Method of depositing an oxide superconductor on a substrate

Abstract

Abstract Method of depositing an oxide superconductor on a substrate by epitaxially growing a 0.05-2.0 micron thick, single crystal buffer layer of magnesia or cubic zirconia on a single crystal sapphire substrate; and then growing an oriented oxide superconductor layer on the buffer layer. The sapphire substrate with a thin buffer layer provides for low dielectric losses (negligibly larger than sapphire by itself), the oxide superconductor can be oriented in a desired direction to provide higher current carrying capacity, and reaction between the sapphire substrate and the oxide superconductor (especial­ly that due to diffusion of aluminum) is minimized. Preferably, the buffer layer is 0.1-1.0 micron thick, magnesia in a (111), or (100), or (110) orientation.

Inventors

• 👤 John Joseph Talvacchio

Bibliographic Details