EP0360272A2 — Stepper for circuit pattern formation

Claim 1

Independent Claim 228 words

A stepper for transferring a circuit pattern formed on a mask (15) on to a wafer (13) by means of exposure to radiation (SR) from a light source, for instance synchrotron radiation, said stepper comprising:- a coarse X-Y stage (34) for moving the wafer (13) in a plane perpendicular to the direction of irradiation of said radiation; a mask stage (14) for mounting the mask (15) thereon in such a manner that the mask (15) is oriented perpendicularly to the direction of irradiation of said radiation and adapted to be moved for scanning in a direction perpendicular to the direction of irradiation of said radiation; scanning means (73 to 75) for scanning said mask stage (14); a wafer mounting member (80) for mounting the wafer (13) thereon in such a manner that the wafer (13) is oriented perpendicularly to the direction of irradiation of said radiation and movable between a first position, mounted on said coarse X-Y stage (34), and a second position, mounted on said mask stage (14), said wafer mounting member (80) including a fine X-Y stage (81); transfer means for moving said wafer mounting member (80) between said first and second positions; first attracting means (84, 85) for attracting said wafer to said wafer mounting member (80); and second attracting means (82, 87) for attracting said wafer mounting member (80) to said mask stage (14).

Claim 2

Dependent Claim 228 words

A stepper for transferring a circuit pattern formed on a mask (15) on to a wafer (13) by means of exposure to radiation (SR) from a light source, for instance synchrotron radiation, said stepper comprising:- a coarse X-Y stage (34) for moving the wafer (13) in a plane perpendicular to the direction of irradiation of said radiation; a mask stage (14) for mounting the mask (15) thereon in such a manner that the mask (15) is oriented perpendicularly to the direction of irradiation of said radiation and adapted to be moved for scanning in a direction perpendicular to the direction of irradiation of said radiation; scanning means (73 to 75) for scanning said mask stage (14); a wafer mounting member (80) for mounting the wafer (13) thereon in such a manner that the wafer (13) is oriented perpendicularly to the direction of irradiation of said radiation and movable between a first position, mounted on said coarse X-Y stage (34), and a second position, mounted on said mask stage (14), said wafer mounting member (80) including a fine X-Y stage (81); transfer means for moving said wafer mounting member (80) between said first and second positions; first attracting means (84, 85) for attracting said wafer to said wafer mounting member (80); and second attracting means (82, 87) for attracting said wafer mounting member (80) to said mask stage (14).

Claim 3

Dependent Claim 48 words

A stepper as claimed in claim 1, wherein said mask stage (14) includes a fine Z-ϑ stage (83) for moving the mask (15) in the direction of irradiation of said radiation and rotating the mask (15) in a plane perpendicular to the direction of irradiation of said radiation.

Claim 4

Dependent Claim 69 words

A stepper as claimed in claim 1 or 2, wherein said transfer means includes a plurality of guide pins (90) mounted on said coarse X-Y stage (34), and air cylinder means (92) attached at one end to said coarse X-Y stage (34) and at the other end to said wafer mounting member (80), and said wafer mounting member (80) is engaged with and guided by said guide pins (90).

Claim 5

Dependent Claim 86 words

A stepper as claimed in claim 1, 2 or 3, wherein said transfer means includes a transfer member (78), a plurality of guide pins (90) mounted on said coarse X-Y stage (34) and adapted to be engaged with said transfer member (78) in order to guide said transfer means; air cylinder means (92) attached at one end to said coarse X-Y stage (34) and at the other end to said transfer member (78); and third attracting means (94) for selectively attracting said wafer mounting member (80).

Claim 6

Dependent Claim 28 words

A stepper as claimed in claim 4, wherein a position indexing plunger (93) selectively engageable with said transfer member (78) is disposed on said wafer mounting member (80).

Claim 7

Dependent Claim 131 words

A stepper as claimed in any preceding claim, wherein said fine X-Y stage (81) comprises a fine X-axis stage (42) including a fine X-axis member (49) movable in the X-axis direction, first parallel plate spring guides (48) for supporting said fine X-axis member (49), and a first piezoelectric device (50) disposed in such a manner as to displace said fine X-axis member (49) in the X-axis direction; and a fine Y-axis stage (41) including a fine Y-axis member (45) movable in the Y-axis direction, second parallel plate spring guides (44) for supporting said fine Y-axis member (45), and a second piezoelectric device (46) disposed in such a manner as to displace said fine Y-axis member (45) in the Y-axis direction, said fine Y-axis stage being mounted on said fine X-axis stage.

Claim 8

Dependent Claim 76 words

A stepper as claimed in any of claims 1 to 5, wherein said fine X-Y stage (81) includes a fine X-Y member (52) movable in the X-axis and Y-axis directions; first, second, third and fourth parallel plate spring guide means (53a to 53d) for supporting said fine X-Y member (52); and first and second piezoelectric devices disposed in such a manner as to displace said fine X-Y member (52) in the X-axis and Y-axis directions, respectively.

Claim 9

Dependent Claim 46 words

A stepper as claimed in any preceding claim, further including first compensating means (25a to 25d, 36, 37) for compensating the dead weight of said coarse X-Y stage (34), and second compensating means for compensating the dead-weight of said mask stage (14) when moved for scanning.

Claim 10

Dependent Claim 21 words

A stepper as claimed in any preceding claim, wherein said first and second attracting means are suction means for vacuum drawing.

Claim 11

Dependent Claim 146 words

A stepper for transferring a circuit pattern formed on a mask (15) on to a wafer (13) by means of exposure to radiation (SR) from a light source, for instance synchrotron radiation, said stepper comprising:- a coarse X-Y stage (34) for moving the wafer (13) stepwise in a plane perpendicular to the direction of irradiation of said radiation; a fine X-Y stage (35) mounted on the coarse X-Y stage (34) for moving the wafer (13) in a plane perpendicular to the direction of irradiation of said radiation; a mask stage (14) for mounting the mask (15) thereon in such a manner that the mask (15) is oriented perpendicularly to the direction of irradiation of said radiation and adapted to be moved for scanning in a direction perpendicular to the direction of irradiation of said radiation; scanning means (73 to 75) for scanning said mask stage (14).

Claim 12

Dependent Claim 146 words

A stepper for transferring a circuit pattern formed on a mask (15) on to a wafer (13) by means of exposure to radiation (SR) from a light source, for instance synchrotron radiation, said stepper comprising:- a coarse X-Y stage (34) for moving the wafer (13) stepwise in a plane perpendicular to the direction of irradiation of said radiation; a fine X-Y stage (35) mounted on the coarse X-Y stage (34) for moving the wafer (13) in a plane perpendicular to the direction of irradiation of said radiation; a mask stage (14) for mounting the mask (15) thereon in such a manner that the mask (15) is oriented perpendicularly to the direction of irradiation of said radiation and adapted to be moved for scanning in a direction perpendicular to the direction of irradiation of said radiation; scanning means (73 to 75) for scanning said mask stage (14).

Claim 13

Dependent Claim 47 words

A stepper as claimed in claim 10, wherein said mask stage (14) includes a fine Z-ϑ stage for moving the mask (15) in the direction of irradiation of said radiation and rotating the mask (15) in a plane perpendicular to the direction of irradiation of said radiation.

Claim 14

Dependent Claim 132 words

A stepper as claimed in claim 10 or 11, wherein said fine X-Y stage (35) comprises a fine X-axis stage (42) including a fine X-axis member (49) movable in the X-axis direction, first parallel plate spring guides (48) for supporting said fine X-axis member (49), and a first piezoelectric device (50) disposed in such a manner as to displace said fine X-axis member (49) in the X-axis direction; and a fine Y-axis stage (41) including a fine Y-axis member (45) movable in the Y-axis direction, second parallel plate spring guides (44) for supporting said fine Y-axis member (45), and a second piezoelectric device (46) disposed in such a manner as to displace said fine Y-axis member (45) in the Y-axis direction, said fine Y-axis stage being mounted on said fine X-axis stage.

Claim 15

Dependent Claim 75 words

A stepper as claimed in claims 10, 11 or 12, wherein said fine X-Y stage (35) includes a fine X-Y member (52) movable in the X-axis and Y-axis directions; first, second, third and fourth parallel plate spring guide means (53a to 53d) for supporting said fine X-Y member (52); and first and second piezoelectric devices disposed in such a manner as to displace said fine X-Y member (52) in the X-axis and Y-axis directions, respectively.

Claim 16

Dependent Claim 55 words

A stepper as claimed in claims 10, 11, 12 or 13, further including first compensating means (25a to 25d, 36, 37) for compensating the dead weight of said coarse X-Y stage (34) with the fine X-Y stage (35), and second compensating means for compensating the dead-weight of said mask stage (14) when moved for scanning.

Claim 17

Dependent Claim 12 words

A stepper as claimed in any preceding claim, being a vertical stepper.

Claim 18

Dependent Claim 29 words

A stepper as claimed in claim 15, for use with a synchrotron radiation light source from which radiation is emitted horizontally, with mask and wafer vertical in the stepper.

Stepper for circuit pattern formation

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