Cathode sputtering device

Abstract

Abstract In order to be able to increase the sputtering rate in cathode sputtering units, the cooling and monitoring of the target (6) are improved. The pot-shaped cathode (1) with feed line (2) and outflow line (3) for cooling liquid (4) is closed on its upper side with a thin metal foil (5) of material having good thermal conductivity. Under the action of the cooling water pressure on one side and of the reduced pressure in the vacuum bell (0) on the other side, the foil (5) fits closely on the lower side of the target (6). To prevent the thin foil (5) from being damaged in the case of total sputtering of the target (6), a monitoring system is provided. This consists of a system of grooves (7, 8) in target (6) and cathode (1), which are connected to a high vacuum (12) via a measuring line (9) with a constrictor (11) and a connected vacuum gauge (10). <IMAGE>

Inventors

• 👤 Winfried Peter Rütt-Hübner

Bibliographic Details