Patent EP0358425A2 successfully refreshed from Google Patents.
EP0358425A2
Expired / Lapsed
EP
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Position detecting method and apparatus
Assignee: Canon Inc
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Filing: 1989-09-04
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Granted: —
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Expires: 2009-09-04
Abstract
Abstract A device for detecting a positional relationship between a mask (1) and a wafer (2), includes a light source for projecting light toward the mask, a first photodetecting system (11) for detecting the position, on a predetermined plane, of first light deflected by the mask and the wafer, wherein the position of incidence on the first photodetecting system of the first light is changeable with the positional relationship between the mask and the wafer, a second photodetecting system (12) for detecting the position, on a predetermined plane, of incidence of second light deflected by the mask, wherein the position of incidence on the second photodetecting system (12), of the second light being changeable with relative inclination between the mask and the light source, and a position detecting system for detecting the relative position of the mask and the wafer on the basis of the detection by the first (11) and second (12) photodetecting systems, wherein the detection by the position detecting system can be free from the relative inclination between the mask and the light source.
Inventors
- 👤 Masakazu Matsugu
- 👤 Kenji Saitoh
- 👤 Shigeyuki Suda
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-09 20:16
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F9/7049
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
169 words
A device for detecting a positional relationship between a mask and a wafer, comprising: a light source means for projecting light toward the mask; first photodetecting means for detecting the position, on a predetermined plane, of first light deflected by the mask and the wafer, wherein the position of incidence on said first photodetecting means of the first light is changeable with the positional relationship between the mask and the wafer; second photodetecting means for detecting the position, on a predetermined plane, of incidence of second light deflected by the mask, wherein the position of incidence on said second photodetecting means, of the second light being changeable with relative inclination between the mask and said light source means; and position detecting means for detecting the relative position of the mask and the wafer on the basis of the detection by said first and second photodetecting means, wherein the detection by said position detecting means can be free from the relative inclination between the mask and said light source means.
Claim 2
Independent Claim
169 words
A device for detecting a positional relationship between a mask and a wafer, comprising: a light source means for projecting light toward the mask; first photodetecting means for detecting the position, on a predetermined plane, of first light deflected by the mask and the wafer, wherein the position of incidence on said first photodetecting means of the first light is changeable with the positional relationship between the mask and the wafer; second photodetecting means for detecting the position, on a predetermined plane, of incidence of second light deflected by the mask, wherein the position of incidence on said second photodetecting means, of the second light being changeable with relative inclination between the mask and said light source means; and position detecting means for detecting the relative position of the mask and the wafer on the basis of the detection by said first and second photodetecting means, wherein the detection by said position detecting means can be free from the relative inclination between the mask and said light source means.
Claim 3
Independent Claim
154 words
A method of detecting a positional relationship between a mask and a wafer, comprising: a first step for projecting light toward the mask; a second step for detecting the position, on a predetermined plane, of first light deflected by the mask and the wafer, wherein the position of incidence of the first light is changeable with the positional relationship between the mask and the wafer; a third step for detecting the position, on a predetermined plane, of incidence of second light deflected by the mask, wherein the position of incidence, of the second light being changeable with relative inclination between the mask and a light source; and a fourth step for detecting the relative position of the mask and the wafer on the basis of the detection at said second and third steps, wherein the detection at said fourth step can be free from the relative inclination between the mask and the light source.
Claim 4
Independent Claim
154 words
A method of detecting a positional relationship between a mask and a wafer, comprising: a first step for projecting light toward the mask; a second step for detecting the position, on a predetermined plane, of first light deflected by the mask and the wafer, wherein the position of incidence of the first light is changeable with the positional relationship between the mask and the wafer; a third step for detecting the position, on a predetermined plane, of incidence of second light deflected by the mask, wherein the position of incidence, of the second light being changeable with relative inclination between the mask and a light source; and a fourth step for detecting the relative position of the mask and the wafer on the basis of the detection at said second and third steps, wherein the detection at said fourth step can be free from the relative inclination between the mask and the light source.
Claim 5
Dependent Claim
128 words
In a method for aligning a mask with a wafer in the manufacture of a semiconductor microcircuit device the method being of the kind which employs a light source and means for creating two light paths, the first including a reflection off the mask surface and the second including a reflection off the wafer surface, the two light paths being integrated and compared at a detection point to generate an error signal indicative of any mask./wafer misalignment said signal controlling escapement means for moving the mask and wafer relative to one another to bring the error signal to zero, characterised in that the two light paths are so arranged that any angular misalignment/inclination of the light source relative to the mask has zero effect on the error signal.
Claim 6
Dependent Claim
128 words
In a method for aligning a mask with a wafer in the manufacture of a semiconductor microcircuit device the method being of the kind which employs a light source and means for creating two light paths, the first including a reflection off the mask surface and the second including a reflection off the wafer surface, the two light paths being integrated and compared at a detection point to generate an error signal indicative of any mask./wafer misalignment said signal controlling escapement means for moving the mask and wafer relative to one another to bring the error signal to zero, characterised in that the two light paths are so arranged that any angular misalignment/inclination of the light source relative to the mask has zero effect on the error signal.
References Cited (Backward Citations)
US4360273A
Cited
US4326805A
Cited
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