Patent EP0305946A2 successfully refreshed from Google Patents.
EP0305946A2
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EP
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Method for removing organic and/or inorganic films by dry plasma ashing
Assignee: Toshiba Corp
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Filing: 1988-08-29
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Granted: —
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Expires: 2008-08-29
Abstract
Abstract A method and apparatus for removing organic and/or inorganic film by dry plasma ashing, in which a first gas containing halogen element and a second gas containing a water vapor gas, at least a hydrogen element or at least an oxygen element are introduced into a reaction chamber (21) containing a material (22) to be treated therein.
Inventors
- 👤 Nobuo Hayaska
- 👤 Tsunetoshi Arikada
- 👤 Haruo Okano
- 👤 Keiji Horioka
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-05 05:05
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/20; H10P70/27; H10P70/273; G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/427
Claims Analysis
Total Claims: 32
Claim 1
Independent Claim
59 words
A method for removing organic and inorganic film, comprising introducing a first gas containing a halogen element and a second gas containing at least one of water vapor gas, a third gas containing at least a hydrogen element and a fourth gas containing at least an oxygen element in a reaction chamber containing a material to be treated therein.
Claim 2
Independent Claim
59 words
A method for removing organic and inorganic film, comprising introducing a first gas containing a halogen element and a second gas containing at least one of water vapor gas, a third gas containing at least a hydrogen element and a fourth gas containing at least an oxygen element in a reaction chamber containing a material to be treated therein.
Claim 3
Dependent Claim
27 words
The method of claim 1, wherein the first gas is activated separate from the reaction chamber, and the activated first gas is introduced into the reaction chamber.
Claim 4
Dependent Claim
25 words
The method of claim 2, wherein the first gas is activated by one of heat, electron beam, light beam laser light beam and electric discharge.
Claim 5
Dependent Claim
43 words
The method of claim 1, wherein the first gas is selected from the group consisting of SF₆, NF₃, CF₄, C₂F₆, C₃F₈, SF₆ + O₂, NF₃ + O₂, CF₄ + O₂, C₂F₆ +O₂, C₃F₈ + O₂, BF₃, XeF₂, F₂, F₃Cl, FCl₃, ClF₅ and SiF₄.
Claim 6
Dependent Claim
20 words
The method of claim 1, wherein the third gas is selected from the group consisting of hydrogen, alcohols and hydrocarbons.
Claim 7
Dependent Claim
33 words
The method of claim 1, wherein the fourth gas is selected from the group consisting of water vapor gas, nitrous monoxide, nitric monoxide, nitrogen dioxide, nitrogen trioxide, carbon monoxide, carbon dioxide and alcohols.
Claim 8
Dependent Claim
19 words
The method of claim 1, wherein the second gas is introduced into the reaction chamber using a carrier gas.
Claim 9
Dependent Claim
23 words
The method of claim 7, wherein the carrier gas is selected from the group consisting of hydrogen gas, oxygen gas and argon gas.
Claim 10
Dependent Claim
33 words
The method of claim 7, wherein the carrier gas is bubbled in a solution of one of the water and an alcohol, and the bubbled carrier gas is introduced into the reaction chamber.
Claim 11
Dependent Claim
29 words
The method of claim 1, wherein at least one of the first gas and the second gas is introduced into the reaction chamber by injecting from a small opening.
Claim 12
Dependent Claim
16 words
The method of claim 1, wherein the material includes an organic compound photoresist to be removed.
Claim 13
Dependent Claim
17 words
The method of claim 11, wherein the organic compound photoresist of the material is exposed by ions.
Claim 14
Dependent Claim
13 words
The method of claim 1, wherein the material is cooled by cooling means.
Claim 15
Independent Claim
31 words
A method for removing organic and inorganic film, comprising introducing a first gas, a second gas and a third gas into a reaction chamber containing a material to be treated therein.
Claim 16
Independent Claim
31 words
A method for removing organic and inorganic film, comprising introducing a first gas, a second gas and a third gas into a reaction chamber containing a material to be treated therein.
Claim 17
Dependent Claim
20 words
The method of claim 14, wherein the first, second and third gases are gases containing fluorine, oxygen and chlorine, respectively.
Claim 18
Dependent Claim
29 words
The method of claim 15, wherein the material includes a film and a photoresist pattern formed thereon to be removed, the film having same pattern as the photoresist pattern.
Claim 19
Dependent Claim
31 words
The method of claim 16, wherein the film comprises a material selected from the group consisting of aluminum, molybdenum, tungsten, titanium, tantalum, hafnium, and silisides thereof, poly-crystalline silicon and silicon oxide.
Claim 20
Independent Claim
74 words
An apparatus for removing organic and inorganic film, comprising: a reaction chamber for containing a material to be treated; means for feeding a first gas containing a halogen element and a second gas containing at least one of water vapor gas, a third gas containing at least a hydrogen element and a fourth gas containing at least an oxygen gas into the reaction chamber; and means for discharging the gases from the reaction chamber.
Claim 21
Independent Claim
74 words
An apparatus for removing organic and inorganic film, comprising: a reaction chamber for containing a material to be treated; means for feeding a first gas containing a halogen element and a second gas containing at least one of water vapor gas, a third gas containing at least a hydrogen element and a fourth gas containing at least an oxygen gas into the reaction chamber; and means for discharging the gases from the reaction chamber.
Claim 22
Dependent Claim
36 words
The apparatus of claim 18, wherein the feeding means includes first feeding means for feeding the first gas into the reaction chamber and a second feeding means for feeding the second gas into the reaction chamber.
Claim 23
Dependent Claim
12 words
The apparatus of claim 19, also including means for cooling the material.
Claim 24
Dependent Claim
17 words
The apparatus of claim 18, also including means for generating an electric discharge in the reaction chamber.
Claim 25
Dependent Claim
49 words
The apparatus of claim 18, wherein the second gas feeding means includes: a container for containing a solution of one of water and alcohol; means for feeding a carrier gas into the solution in the container; and means for feeding a gas in the container into the reaction chamber.
Claim 26
Dependent Claim
32 words
The apparatus of claim 18, also including means for activating the first gas separate from the reaction chamber using one of heat, electron beam, light beam, laser light beam and electric discharge.
Claim 27
Dependent Claim
27 words
The apparatus of claim 18, wherein at least one of the first and second gas feeding means includes means for moving the one relative to the material.
Claim 28
Dependent Claim
30 words
The apparatus of claim 18, wherein one of the first and second gas feeding means includes a nozzle unit for supplying the gas to a certain portion of the material.
Claim 29
Dependent Claim
38 words
The apparatus of claim 18, wherein the first and second gas feeding means comprise a double tube having a first tube and a second tube, an opening of the latter being larger than an opening of the former.
Claim 30
Dependent Claim
16 words
The apparatus of claim 26, wherein the double tube comprises inner and outer concentric circular tubes.
Claim 31
Dependent Claim
16 words
The apparatus of claim 26, wherein the double tube comprises inner and outer concentric square tubes.
Claim 32
Dependent Claim
41 words
The apparatus of claim 26, wherein the first and second gas feeding means comprises at least two double tube, each having a first tube and a second tube, an opening of the latter being larger than an opening of the former
References Cited (Backward Citations)
No citation records indexed.
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