Patent EP0336604A2 successfully refreshed from Google Patents.
EP0336604A2
Expired / Lapsed
EP
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Mixed aldehyde novolak resins and high contrast high thermal stability positive photoresists prepared therefrom
Assignee: CNA Holdings LLC
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Filing: 1989-03-22
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Granted: —
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Expires: 2009-03-22
Abstract
Abstract Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and an aromatic aldehyde. When the aromatic aldehyde is a monohydroxy aromatic aldehyde, the novolak resin is especially useful in positive photoresist formulations in combination with a photosensitizer such as a naphthoquinone sensitizer.
Inventors
- 👤 Richard Michael Lazarus
- 👤 Randall William Kautz
- 👤 Sunit Suresh Dixit
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-09 04:14
CPC Classifications
C; C08; C08G; C08G8/00; C08G8/04; C08G8/08; C08G8/10; G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/023; G03F7/0233; G03F7/0236
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
41 words
A novolak resin which is the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) an aldehyde, characterized in that there is used as the aldehyde a mixture of formaldehyde or formaldehyde precursor and an aromatic aldehyde.
Claim 2
Dependent Claim
41 words
A novolak resin which is the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) an aldehyde, characterized in that there is used as the aldehyde a mixture of formaldehyde or formaldehyde precursor and an aromatic aldehyde.
Claim 3
Dependent Claim
18 words
A novolak resin according to Claim 1 wherein the phenol component is a mixture of m- and p-cresol.
Claim 4
Dependent Claim
17 words
A novolak resin according to Claim 2 wherein the m-and p-cresol are present in the following amounts:
Claim 5
Dependent Claim
20 words
A novolak resin according to any preceding claim wherein the phenol and aldehyde components are present in the following amounts:
Claim 6
Dependent Claim
16 words
A novolak resin according to any preceding claim, wherein the aromatic aldehyde is a monohydroxy aldehyde.
Claim 7
Dependent Claim
19 words
A novolak resin according to claim 5, wherein the monohydroxy aromatic aldehyde is selected from 2-hydroxy-benzaldehyde, 3-hydroxybenzaldehyde, and 4-hydroxybenzaldehyde.
Claim 8
Dependent Claim
18 words
A positive photoresist composition comprising: A. a novolak resin according to any preceding claim; and B. a photosensitizer.
Claim 9
Dependent Claim
16 words
A positive photoresist composition according to Claim 7 wherein the photosensitizer is a naphthoquinone diazide sentitizer.
Claim 10
Dependent Claim
25 words
A positive photoresist composition according to Claim 8 wherein the napthoquinone diazide sensitizer is selected from esters of 1,2-naphthoquinone-2-diazo-4-sulfonic acid and esters of 1,2-napthoquinone-2-diazo-5-sulfonic acid.
Claim 11
Dependent Claim
29 words
A positive photoresist composition according to Claim 9 wherein the naphthoquinone diazide sensitizer is selected from 2,3,4-trihydroxybenzophenone-1,2-naphthoquinone-2-diazo-4/sulfonic acid monoester; 2,3,4-trihydroxybenzophenone-1 2-naphthoquinone-2-diazo-4-sulfonic acid diester; 2,3,4-trihydroxybenzophenone-1,2-naphthoquinone-2-diazo-4-sulfonic acid triester and mixtures thereof.
Claim 12
Dependent Claim
30 words
A positive photoresist composition according to Claim 9 wherein the naphthoquinone diazide sensitizer is selected from 2,3,4-trihydroxybenzophenone-1,2-naphthoquinone-2-diazo-5- sulfonic acid monoester; 2,3,4-trihydroxybenzophenone-1-,2naphthoquinone-2-diazo-5-sulfonic acid diester; 2,3,4-trihydroxybenzophenone-1,2-naphthoquinone-2-diazo-5- sulfonic acid triester and mixtures thereof.
Claim 13
Independent Claim
70 words
a method of forming a resist pattern on a substrate comprising: I. coating said substrate with a layer of a positive photoresist composition according to any one of claims 7 to 11; II. exposing said layer patternwise to actinic radiation; and III. removing the exposed portion of said layer with an aqueous alkaline developer for the exposed resist composition to uncover the areas of the substrate beneath the exposed portions.
Claim 14
Dependent Claim
40 words
A substrate coated with a thermally stable and highly resolved, exposed resist pattern, said resist pattern being formed from a positive photoresist composition which, prior to exposure to actinic radiation,is as claimed in any one of claims 7 to 11.
References Cited (Backward Citations)
No citation records indexed.
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