Abstract There is provided according to the invention a dry-etching apparatus composed of any of metal, silica, ceramic or combination thereof comprising a processing chamber (3) in which substrates are placed and a diluted anhydrous hydrogen fluoride gas generator (1), the processing chamber (3) being connected to the diluted anhydrous hydrogen fluoride gas generator (1) through a pipe line of such metal as stainless steel or nickel. There is also provided according to the invention a dry-etching method with the dry-etching apparatus, and a diluted anhydrous hydrogen gas generator (1) used in the dry-etching apparatus and dry-etching method.
(1) A dry-ethcing apparatus composed of any of metal, silica, ceramic or combination thereof comprising a processing chamber in which substrates are placed, and a diluted anhydrous hydrogen fluoride gas generator, the apparatus being characterized in that said processing chamber is connected to said diluted anhydrous hydrogen fluoride gas generator through a pipe line of such metal as stainless steel or nickel.
Claim 2
Dependent Claim
33 words
(2) A dry-etching apparatus according to claim 1, wherein an inert gas supply pipe line is connected to a branch point between said processing chamber and said diluted anhydrous hydrogen fluoride gas generator.
Claim 3
Dependent Claim
76 words
(3) A method for etching at least one of films formed on a surface of a substrate comprising the steps of continuously supplying an anhydrous inert gas to the substrate which is placed in a chamber without moisture to be processed by gas phase method, and supplying a diluted anhydrous hydrogen fluoride as for a certain time to the surface of the substrate during the period of continuously supplying an anhydrous inert gas to said substrate.
Claim 4
Dependent Claim
41 words
(4) A method according to claim 3, wherein at least one of the films reactive with hydrogen fluoride is etched away while the other films being left by changing concentration of hydrogen fluoride contained in the diluted anhydrous hydrogen fluoride gas.
Claim 5
Dependent Claim
67 words
(5) A diluted anhydrous hydrogen fluoride gas generator comprising a metal container having an inlet and an outlet for inert gas, and a cooler which cools said metal container to a predetermined temperature, said inlet and outlet for inert gas being both disposed in such a manner as not to contact liquid level of a liquefied anhydrous hydrogen fluoride gas with which said metal container is filled.
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