Patent EP0275970A2 successfully refreshed from Google Patents.
EP0275970A2
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Positive-working photoresist composition
Assignee: Fujifilm Holdings Corp
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Filing: 1988-01-19
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Granted: —
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Expires: 2008-01-19
Abstract
Abstract A positive-working photoresist composition is disclosed, which comprises a light-sensitive substance of 1,2-naphthoquinonediazide-4- and/or -5-sulfonate of 2,3,4,3ʹ,4ʹ,5ʹ-hexahydroxybenzophenone and an alkali-soluble novolak resin dissolved in ethyl lactate or methyl lactate.
Inventors
- 👤 Yasumasa Fuji Photo Film Co. Ltd. Kawabe
- 👤 Kazuya Fuji Photo Film Co. Ltd. Uenishi
- 👤 Tadayoshi Fuji Photo Film Co. Ltd. Kokubo
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-09 04:45
CPC Classifications
G; G03; G03C; G03C1/00; G03C1/72; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/0226; G03F7/039
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
28 words
A positive-working photoresist composition which comprises, as a light-sensitive substance, a 1,2-naphthoquinonediazide-4- and/or -5-sulfonate of 2,3,4,3ʹ,4ʹ,5ʹ-hexahydroxybenzophenone and an alkali-soluble novolak resin dissolved in ethyl lactate or methyl lactate.
Claim 2
Dependent Claim
28 words
A positive-working photoresist composition which comprises, as a light-sensitive substance, a 1,2-naphthoquinonediazide-4- and/or -5-sulfonate of 2,3,4,3ʹ,4ʹ,5ʹ-hexahydroxybenzophenone and an alkali-soluble novolak resin dissolved in ethyl lactate or methyl lactate.
Claim 3
Dependent Claim
42 words
The positive-working photoresist composition of Claim 1, wherein said 1,2-naphthoquinonediazide-4- and/or -5-sulfonate of 2,3,4,3ʹ,4ʹ,5ʹ-hexahydroxybenzophenone is represented by the formula (A): wherein the R's may be the same or different and each represents a hydrogen atom, a 1,2-naphthoquinonediazide-4-sulfonyl group or a 1,2-naphthoquinonediazide-5-sulfonyl group.
Claim 4
Dependent Claim
25 words
The positive-working photoresist composition of Claim 1 or 2, wherein said 1,2-naphthoquinonediazide-4- and/or -5-sulfonate of 2,3,4,3ʹ,4ʹ,5ʹ-hexahydroxybenzophenone has an esterification ratio of not less than 40%.
Claim 5
Dependent Claim
25 words
The positive-working photoresist composition of any one of Claims 1 to 3, wherein the alkali-soluble novolak resin has a molecular weight of 1,000 to 50,000.
Claim 6
Dependent Claim
40 words
The positive-working photoresist composition of any one of Claims 1 to 4, wherein the alkali-soluble novolak resin is the acid catalyzed addition condensation product of a phenol with 0.6 to 1.0 mol of an aldehyde per mol of the phenol.
Claim 7
Dependent Claim
38 words
The positive-working photoresist composition of any one of Claims 1 to 5, wherein the light-sensitive substance is present in an amount of 5 to 100 parts by weight per 100 parts by weight of the alkali-soluble novolak resin.
Claim 8
Dependent Claim
36 words
The positive-working photoresist composition of any one of Claims 1 to 6, wherein the solid content of the composition is from about 10 to about 50% by weight based on the total weight of the composition.
References Cited (Backward Citations)
No citation records indexed.
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