Patent EP0358521A2 successfully refreshed from Google Patents.
EP0358521A2
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EP
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An exposure apparatus
Assignee: Canon Inc
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Filing: 1989-09-08
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Granted: —
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Expires: 2009-09-08
Abstract
Abstract An exposure apparatus for exposing a semiconductor wafer to a semiconductor device pattern formed in a mask. The exposure energy is, for example, X-rays contains in synchrotron orbit radiation. A blade (BLD) for limiting the area irradiated with the exposure energy on a mask or wafer is integrally movable of an alignment detecting unit (AAU) for detecting the alignment mark. Four (BLD₁-BLD₄) of such blades are provided to provide a square exposure area. The blades are movable independently by the associated alignment detecting units. Each of the blades is finely movable relative to the associated alignment detecting unit. The shape or size or the like of the blade is determined in consideration of the position of the blade in the direction of the exposure energy irradiation, and the maximum and minimum exposure view angle. The blade is cooled. The exposure area can be changed highly accurately and efficiently with a simple structure.
Inventors
- 👤 Nobutoshi Mizusawa
- 👤 Ryuichi Ebinuma
- 👤 Takao Kariya
- 👤 Shunichi Uzawa
- 👤 Isamu Shimoda
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-02 09:46
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/70066; G03F7/702; G03F7/708; G03F7/70858; G03F7/70866; G03F7/70875
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
99 words
An exposure apparatus wherein a substrate is exposed to exposure energy through an original to transfer a pattern of the original onto the substrate, comprising: an alignment unit for detecting a relative positional relation between the original and the substrate, using alignment mark; a stage unit for moving said alignment unit along a plane of the pattern of the original; and a blade for limiting the exposure energy, said blade being disposed at a position which is nearer to a position where the exposure energy is emitted than said alignment unit, and being movable integrally with the alignment unit.
Claim 2
Dependent Claim
99 words
An exposure apparatus wherein a substrate is exposed to exposure energy through an original to transfer a pattern of the original onto the substrate, comprising: an alignment unit for detecting a relative positional relation between the original and the substrate, using alignment mark; a stage unit for moving said alignment unit along a plane of the pattern of the original; and a blade for limiting the exposure energy, said blade being disposed at a position which is nearer to a position where the exposure energy is emitted than said alignment unit, and being movable integrally with the alignment unit.
Claim 3
Dependent Claim
34 words
An apparatus according to Claim 1, a plural sets of said alignment units and said blades are provided, and wherein said blades are mounted on the respective alignment units, said blades having linear edges.
Claim 4
Dependent Claim
31 words
An apparatus according to Claim 2, wherein four of said alignment units are disposed around the original wherein orientations of adjacent ones of said alignment units are different by 90 degrees.
Claim 5
Dependent Claim
124 words
An apparatus according to Claim 2, wherein an amount D of projection of the edge in a plane perpendicular to irradiation of the exposure energy into an angle of view of an irradiation area defined by the blade satisfies D < L A x l min /(2 x L M ) where L M is a distance between the emitting position of the exposure energy and the original measured in the direction of the irradiation of the exposure energy; L A is a distance between the edge of said blade to the original measured in the same direction; and l min is a length of a side of a minimum angle of view defined by said blade in which the exposure energy is irradiated.
Claim 6
Dependent Claim
27 words
An apparatus according to Claim 1, wherein said blade is mounted on said alignment unit through a fine movement mechanism for movement relative to said alignment unit.
Claim 7
Dependent Claim
14 words
An apparatus according to Claim 1, wherein said blade is supplied with cooling liquid.
Claim 8
Dependent Claim
12 words
An apparatus according to Claim 1, wherein the exposure energy is X-rays.
Claim 9
Dependent Claim
169 words
An exposure apparatus for exposing a substrate to exposure energy through an original to transfer a pattern of the original onto the substrate, comprising: a first blade for limiting the exposure energy; an alignment unit or detecting a relative positional relation between the original and the substrate using alignment mark; a stage unit for moving said alignment unit in a plane of the original; and a second blade for further limiting the exposure energy limited by said first blade, said second blade being mounted on said alignment unit for integral movement with the alignment unit, wherein said second blade has a width measured in a predetermined direction which is slightly larger than ( l EX - l min )/2 where l EX is a length, measured in the predetermined direction, of the exposure angle of view which is irradiated by the exposure energy and which is defined by the first blade; and l min is a length of a minimum exposure angle of view measured along the predetermined direction.
Claim 10
Dependent Claim
169 words
An exposure apparatus for exposing a substrate to exposure energy through an original to transfer a pattern of the original onto the substrate, comprising: a first blade for limiting the exposure energy; an alignment unit or detecting a relative positional relation between the original and the substrate using alignment mark; a stage unit for moving said alignment unit in a plane of the original; and a second blade for further limiting the exposure energy limited by said first blade, said second blade being mounted on said alignment unit for integral movement with the alignment unit, wherein said second blade has a width measured in a predetermined direction which is slightly larger than ( l EX - l min )/2 where l EX is a length, measured in the predetermined direction, of the exposure angle of view which is irradiated by the exposure energy and which is defined by the first blade; and l min is a length of a minimum exposure angle of view measured along the predetermined direction.
Claim 11
Dependent Claim
66 words
An apparatus according to Claim 8, wherein a width of said second blade measured in a direction crossing the predetermined direction is slightly larger than ( l STG + l max ) where l STG is a distance through which said alignment unit moves in the crossing direction; and l max is a length, measured in the predetermined direction, of a maximum exposure angle of view.
Claim 12
Dependent Claim
34 words
An apparatus according to Claim 9, a plural sets of said alignment units and said blades are provided, and wherein said blades are mounted on the respective alignment units, said blades having linear edges.
Claim 13
Dependent Claim
46 words
An apparatus according to Claim 10, wherein four of said alignment units are disposed around the original at orientations which are different by 90 degrees, wherein adjacent ones of said second blades are disposed at different position in a direction of irradiation of the exposure energy.
Claim 14
Dependent Claim
137 words
An exposure apparatus for exposing a substrate to exposure energy through an original to transfer a pattern of the original onto the substrate, comprising: a first blade for limiting the exposure energy; a second blade for further limiting the exposure energy limited by said first blade; a stage unit for moving said second blade in a plane of the pattern of the original; wherein said second blade has a width measured in a predetermined direction which is slightly larger than ( l EX - l min )/2 where l EX is a length, measured in the predetermined direction of the exposure angle of view which is irradiated by the exposure energy and which is defined by the first blade; and l min is a length of a minimum exposure angle of view measured along the predetermined direction.
Claim 15
Dependent Claim
137 words
An exposure apparatus for exposing a substrate to exposure energy through an original to transfer a pattern of the original onto the substrate, comprising: a first blade for limiting the exposure energy; a second blade for further limiting the exposure energy limited by said first blade; a stage unit for moving said second blade in a plane of the pattern of the original; wherein said second blade has a width measured in a predetermined direction which is slightly larger than ( l EX - l min )/2 where l EX is a length, measured in the predetermined direction of the exposure angle of view which is irradiated by the exposure energy and which is defined by the first blade; and l min is a length of a minimum exposure angle of view measured along the predetermined direction.
Claim 16
Dependent Claim
66 words
An apparatus according to Claim 12, wherein a width of said second blade measured in a direction crossing the predetermined direction is slightly larger than ( l STG + l max ) where l STG is a distance through which said second blade moves in the crossing direction; and l max is a length, measured in the predetermined direction, of a maximum exposure angle of view.
Claim 17
Dependent Claim
90 words
Apparatus for use in the manufacture of semiconductor devices of the kind which includes means for exposing a wafer to radiation energy through a mask to transfer a pattern on the mask to the wafer, an alignment unit for detecting the position of the mask and the wafer relative to one another the alignment unit being movable relatively to the mask, and a mechancial arrangement for limiting the area of the mask to be exposed to the radiation, characterised in that the mechanical arrangement is carried on the alignment unit.
Claim 18
Dependent Claim
90 words
Apparatus for use in the manufacture of semiconductor devices of the kind which includes means for exposing a wafer to radiation energy through a mask to transfer a pattern on the mask to the wafer, an alignment unit for detecting the position of the mask and the wafer relative to one another the alignment unit being movable relatively to the mask, and a mechancial arrangement for limiting the area of the mask to be exposed to the radiation, characterised in that the mechanical arrangement is carried on the alignment unit.
References Cited (Backward Citations)
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