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Forming method of magnetic recording medium protective film

Assignee: Panasonic Holdings Corp
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Filing: 1989-01-30
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Granted: —
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Expires: 2009-01-30
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Abstract

Abstract This invention is to present magnetic recording medium protective film possessing a metal oxide film on the surface of a magnetic disc substrate, and having a silane monomolecular adsorption film formed on this metal oxide film by chemical adsorption. According to this invention, the monomolecular adsorption film can be formed on the surface of magnetic recording medium without pinhole and in uniform thickness, which may contribute to improvement of the slipping property of the magnetic head, that is, enhancement of the wear resistance, so that a magnetic recording medium of high density, high reliability, and high performance may be realized.

Inventors

  • 👤 Hideharu Tamura
  • 👤 Kazufumi Ogawa

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-10-28 07:54
CPC Classifications
B; B82; B82Y; B82Y30/00; B05; B05D; B05D1/00; B05D1/18; B05D1/185; B82Y10/00; B82Y40/00; G; G11; G11B; G11B5/00; G11B5/62; G11B5/72; G11B5/84; Y; Y10; Y10S; Y10S428/00; Y10S428/90

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 39 words
A forming method of magnetic recording medium protective film comprising the steps of: preliminarily forming a metal oxide film on a surface of a magnetic disc substrate; and forming a silane monomolecular adsorption film on said metal oxide film.
Claim 2
Dependent Claim 39 words
A forming method of magnetic recording medium protective film comprising the steps of: preliminarily forming a metal oxide film on a surface of a magnetic disc substrate; and forming a silane monomolecular adsorption film on said metal oxide film.
Claim 3
Dependent Claim 41 words
A forming method of magnetic recording medium protective film according to claim 1, wherein fluorine atoms are contained in the chemical formula of the adsorption film in the step of forming the monomolecular adsorption film on the surface of the substrate.

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