Patent EP0302506A2 successfully refreshed from Google Patents.
EP0302506A2
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EP
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Method and apparatus for fabricating superconductive thin films
Assignee: Hitachi Ltd
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Filing: 1988-08-04
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Granted: —
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Expires: 2008-08-04
Abstract
Abstract Chemical reactions of superconducting raw materials (10) with active oxygen atoms and their charged particles are accelerated by using at least oxygen plasma in the fabrication process of a superconductive body (1). Thereby an ionic crystal is grown in a short time, which provides stable superconducting materials of high quality such as high critical temperature and low resistivity. In another aspect, a substrate (2) is irradiated simultaneously with streams (13) of vapor of metal elements, of which a superconductive body is to be composed, and a stream (13) of gas of ions generated in a plasma chamber (20) and film growth is effected while keeping the substrate (2) at a temperature higher than 400°C to produce a ceramic type superconductive thin film.
Inventors
- 👤 Yukio Okamoto
- 👤 Toshiyuki Aida
- 👤 Katsuki Miyauchi
- 👤 Kazumasa Takagi
- 👤 Tokuumi Fukazawa
- 👤 Shinji Takayama
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-09 02:30
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/0021; C23C14/0036; H; H10; H10N; H10N60/00; H10N60/01; H10N60/0268; H10N60/0296; H10N60/0492; C23C14/0026; C23C14/0031; C23C14/06; C23C14/08; C23C14/087; C23C14/22; C23C14/24; C23C14/32; C23C16/00; C23C16/22; C23C16/30; C23C16/40; C23C16/408; C23C16/44; C23C16/50; C23C16/517; C23C4/00; C23C4/04; C23C4/10; C23C4/11; H10N60/0548; Y; Y10; Y10S; Y10S505/00; Y10S505/725; Y10S505/73; Y10S505/732; Y10S505/786
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
23 words
A method for fabricating superconducting materials, wherein at least oxygen plasma is used in the fabrication process of an oxide superconductive body (1).
Claim 2
Independent Claim
23 words
A method for fabricating superconducting materials, wherein at least oxygen plasma is used in the fabrication process of an oxide superconductive body (1).
Claim 3
Independent Claim
87 words
A method for fabricating ceramic type superconducting materials, comprising the steps of applying a vapor of metal elements, of which a superconductive body (1) is to be composed, said vapor being generated in an evaporation chamber (11) evacuated to a high vacuum by a differential pumping mechanism (17, 19), and a gas of ions generated in a plasma chamber (20) to a substrate (2); and subjecting said vapor and said gas to react with each other on said substrate to grow a superconductive thin film by crystallization.
Claim 4
Independent Claim
87 words
A method for fabricating ceramic type superconducting materials, comprising the steps of applying a vapor of metal elements, of which a superconductive body (1) is to be composed, said vapor being generated in an evaporation chamber (11) evacuated to a high vacuum by a differential pumping mechanism (17, 19), and a gas of ions generated in a plasma chamber (20) to a substrate (2); and subjecting said vapor and said gas to react with each other on said substrate to grow a superconductive thin film by crystallization.
Claim 5
Dependent Claim
38 words
A method for fabricating superconducting materials according to Claim 2, using as said gas of ions, plasma of ions generated by means of an electron cyclotron resonance microwave plasma generator or a radio frequency plasma generator (5, 6).
Claim 6
Dependent Claim
28 words
A method for fabricating superconducting materials according to Claim 2, wherein each of streams (13) of vapor of plural metal elements is controlled relative to its flow rate.
Claim 7
Independent Claim
89 words
A method for fabricating ceramic type superconducting materials, comprising the steps of providing a vapor of metal elements, of which a superconductive body (1) is to be composed, said vapor being generated in an evaporation chamber (11) evacuated to a high vacuum by a differential pumping mechanism (17, 19); providing a gas of ions generated in a plasma chamber (20); reacting said vapor and said ion gas with each other on a substrate (2) at a temperature higher than 400°C to produce a superconductive thin film on said substrate.
Claim 8
Independent Claim
89 words
A method for fabricating ceramic type superconducting materials, comprising the steps of providing a vapor of metal elements, of which a superconductive body (1) is to be composed, said vapor being generated in an evaporation chamber (11) evacuated to a high vacuum by a differential pumping mechanism (17, 19); providing a gas of ions generated in a plasma chamber (20); reacting said vapor and said ion gas with each other on a substrate (2) at a temperature higher than 400°C to produce a superconductive thin film on said substrate.
References Cited (Backward Citations)
No citation records indexed.
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