Patent EP0284436A2 successfully refreshed from Google Patents.
EP0284436A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Substrate-treating apparatus
Assignee: Canon Inc
•
Filing: 1988-03-25
•
Granted: —
•
Expires: 2008-03-25
Abstract
Abstract An apparatus for treating a substrate is provided which comprises a chamber for encasing the substrate and provided with a microwave-introducing section, and a means for generating plasma withing the chamber to treat the substrate by the plasma. In the apparatus the means for generating plasma is provided to generate plasma in vicinity of the substrate and in a spatial zone sufficiently small as compared with the size of said chamber.
Inventors
- 👤 Kazuaki Ohmi
- 👤 Tohru Den
- 👤 Hisanori Tsuda
- 👤 Masao Sugata
- 👤 Kohjiro Yokono
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-31 13:01
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32623; C; C23; C23C; C23C16/00; C23C16/04; C23C16/047; C23C16/44; C23C16/50; C23C16/511; H01J37/32009; H01J37/32366; H01J37/3266; H01J37/32678
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
65 words
An apparatus for treating a substrate, comprising a chamber for encasing the substrate and provided with a microwave-introducing section, and a means for generating plasma within said chamber to treat the substrate by said plasma, said means for generating plasma being provided to generate plasma in vicinity of the substrate and in a spatial zone sufficiently small as compared with the size of said chamber.
Claim 2
Independent Claim
65 words
An apparatus for treating a substrate, comprising a chamber for encasing the substrate and provided with a microwave-introducing section, and a means for generating plasma within said chamber to treat the substrate by said plasma, said means for generating plasma being provided to generate plasma in vicinity of the substrate and in a spatial zone sufficiently small as compared with the size of said chamber.
Claim 3
Dependent Claim
17 words
The apparatus of Claim 1, wherein said plasma is formed by utilizing electronic cyclotron resonance of microwaves.
Claim 4
Dependent Claim
19 words
The apparatus of Claim 1, wherein said substrate is disposed at a position kept apart from the microwave-introducing section.
Claim 5
Dependent Claim
19 words
The apparatus of Claim 1, wherein said means for generating plasma is a means for forming a magnetic field.
Claim 6
Dependent Claim
18 words
The apparatus of Claim 1, wherein a mesh is provided between a plasma formation zone and the substrate.
Claim 7
Independent Claim
43 words
An apparatus for treating a substrate, comprising a chamber for enclosing the substrate, and a means for generating plasma in a zone adjacent to the substrate within the chamber, the volume of said zone being substantially smaller than the volume of the chamber.
Claim 8
Independent Claim
43 words
An apparatus for treating a substrate, comprising a chamber for enclosing the substrate, and a means for generating plasma in a zone adjacent to the substrate within the chamber, the volume of said zone being substantially smaller than the volume of the chamber.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.