed photosensitive layer (7), rendering the parts subjected to the 2nd exposure opaque, and forming a pattern corresponding to the pattern on the original plate (1).
Claim 11
Independent Claim
148 words
A method of manufacturing an aperture printing plate (11) comprising the steps of bringing a transparent plate (5) having an unexposed photosensitive layer (4) formed on at least one of the principal surfaces thereof, into close contact with an original plate (1) having opaque areas corresponding to the apertures in the effective area of a shadow mask; performing a 1st exposure to said photosensitive layer (4) through the original plate; and developing said photosensitive layer (4) to render the parts subjected to said 1st exposure opaque, characterized in that said method comprises also the steps of removing said opaque layer (5) by etching; performing a 2nd exposure of the unexposed transparent layer (4) remaining on the transparent plate (11); and developing the exposed photosensitive layer (7), rendering the parts subjected to the 2nd exposure opaque, and forming a pattern corresponding to the pattern on the original plate (1).
Claim 12
Dependent Claim
39 words
A method of manufacturing an aperture pattern printing plate (11) according to claim 9, characterized in that the parts of the surface of said transparent plate (5), other than those where said opaque layer (10) is formed, are bare.
Claim 13
Dependent Claim
21 words
A method according to claim 9, characterized in that the thickness of said opaque layer (10) is 5 to 30 µm.
Claim 14
Dependent Claim
19 words
A method according to claim 9, characterized in that the gaps in said opaque layer (10) form air passages.
Claim 15
Dependent Claim
16 words
A method according to claim 9, characterized in that said transparent plate (5) consists of glass.
Claim 16
Dependent Claim
21 words
A method according to claim 9, characterized in that said opaque layer (10) is formed by exposing a transparent photosensitive emulsion.
Claim 17
Dependent Claim
47 words
A method of manufacturing an aperture pattern printing plate according to claim 9, characterized in that said pattern original plate has a pattern (72) of air passages corresponding to the non-effective area of the shadow mask, and said 2nd exposure is performed only in the effective area.
Claim 18
Independent Claim
146 words
A method of manufacturing an aperture pattern printing plate characterized in that said method comprises the steps of: bringing a photosensitive layer formed on at least one of the principal surfaces of a transparent plate (55), into close contact with an original plate having opaque areas corresponding to the apertures in the effective area of the shadow mask; performing a 1st exposure to said photosensitive layer; performing a 1st development of said photosensitive layer, and rendering the exposed parts subjected to said 1st exposure opaque so as to form a master pattern; bringing said master pattern (54) into contact with a photosensitive resin layer (53) formed on at least one of the principal surfaces thereof having two principal surfaces; performing a 2nd exposure of said photosensitive resin layer (53); and performing a 2nd development to said photosensitive resin layer (53), to remove the unexposed parts (57).
Claim 19
Independent Claim
146 words
A method of manufacturing an aperture pattern printing plate characterized in that said method comprises the steps of: bringing a photosensitive layer formed on at least one of the principal surfaces of a transparent plate (55), into close contact with an original plate having opaque areas corresponding to the apertures in the effective area of the shadow mask; performing a 1st exposure to said photosensitive layer; performing a 1st development of said photosensitive layer, and rendering the exposed parts subjected to said 1st exposure opaque so as to form a master pattern; bringing said master pattern (54) into contact with a photosensitive resin layer (53) formed on at least one of the principal surfaces thereof having two principal surfaces; performing a 2nd exposure of said photosensitive resin layer (53); and performing a 2nd development to said photosensitive resin layer (53), to remove the unexposed parts (57).
Claim 20
Dependent Claim
26 words
A method according to claim 16, characterized in that said 2nd development is performed with a developing agent having the effect of coloring the photosensitive resin.
Claim 21
Independent Claim
166 words
A method of manufacturing an aperture pattern printing plate characterized in that said method comprises the steps of: bringing a transparent plate (55) having an unexposed photosensitive layer formed on at least one of the principal surfaces thereof, into close contact with an original plate having opaque areas corresponding to the apertures in the effective area of a shadow mask, and performing a 1st exposure; performing a 1st development of said photosensitive layer to render the parts subjected to said 1st exposure opaque so as to form a master pattern (54) which is the reverse of the pattern on the original plate; bringing said master pattern (54) into close contact with a photosensitive resin layer (53) formed on at least one of the principal surfaces of a transparent plate (51), performing a 2nd exposure; performing a 2nd development of said photosensitive resin layer (53) to remove the exposed parts (56); forming an opaque layer (58) in the gaps so obtained; and removing the unexposed parts (57).
Claim 22
Independent Claim
166 words
A method of manufacturing an aperture pattern printing plate characterized in that said method comprises the steps of: bringing a transparent plate (55) having an unexposed photosensitive layer formed on at least one of the principal surfaces thereof, into close contact with an original plate having opaque areas corresponding to the apertures in the effective area of a shadow mask, and performing a 1st exposure; performing a 1st development of said photosensitive layer to render the parts subjected to said 1st exposure opaque so as to form a master pattern (54) which is the reverse of the pattern on the original plate; bringing said master pattern (54) into close contact with a photosensitive resin layer (53) formed on at least one of the principal surfaces of a transparent plate (51), performing a 2nd exposure; performing a 2nd development of said photosensitive resin layer (53) to remove the exposed parts (56); forming an opaque layer (58) in the gaps so obtained; and removing the unexposed parts (57).
References Cited (Backward Citations)
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