Patent US4041738A successfully refreshed from Google Patents.
Patent EP0330386A2 successfully refreshed from Google Patents.
EP0330386A2
Expired / Lapsed
EP
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Radiation sensitive materials and devices made therewith
Assignee: AT&T Inc
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Filing: 1989-02-17
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Granted: —
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Expires: 2009-02-17
Abstract
Abstract Sensitive deep ultraviolet resists are formed utilizing a material that undergoes decomposition to form an acid together with a polymer including a chain scission inducing monomer such as sulfonyl units and substituent that undergoes reaction to form an acidic moiety when subjected to the photogenerated species. An exemplary composition includes poly(t-butoxycarbonyloxystyrene-sulfone) and 2,6-dinitrobenzyl-p-toluene sulfonate. The sulfonate decomposes to form sulfonic acid upon irradiation. This acid reacts with the polymer group to form an acid functionality while the sulfone moiety of the polymer induces scission. As a result, the irradiated portions of the resist material are soluble in ionic solvents while the unirradiated portions are not.
Inventors
- 👤 Francis Michael Houlihan
- 👤 Elsa Reichmanis
- 👤 Larry Flack Thompson
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-01 10:23
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/0045; G03F7/039
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
174 words
1 . A process for fabricating a device comprising the steps of forming a radiation sensitive region on a substrate, delineating said region, and a step progressing toward the completion of said device through the use of said delineated region characterized in that said radiation sensitive region comprises a material including 1) a polymer composition represented by the formula: where R₁ is chosen from the group consisting of H, lower alkyl and lower alkyl derivatives, where D comprises a chain scission inducing moiety, where R₃ is chosen from the group consisting of H, Cl, Br, lower alkyl, and lower alkyl derivatives, where R₂ is chosen such that the O-R₂ bond cleaves in the presence of acid to form a carbonium ion that is sufficiently stable to eliminate an available α-hydrogen, and where x and y indicate the relative proportions of said scission moiety to chain moiety without implying ordering of moieties in the chain, and 2) a composition that results in generation of an acidic moiety as a result of irradiation with said radiation.
Claim 2
Dependent Claim
174 words
1 . A process for fabricating a device comprising the steps of forming a radiation sensitive region on a substrate, delineating said region, and a step progressing toward the completion of said device through the use of said delineated region characterized in that said radiation sensitive region comprises a material including 1) a polymer composition represented by the formula: where R₁ is chosen from the group consisting of H, lower alkyl and lower alkyl derivatives, where D comprises a chain scission inducing moiety, where R₃ is chosen from the group consisting of H, Cl, Br, lower alkyl, and lower alkyl derivatives, where R₂ is chosen such that the O-R₂ bond cleaves in the presence of acid to form a carbonium ion that is sufficiently stable to eliminate an available α-hydrogen, and where x and y indicate the relative proportions of said scission moiety to chain moiety without implying ordering of moieties in the chain, and 2) a composition that results in generation of an acidic moiety as a result of irradiation with said radiation.
Claim 3
Dependent Claim
59 words
2 . The process of claim 1 wherein said acid generator comprises a material represented by the formula where R is not acidic, R′ comprises a member of the group consisting of H and CH₃ and Y comprises a member of the group consisting of where R₆ comprises a member chosen from the group consisting of H and CH₃.
Claim 4
Dependent Claim
14 words
3 . The process of claim 2 wherein said radiation comprises deep ultraviolet radiation.
Claim 5
Dependent Claim
17 words
4 . The process of claim 3 wherein the sources of said radiation comprises an excimer laser.
Claim 6
Dependent Claim
21 words
5 . The process of claim 2 wherein the ratio of x to y is in the range 1:1 to 1:10.
Claim 7
Dependent Claim
28 words
6 . The process of claim 5 wherein the relative concentration between said acid generator and said polymer composition is in the range 0.5 to 50 weight percent.
Claim 8
Dependent Claim
16 words
7 . The process of claim 2 wherein said radiation sensitive region is formed by spinning.
Claim 9
Dependent Claim
18 words
8 . The process of claim 2 wherein said step of progressing toward completion comprises etching or metallization.
Claim 10
Dependent Claim
14 words
9 . The process of claim 1 wherein said radiation comprises deep ultraviolet radiation.
Claim 11
Dependent Claim
17 words
10 . The process of claim 9 wherein the source of said radiation comprises an excimer laser.
Claim 12
Dependent Claim
21 words
11 . The process of claim 9 wherein the ratio of x to y is in the range 1:1 to 1:10.
Claim 13
Dependent Claim
28 words
12 . The process of claim 11 wherein the relative concentration between said acid generator and said polymer composition is in the range 0.5 to 50 weight percent.
Claim 14
Dependent Claim
16 words
13 . The process of claim 1 wherein said radiation sensitive material is formed by spinning.
Claim 15
Dependent Claim
18 words
14 . The process of claim 1 wherein said step of progressing toward completion comprises etching or metallization.
Claim 16
Dependent Claim
21 words
15 . The process of claim 1 wherein R₂ is chosen from the group consisting of t-butyl, t-butoxycarbonyl, t-amyloxycarbonyl, and 2-methyl-3-trimethylsilyl-2-propanyloxycarbonyl.
Claim 17
Dependent Claim
115 words
16 . A process for fabricating a device comprising the steps of forming a radiation sensitive region on a substrate, delineating said region, and a step progressing toward the completion of said device through the use of said delineating region characterized in that said radiation sensitive region comprises a material including 1) a material that undergoes a reaction in response to an acidic moiety and 2) an acid generating material represented by the formula where R is not acidic, R′ comprises a member of the group consisting of H and CH₃ and Y comprises a member of the group consisting of where R₆ comprises a member chosen from the group consisting of H and CH₃.
Claim 18
Dependent Claim
115 words
16 . A process for fabricating a device comprising the steps of forming a radiation sensitive region on a substrate, delineating said region, and a step progressing toward the completion of said device through the use of said delineating region characterized in that said radiation sensitive region comprises a material including 1) a material that undergoes a reaction in response to an acidic moiety and 2) an acid generating material represented by the formula where R is not acidic, R′ comprises a member of the group consisting of H and CH₃ and Y comprises a member of the group consisting of where R₆ comprises a member chosen from the group consisting of H and CH₃.
Claim 19
Dependent Claim
17 words
17 . The process of claim 16 wherein said step progressing toward completion comprises etching or metallization.
References Cited (Backward Citations)
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