Patent EP0358871A2 successfully refreshed from Google Patents.
EP0358871A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Radiation-sensitive positive resist composition
Assignee: Sumitomo Chemical Co Ltd
•
Filing: 1989-07-06
•
Granted: —
•
Expires: 2009-07-06
Abstract
Abstract A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula: X- alpha -H (I) wherein X is a group of the formula: <CHEM> and alpha is a divalent group which comprises a repeating unit of the formula: <CHEM> in which n is a number of not less than 1; a, b, c, d, e and f are the same or different and a number of 0-3, provided that d + f is not less than 1; R1, R2 and R3 are the same or different and a C1-C18 alkyl group, a C1-18 alkoxy group, a carboxyl group or a halogen atom; R4 is a hydrogen atom, a C1-C18 alkyl group or an aryl group, which which resist composition is sensitive to radiation and has good balance of sensitivity, resolving power and heat resistance.
Inventors
- 👤 Haruyoshi Ozaki
- 👤 Fumio Oi
- 👤 Yasunori Uetani
- 👤 Makoto Hanabata
- 👤 Takeshi Hioki
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-09 04:14
CPC Classifications
G; G03; G03C; G03C1/00; G03C1/52; G03C1/60; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/0226
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
123 words
A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula: X-α-H (I) wherein X is a group of the formula: and α is a divalent group which comprises a repeating unit of the formula: in which n is a number of not less than 1; a, b, c, d, e and f are the same or different and a number of 0-3, provided that d + f is not less than 1; R₁, R₂ and R₃ are the same or different and a C₁-C₁₈ alkyl group, a C₁-₁₈ alkoxy group, a carboxyl group or a halogen atom; R₄ is a hydrogen atom, a C₁-C₁₈ alkyl group or an aryl group.
Claim 2
Dependent Claim
123 words
A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula: X-α-H (I) wherein X is a group of the formula: and α is a divalent group which comprises a repeating unit of the formula: in which n is a number of not less than 1; a, b, c, d, e and f are the same or different and a number of 0-3, provided that d + f is not less than 1; R₁, R₂ and R₃ are the same or different and a C₁-C₁₈ alkyl group, a C₁-₁₈ alkoxy group, a carboxyl group or a halogen atom; R₄ is a hydrogen atom, a C₁-C₁₈ alkyl group or an aryl group.
Claim 3
Dependent Claim
57 words
The positive resist composition according to claim 1, wherein X is a group of the formula: wherein R₁, a and b are the same as defined above, and α is a divalent group which comprises a repeating unit of the formula: in which R₂, R₃, R₄, d, e, f and n are the same as defined above.
Claim 4
Dependent Claim
24 words
The positive resist composition according to claim 1, wherein n in the formula (A) is not less than 1 and not larger than 5.
Claim 5
Dependent Claim
31 words
The positive resist composition according to claim 3, wherein the content of the polyphenyl compound (I) is 4 to 40 parts by weight per 100 parts of the whole alkali-soluble resin.
Claim 6
Dependent Claim
29 words
The positive resist composition according to claim 1, wherein the polyphenyl compound (I) is at least one compound of - the formula: wherein g is 0, 1 or 2.
Claim 7
Dependent Claim
19 words
The positive resist composition according to claim 5, wherein the polyphenyl compound (I) is the compound of the formula:
Claim 8
Dependent Claim
19 words
The positive resist composition according to claim 5, wherein the polyphenol compound (I) is the compound of the formula:
Claim 9
Dependent Claim
19 words
The positive resist composition according to claim 5, wherein the polyphenyl compound (I) is the compound of the formula:
Claim 10
Dependent Claim
16 words
The positive resist composition according to claim 1, wherein the alkali-soluble resin is a novolak resin.
Claim 11
Dependent Claim
68 words
The positive resist composition according to claim 9, wherein the novolak resin is a high molecular weight novolak resin having a weight average molecular weight measured by GPC of not less than 2,000 as converted to polystyrene which novolak resin is prepared by removing from the whole resin 30 to 90 % by weight of low molecular weight fractions based on the weight of the whole novolak resin.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.