EP0304220A1
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Thin film carbon material and method of depositing the same
Assignee: Semiconductor Energy Laboratory Co Ltd
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Filing: 1988-08-10
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Granted: —
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Expires: 2008-08-10
Abstract
Abstract While CVD (chemical vapor deposition) methods and enhanced CVD methods for the production of thin films have recently been attracting considerable interest, it has not hitherto been possible to deposit satisfactory carbon films by use of these techniques. The invention discloses a modification of the conventional CVD process for carbon deposition in accordance with which a halogen gas or a halogen compound gas is introduced into the carbon gas which is to be dissociated for deposition of carbon. By virtue of the introduction of the halogen or halogen compound, it has been found possible to form diamond or i-carbon films and moreover characteristics of the films, such as their optical transmissivity, electrical conductivity and hardness, can easily be controlled by controlling the halogen introduction conditions. CVD apparatuses for carrying out the process are also disclosed, and several applications of carbon thin films are disclosed.
Inventors
- 👤 Shunpei Yamazaki
- 👤 Shigenori Hayashi
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-06 20:10
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/24; C23C16/00; C23C16/22; C23C16/26
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
38 words
A CVD process for the deposition of carbon by dissociation in a reaction chamber of a productive gas comprising carbon, said process being characterized in that a gas comprising a halogen is additionally introduced into the reaction chamber.
Claim 2
Dependent Claim
38 words
A CVD process for the deposition of carbon by dissociation in a reaction chamber of a productive gas comprising carbon, said process being characterized in that a gas comprising a halogen is additionally introduced into the reaction chamber.
Claim 3
Independent Claim
78 words
A method of depositing a material consisting mainly of carbon, said method comprising the steps of: placing an object in a reaction chamber; introducing a productive gas comprising carbon into said reaction chamber; and inputting energy into said reaction chamber in order to decompose said carbon gas and deposit the carbon product of the decomposition on the surface of said object. wherein a gas comprising a halogen is further introduced into said reaction chamber with said carbon gas.
Claim 4
Independent Claim
78 words
A method of depositing a material consisting mainly of carbon, said method comprising the steps of: placing an object in a reaction chamber; introducing a productive gas comprising carbon into said reaction chamber; and inputting energy into said reaction chamber in order to decompose said carbon gas and deposit the carbon product of the decomposition on the surface of said object. wherein a gas comprising a halogen is further introduced into said reaction chamber with said carbon gas.
Claim 5
Dependent Claim
13 words
The method of claim 2 wherein said halogen gas comprises a halogen compound.
Claim 6
Dependent Claim
13 words
The method of claim 2 or 3 wherein said halogen gas comprises fluorine.
Claim 7
Independent Claim
29 words
The method of any of claims 2 to 4 wherein said carbon gas is diluted with hydrogen and/or a catalyst or is introduced together with hydrogen and/or a catalyst.
Claim 8
Independent Claim
16 words
The method of any of claims 2 to 5 wherein said input energy comprises microwave energy.
Claim 9
Dependent Claim
18 words
The method of claim 6 wherein the frequency of said microwave energy is not lower than 400 MHz.
Claim 10
Dependent Claim
26 words
The method of claim 6 or 7 wherein said reaction chamber is subjected to a magnetic field substantially in the propagating direction of said microwave energy.
Claim 11
Independent Claim
19 words
The method of any of claims 2 to 8 wherein said input energy comprises a high frequency electric voltage.
Claim 12
Independent Claim
26 words
The method of any of claims 2 to 9 wherein the object to be coated is made of glass, metal, ceramics, plastics, or an organic resin.
Claim 13
Independent Claim
62 words
A method of performing carbon deposition comprising: disposing an object to be coated in a reaction chamber; introducing a carbon compound gas and a halogen compound gas into said reaction chamber; and inputting electrical energy into said reaction chamber in order to decompose said carbon compound gas and deposit and the carbon product of the decomposition on the surface of said object.
Claim 14
Independent Claim
62 words
A method of performing carbon deposition comprising: disposing an object to be coated in a reaction chamber; introducing a carbon compound gas and a halogen compound gas into said reaction chamber; and inputting electrical energy into said reaction chamber in order to decompose said carbon compound gas and deposit and the carbon product of the decomposition on the surface of said object.
Claim 15
Dependent Claim
31 words
An object having a surface made of glass, metal, ceramics, plastics or organic resin, and wherein a coating composed mainly of carbon and containing halogen atoms is provided on said surface.
Claim 16
Dependent Claim
31 words
An object having a surface made of glass, metal, ceramics, plastics or organic resin, and wherein a coating composed mainly of carbon and containing halogen atoms is provided on said surface.
Claim 17
Dependent Claim
18 words
The object of claim 12 wherein the density of halogen is non-uniform across the thickness of the coating.
Claim 18
Dependent Claim
14 words
The object of claim 12 or 13 wherein said coating further contains hydrogen atoms.
Claim 19
Dependent Claim
42 words
A chemical vapour deposition (CVD) apparatus adapted for the deposition of carbon by dissociation of a productive gas comprising carbon, and wherein means are provided for enabling the addition of a halogen gas or a halogen compound gas to the productive gas.
Claim 20
Dependent Claim
42 words
A chemical vapour deposition (CVD) apparatus adapted for the deposition of carbon by dissociation of a productive gas comprising carbon, and wherein means are provided for enabling the addition of a halogen gas or a halogen compound gas to the productive gas.
References Cited (Backward Citations)
EP0063493A2
Cited
EP0175980A2
Cited
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