Patent EP0273026A2 successfully refreshed from Google Patents.
EP0273026A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Solvents for Photoresist compositions
Assignee: Shipley Co Inc
•
Filing: 1987-12-22
•
Granted: —
•
Expires: 2007-12-22
Abstract
Abstract This invention is directed to novel photoresist processes and compositions having high resolution novalac resins, high resolution photoactive components with several diazoquinone groups per molecule, and solvents having a high solvency power, better safety, improved photospeed, higher contrast and equivalent cast film thickness from lower percent solids formulations.
Inventors
- 👤 Brian Kenneth Daniels
- 👤 David Charles Madoux
- 👤 Michael Karpovich Templeton
- 👤 Peter Trefonas Iii
- 👤 James Calvin Woodbrey
- 👤 Anthony Zampani
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-02 17:23
CPC Classifications
G; G03; G03C; G03C1/00; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/0226; G03F7/0048; G03F7/16
Claims Analysis
Total Claims: 69
Claim 1
Independent Claim
247 words
A pattern-forming process comprising at least the steps of: i. providing an essentially solvent-free radiation-sensitive film consisting essentially of an admixture of at least one alkali-soluble resin and at least one PAC on a solid substrate, wherein the ratio by weight of said resin(s) to said PAC(s) is in the range of 1:12 to 12:1, the average mole ratio of photoactive substituent groups to ballast groups of said PAC(s) is greater than 2.1:1, and at least 44 percent by weight of the PAC molecules have no acidic hydrophilic groups; ii. by way of imagewise or patternwise exposure of the said essentially solvent-free film to energetic radiation, combined with any other chemical reactions, converting. 15 to 100 percent of said photoactive substituent groups in the exposed areas of said film from hydrophobic to acidic hydrophilic; iii. developing the resist pattern by dissolution of said exposed areas by contacting with aqueous alkaline developer, wherein the rate of said dissolution is essentially controlled by the PAC radioloysis products or photoproducts with three or more radio- or photochemically produced hydrophilic groups bonded to a single ballast molecule; and iv. by quickly removing said film from contact with said developer, or by quickly diluting or neutralizing said developer with water or acid, terminating the development step less than five minutes after it was started and obtaining essentially no exposed film remaining and an unexposed film thickness remaining of at least 97 percent of the original thickness of said essentially solvent-free resist film.
Claim 2
Dependent Claim
247 words
A pattern-forming process comprising at least the steps of: i. providing an essentially solvent-free radiation-sensitive film consisting essentially of an admixture of at least one alkali-soluble resin and at least one PAC on a solid substrate, wherein the ratio by weight of said resin(s) to said PAC(s) is in the range of 1:12 to 12:1, the average mole ratio of photoactive substituent groups to ballast groups of said PAC(s) is greater than 2.1:1, and at least 44 percent by weight of the PAC molecules have no acidic hydrophilic groups; ii. by way of imagewise or patternwise exposure of the said essentially solvent-free film to energetic radiation, combined with any other chemical reactions, converting. 15 to 100 percent of said photoactive substituent groups in the exposed areas of said film from hydrophobic to acidic hydrophilic; iii. developing the resist pattern by dissolution of said exposed areas by contacting with aqueous alkaline developer, wherein the rate of said dissolution is essentially controlled by the PAC radioloysis products or photoproducts with three or more radio- or photochemically produced hydrophilic groups bonded to a single ballast molecule; and iv. by quickly removing said film from contact with said developer, or by quickly diluting or neutralizing said developer with water or acid, terminating the development step less than five minutes after it was started and obtaining essentially no exposed film remaining and an unexposed film thickness remaining of at least 97 percent of the original thickness of said essentially solvent-free resist film.
Claim 3
Dependent Claim
114 words
The process of claim 1, wherein: a) said resin(s) is an alkali-soluble phenolic resin; b) said PAC(s) is that defined in claim 3; c) said essentially solvent-free film has a non-bleachable absorption in the spectral region of 355 to 450 nm of less than 10 percent; d) said average mole ratio of photoactive groups to ballast groups of said PAC(s) is greater than 2.4:1; e) at least 54 percent by weight of the PAC molecules have no acidic hydrophilic groups; f) by way of said exposure, converting 35 to 100 percent of said photoactive substituent groups as defined in claim 1, g) said developer is essentially 0.12 to 0.6 molar tetraalkylammonium hydroxide in water.
Claim 4
Dependent Claim
56 words
A composition comprising a single-phase liquid mixture of: (a) at least one PAC consisting of an oxo-diazonaphthalene-sulfonate or carboxylate polyester of a polyhydroxy ballast compound; (b) at least one alkali soluble phenolic resin; and (c) a solvent, wherein the ratio by weight of said resin(s) to said PAC(s) is in the range of 1:12to 12:1, and:
Claim 5
Dependent Claim
56 words
A composition comprising a single-phase liquid mixture of: (a) at least one PAC consisting of an oxo-diazonaphthalene-sulfonate or carboxylate polyester of a polyhydroxy ballast compound; (b) at least one alkali soluble phenolic resin; and (c) a solvent, wherein the ratio by weight of said resin(s) to said PAC(s) is in the range of 1:12to 12:1, and:
Claim 6
Dependent Claim
106 words
i. the average mole ratio of oxo-diazonaphthalene groups to said ballast compound(s) of said PAC(s) is greater than 2.1:1; ii. at least 44 percent by weight of the PAC molecules have no acidic hydrophilic groups; and iii. following radiolysis or photolysis of a thin, dried, essentially solvent-free film of said composition under normal conditions, the indene-carboxylic acid radiolysis products or photoproducts with three or more indene-carboxylic acid groups bonded to a single ballast compound essentially control the dissolution rate of the irradiated film in aqueous alkaline developer, and, after complete development, the unexposed film thickness remaining is at least 97 percent of the original film thickness.
Claim 7
Dependent Claim
106 words
i. the average mole ratio of oxo-diazonaphthalene groups to said ballast compound(s) of said PAC(s) is greater than 2.1:1; ii. at least 44 percent by weight of the PAC molecules have no acidic hydrophilic groups; and iii. following radiolysis or photolysis of a thin, dried, essentially solvent-free film of said composition under normal conditions, the indene-carboxylic acid radiolysis products or photoproducts with three or more indene-carboxylic acid groups bonded to a single ballast compound essentially control the dissolution rate of the irradiated film in aqueous alkaline developer, and, after complete development, the unexposed film thickness remaining is at least 97 percent of the original film thickness.
Claim 8
Dependent Claim
20 words
The composition of claim 3, wherein said solvent is selected from the group of solvents as defined in claim 15.
Claim 9
Dependent Claim
174 words
A composition comprising a single-phase liquid mixture of: (a) at least one PAC consisting of an oxo-diazonaphthalene-sulfonate or carboxylate polyester of a polyhydroxy ballast compound; (b) at least one resin selected from the group consisting of resins as defined in claims 23, 29, 30, 41 and 42; and (c) a solvent, wherein the ratio by weight of said resin(s) to said PAC(s) is in the range of 1:12 to 12:1, and: I. the average mole ratio of oxo-diazonaphthalene groups to said ballast compound is greater than 2.1:1, ii. at least 44 percent by weight of the PAC molecules have no acidic hydrophilic groups, and iii. following radiolysis or photolysis of a thin, dried, essentially solvent-free film of said composition under normal conditions, the indene-carboxylic acid radiolysis products or photoproducts with three or more indene-carboxylic acid groups bonded to a single ballast compound essentially control the dissolution rate of the irradiated film in aqueous alkaline developer, and; after complete development, the unexposed film thickness remaining is at least 97 percent of the original film thickness.
Claim 10
Dependent Claim
20 words
The composition of claim 5 wherein said solvent is selected from the group of solvents as defined In claim 15.
Claim 11
Dependent Claim
178 words
A composition comprising a single-phase liquid mixture of: (a) at least one PAC consisting of an oxo-diazonaphthalene-sulfonate or carboxylate polyester of a polyhydroxy ballast compound; (b) at least one resin selected from the group consisting of resins as defined in claims 23,29,30,41 and 42; and (c) a solvent as defined in claims 15,17 and 18, wherein the ratio by weight of said resin to said PAC(s) is in the range of 1:12 to 12:1, and: i. the average mole ratio of oxo-diazonaphthalene groups to said ballast compound is greater than 2.1:1, ii. at least 44 percent by weight of the PAC molecules have no acidic hydrophilic groups, and iii. following radiolysis or photolysis of a thin, dried, essentially solvent-free film of said composition under normal conditions, the indene-carboxylic acid radiolysis products or photoproducts with three or more indene-carboxylic acid groups bonded to a single ballast compound essentially control the dissolution rate of the irradiated film in aqueous alkaline developer, and, after complete development, the unexposed film thickness remaining is at least 97 percent of the original film thickness.
Claim 12
Dependent Claim
50 words
A composition selected from the group of compositions as defined in claims 3 and 7, wherein the non-bleachable absorption in the spectral region of 355 to 450nm of said essentially solvent-free film is less than 10 percent and said developer is essentially 0.15 to 0.6 molar tetraalkylammonium hydroxide in water.
Claim 13
Dependent Claim
19 words
A composition of claim 8, wherein said PAC is practically transparent in the spectral region of 450 to 650nm.
Claim 14
Dependent Claim
66 words
A composition composed of a mixture of at least one PAC polyester as defined in claim 52, and a resin selected from the group of resins as defined in claims 23, 29, 30, 41 and 42 dissolved in a solvent as defined in claim 15, wherein the ratio by weight of said resin to said PAC polyester is in the range of from 2:1 to 12:1.
Claim 15
Dependent Claim
87 words
A composition comprising a mixture of at least one PAC ester or polyester selected from the group of PAC esters and polyesters as defined in claims 53 and 54 and at least one resin selected from the group of resins as defined in claims 23, 29, 30, 41 and 42 dissolved in at least one solvent selected from the group of solvents as defined in claim 15, wherein the ratio by weight of said resin to said PAC(s) is in the range of from 2:1 to 12:1.
Claim 16
Dependent Claim
84 words
A composition selected from the group of compositions as defined in claims 7 and 8, wherein the PAC is selected from the group of polyester(s) defined by Formula 6, where R 1 to R 3 are selected from: X number of 1-oxo-2-diazonaphthalene-4 or 5-sulfonate residues, and Y number of hydroxy groups, where, on the average, X is in the range of 2.1 to 2.85 and the ratio by weight of said resin to said PAC is in the range of from 2:1 to 12:1.
Claim 17
Dependent Claim
35 words
A composition selected from the group of compositions as defined in claims 8 and 9, wherein the PAC is that as defined in claim 12 with X in the range of about 2.4 to 2.85.
Claim 18
Dependent Claim
79 words
A composition selected from the group of compositions as defined in claims 7, 8, and 9, wherein the PAC is a polyester of Formula 7, where R 1 to R 3 are selected from: X number of 1-oxo-2-diazonaphthalene-4 or 5-sulfonate residues, and Y number of hydroxy groups, where, on the average, X is in the range of 2.1 to 2.85 and the ratio by weight of said resin to said PAC(s) is in the range of 2:1 to 12:1
Claim 19
Dependent Claim
234 words
A composition comprising: (a) at least one soluble resin, (b) at least one PAC consisting of an ester or polyester of the type(s) derived from the reaction of an oxo-diazonaphthalene sulfonyl or carboxylic acid halide with a hydroxy or polyhydroxy ballast compound, and (c) a solvent which comprises: i) 5 to 100 percent by weight of a compound or a mixture of compounds which compounds individually have: (a) solubility parameters 8 d , 8p, and 8 h , expressed in units of (cal/cm 3 ) 0.5, of: and (b) normal boiling point within the range of 110 to 180° C, (c) C, H, and one or more of the heteroatoms O, F, Cl, but excluding cycloaliphatic ketones and alkalene glycol monoalkyl ether acetates; or ii) a mixture of compounds, wherein the fraction of the mixture that is composed of compounds which individually: a) have normal boiling points in the range of 110 to 180° C, and b) contain C, H and optionally one or more of the heteroatoms O, F, Cl, but excluding cycloaliphatic ketones and alkalene glycol monoalkyl ether acetates, has aggregate solubility parameters, 8 d , 8p, and δ h , expressed in units of (cal/cm 3 0.5,of: and and weight-average boiling point for the compounds in said fraction in the range of 110°C to 180°C, said fraction comprising at least 30 percent by weight of the total compounds in said solvent.
Claim 20
Dependent Claim
234 words
A composition comprising: (a) at least one soluble resin, (b) at least one PAC consisting of an ester or polyester of the type(s) derived from the reaction of an oxo-diazonaphthalene sulfonyl or carboxylic acid halide with a hydroxy or polyhydroxy ballast compound, and (c) a solvent which comprises: i) 5 to 100 percent by weight of a compound or a mixture of compounds which compounds individually have: (a) solubility parameters 8 d , 8p, and 8 h , expressed in units of (cal/cm 3 ) 0.5, of: and (b) normal boiling point within the range of 110 to 180° C, (c) C, H, and one or more of the heteroatoms O, F, Cl, but excluding cycloaliphatic ketones and alkalene glycol monoalkyl ether acetates; or ii) a mixture of compounds, wherein the fraction of the mixture that is composed of compounds which individually: a) have normal boiling points in the range of 110 to 180° C, and b) contain C, H and optionally one or more of the heteroatoms O, F, Cl, but excluding cycloaliphatic ketones and alkalene glycol monoalkyl ether acetates, has aggregate solubility parameters, 8 d , 8p, and δ h , expressed in units of (cal/cm 3 0.5,of: and and weight-average boiling point for the compounds in said fraction in the range of 110°C to 180°C, said fraction comprising at least 30 percent by weight of the total compounds in said solvent.
Claim 21
Dependent Claim
14 words
The composition of claim 15, wherein said soluble resin(s) is an alkali-soluble phenolic resin.
Claim 22
Dependent Claim
81 words
A composition comprising: (a) at least one soluble resin, (b) at least one PAC consisting of an ester or polyester of the type(s) derived from the reaction of an oxo-diazonaphthaiene sulfonyl or carboxylic acid halide with a hydroxy or polyhydroxy ballast compound, and (c) a solvent selected from the group consisting of: anisole, ethyl lactate, methyl lactate; ethyl-2-ethoxy acetate, methyl-2-me'thoxy acetate, methyl-3-methoxy propionate, ethyl-3-methoxy propibnate, pyruvic aldehyde dimethylacetal, acetol, ethyl 2-ethoxy-2-hydroxy acetate, ethyl 2-hydroxyisobutyrate, amyl acetate, hexyl acetate, and methylaceto acetate.
Claim 23
Dependent Claim
81 words
A composition comprising: (a) at least one soluble resin, (b) at least one PAC consisting of an ester or polyester of the type(s) derived from the reaction of an oxo-diazonaphthaiene sulfonyl or carboxylic acid halide with a hydroxy or polyhydroxy ballast compound, and (c) a solvent selected from the group consisting of: anisole, ethyl lactate, methyl lactate; ethyl-2-ethoxy acetate, methyl-2-me'thoxy acetate, methyl-3-methoxy propionate, ethyl-3-methoxy propibnate, pyruvic aldehyde dimethylacetal, acetol, ethyl 2-ethoxy-2-hydroxy acetate, ethyl 2-hydroxyisobutyrate, amyl acetate, hexyl acetate, and methylaceto acetate.
Claim 24
Dependent Claim
27 words
The composition of claim 17, wherein said solvent further contains at least one compound selected from the group consisting of: chlorobenzene, xylene, 4-hydroxy-4-methyl-2-pentanone, methoxy-2-propanol, 1-ethoxy-2-propanol, and 3-ethoxy-propanol.
Claim 25
Dependent Claim
31 words
A composition selected from the group of compositions as defined in claims 15 and 17, wherein said solvent contains a compound selected from the group consisting of ethyl lactate and anisole.
Claim 26
Dependent Claim
56 words
The composition selected from the group of compositions as defined in claims 15 and 17, wherein said solvent mixture contains a compound selected from the group consisting of ethyl lactate, anisole and mixtures thereof with a compound selected from the group consisting of amyl acetate, n-butyl acetate, n-butyl propionate, chlorobenzene, and isobutyl isobutyrate and mixtures thereof.
Claim 27
Dependent Claim
69 words
A positive photoresist composition comprising a resin, a PAC and a sufficient amount of a solvent to dissolve the resin and PAC in order to form a single liquid phase wherein said solvent is selected form the group consisting of: anisole, ethyl lactate, methyl lactate, ethyj-2-ethoxy acetate, methyl-2-methoxy acetate, methyl-3-methoxy propionate, ethyl-3-methoxy propionate, pyruvic aldehyde dimethylacetal, acetol, ethyl 2-ethoxy-2-hydroxy acetate, ethyl 2-hydroxyisobutyrate, amyl acetate, hexyl acetate, and methylaceto acetate.
Claim 28
Dependent Claim
69 words
A positive photoresist composition comprising a resin, a PAC and a sufficient amount of a solvent to dissolve the resin and PAC in order to form a single liquid phase wherein said solvent is selected form the group consisting of: anisole, ethyl lactate, methyl lactate, ethyj-2-ethoxy acetate, methyl-2-methoxy acetate, methyl-3-methoxy propionate, ethyl-3-methoxy propionate, pyruvic aldehyde dimethylacetal, acetol, ethyl 2-ethoxy-2-hydroxy acetate, ethyl 2-hydroxyisobutyrate, amyl acetate, hexyl acetate, and methylaceto acetate.
Claim 29
Dependent Claim
30 words
A composition selected from the groups of claims 15 and 17, wherein said solvent or mixtures of solvents contains distilled ethyl lactate having a purity of greater than 99 percent.
Claim 30
Dependent Claim
64 words
A photoresist composition comprising a mixture of at least one soluble phenolic resin, at least one photosensitizer, at least one solvent and, optionally, additives, wherein the resin(s) is the condensation product of a mixture of at least two cresol isomers with formaldehyde in which the level of meta-cresol in said cresol mixture is less than 46 percent of the total amount of the cresols.
Claim 31
Dependent Claim
64 words
A photoresist composition comprising a mixture of at least one soluble phenolic resin, at least one photosensitizer, at least one solvent and, optionally, additives, wherein the resin(s) is the condensation product of a mixture of at least two cresol isomers with formaldehyde in which the level of meta-cresol in said cresol mixture is less than 46 percent of the total amount of the cresols.
Claim 32
Dependent Claim
35 words
The composition of claim 23, wherein the said cresol isomers in said cresol mixture are present in amounts of less than 30 percent ortho-cresol, 25 to 46 percent meta-cresol and 24 to 75 percent para-cresol.
Claim 33
Dependent Claim
35 words
The composition of claim 23, wherein the said cresol isomers in said cresol mixture are present in amounts of less than 10 percent ortho-cresol, 40 to 46 percent meta-cresol and 44 to 60 percent para-cresol.
Claim 34
Dependent Claim
30 words
The composition of claim 23, wherein the said cresol isomers in said cresol mixture are present in amounts of 43 to 46 percent meta-cresol and 54 to 57 percent para-cresol.
Claim 35
Dependent Claim
33 words
A composition selected from the group of compositions as defined in claims 23 to 26, wherein said resin(s) is produced by condensing said cresol isomers with formaldehyde in the presence of an acid.
Claim 36
Dependent Claim
18 words
The composition of claim 27, wherein said resin(s) has a weight-average molecular weight of 4,000 to 35,000 Daltons.
Claim 37
Dependent Claim
38 words
The composition of claim 23, wherein said resin(s) is a polymer formed by condensing in the presence of an acid at least. one bishydroxymethyl substituted phenolic compound and at least one reactive phenolic compound capable of sustaining polymerization.
Claim 38
Dependent Claim
43 words
The composition of claim 23, wherein said resin(s) is substantially a block copolymer formed by condensing in the presence of an acid a resin formed as defined in claim 29 with formaldehyde and at least one reactive phenolic compound capable of sustaining polymerization.
Claim 39
Dependent Claim
45 words
A composition selected from the group consisting of the compositions as defined in claims 29 or 30, wherein said reactive phenolic compound(s) is selected from the group consisting of phenol, cresol, dimethylphenol, trimethylphenol, naphthols, biphenol, phenylphenol, bis(hydroxyphenyl)methane, isopropylidenediphenol, catechol, resorcinol, thlodiphenol, bis(hydroxyphenol)-1,2-ethane and biphenol ether.
Claim 40
Dependent Claim
23 words
The composition of claim 23, wherein said resin(s) is the product formed by'condensing a mixture of 2,6-bis(hydroxymethyl)-p-cresol and at least one cresol isomer.
Claim 41
Dependent Claim
19 words
The composition of claim 32, wherein said cresol isomer is selected from the group consisting of ortho-cresol and meta-cresol.
Claim 42
Dependent Claim
16 words
The composition of claim 32, wherein said cresol isomer is a mixture of ortho-cresol and meta-cresol.
Claim 43
Dependent Claim
20 words
The composition of claim 29, wherein said resin(s) is the product formed by condensing a mixture of 2,6-bis(hydroxymethyl)-p-cresol and 1-naphthol.
Claim 44
Dependent Claim
31 words
The composition of claim 29, wherein said resin(s) is the product formed by condensing a mixture of 2,4-bis(hydroxymethyl)-o-cresol and a cresol isomer selected from the group consisting of meta-cresol and para-cresol.
Claim 45
Dependent Claim
39 words
The composition of claim 30, wherein said resin(s) is the product formed by condensing in the presence of an acid a mixture of formaldehyde, meta-cresol and the resin(s) as defined in claim $2, wherein said cresol isomer is meta-cresol.
Claim 46
Dependent Claim
40 words
The composition of claim 30, wherein said resin(s) is the product formed by condensing in the presence of an acid a mixture of formaldehyde, 1-naphthol and/or 2-naphthol and resin(s) as defined in claim 32, wherein said cresol isomer is meta-cresol.
Claim 47
Dependent Claim
33 words
The composition of claim 30, wherein said resin(s) is the product formed by condensing in the presence of an acid a mixture of formaldehyde, meta-cresol and the resin(s) as defined in claim 35.
Claim 48
Dependent Claim
34 words
The composition of claim 23, wherein said resin(s) is a block copolymer formed by sequentially condensing in the presence an of acid: (i) meta-cresol and formaldehyde, and (ii) the product of (i) with 2,6-bis(hydroxymethyl)-p-cresol.
Claim 49
Dependent Claim
51 words
The composition of claim 23, wherein said resin(s) is the polymer formed by condensing in the presence of an acid a mixture of at least one aromatic aldehyde with at least one reactive phenolic compound capable of sustaining polymerization, said polymer having a weight-average molecular weight of at least 1500 Daltons.
Claim 50
Dependent Claim
20 words
The composition of claim 41, wherein said condensation is conducted in the presence of an acid and a sulfur compound.
Claim 51
Dependent Claim
24 words
The compositions of claims 41 or 42, wherein said aromatic aldehyde is selected from the group consisting of benzaldehyde, salicylaldehyde, 3-hydroxybenzaldehyde, 4-hydroxybenzaldehyde and 1-naphthaldehyde.
Claim 52
Dependent Claim
12 words
The composition of claim 43, wherein said reactive phenolic compound is m-cresol.
Claim 53
Dependent Claim
30 words
The compositions of claim 41 or 42, wherein said resin(s) is the polymer formed by said condensation of said aromatic aldehyde(s), said reactive phenolic compound(s) and at least one bis(hydroxymethyl)cresol.
Claim 54
Dependent Claim
31 words
The composition of claim 45, wherein said aromatic aldehyde(s) is selected from the group defined in claim 43 and said bis(hydroxymethyl)cresol(s) is any combination of the ortho-, meta- and para-cresol derivatives.
Claim 55
Dependent Claim
12 words
The composition of claim 46, wherein said reactive phenolic compound(s) is meta-cresol.
Claim 56
Dependent Claim
41 words
A process wherein the composition as defined in claim 42 is formed by condensing in the presence of an acid and a sulfur compound a mixture of at least one aromatic aldehyde with a reactive phenolic compound capable of sustaining polymerization.
Claim 57
Dependent Claim
36 words
The aryl-hydroxy compound of Formula 1, where Z is a hydrocarbon spacer group with 2-27 carbon atoms, and R 1 through R 6 are hydroxy groups and hydrogen atoms with at least four being hydroxy groups.
Claim 58
Dependent Claim
36 words
The aryl-hydroxy compound of Formula 1, where Z is a hydrocarbon spacer group with 2-27 carbon atoms, and R 1 through R 6 are hydroxy groups and hydrogen atoms with at least four being hydroxy groups.
Claim 59
Dependent Claim
25 words
The compound of claim 49, where Z is a aryl-alkyl spacer group with 7-21 carbon atoms and R 1 through R 6 are hydroxy groups.
Claim 60
Dependent Claim
9 words
The aryl-hydroxy compounds defined by Formulas 2,3,4 and 5.
Claim 61
Dependent Claim
9 words
The aryl-hydroxy compounds defined by Formulas 2,3,4 and 5.
Claim 62
Dependent Claim
30 words
The PAC polyesters formed by reacting at least one 1-oxo-2-diazonaphthalene-4 or 5-sulfonyl halide with a compound selected from the group consisting of compounds defined in claims 49, 50 and 51.
Claim 63
Dependent Claim
58 words
The PAC esters and polyesters of Formula 6, where R to R 3 are selected from: X number of 1-oxo-2-diazonaphthalene-4 or 5-sulfonate residues, and Y number of organic or organometallic groups, excluding 1-oxo-2-diazonaphthalene-4 or 5-sulfonate residues, where X:Y is in the range of 1:3 to 20:1, X+Y is 1 to 3 and the remainder, 3-X-Y, are hydroxy groups.
Claim 64
Dependent Claim
58 words
The PAC esters and polyesters of Formula 6, where R to R 3 are selected from: X number of 1-oxo-2-diazonaphthalene-4 or 5-sulfonate residues, and Y number of organic or organometallic groups, excluding 1-oxo-2-diazonaphthalene-4 or 5-sulfonate residues, where X:Y is in the range of 1:3 to 20:1, X+Y is 1 to 3 and the remainder, 3-X-Y, are hydroxy groups.
Claim 65
Dependent Claim
54 words
The PAC esters and polyesters as defined in claim 53, wherein the said organic or organometallic group(s) is selected from the group consisting of acetate, alkyl ester groups, alkyl-halide ester groups, aryl-ester groups, aryl-halide ester groups, alkyl ether groups, triorganosilyl ether groups, trifluoroacetate, pivaloate, benzoate, para-nitrobenzoate, 4-nitro-3-chlorobenzoate, anisate, laurate, methoxy, and triphenylsilyl ether groups.
Claim 66
Dependent Claim
32 words
A composition selected from the group of compositions as defined in claims 3, 4, 5, 7, 10, 11, 12, 14, 15,16, 23, 29, 30, 41 and 42 coated on a solid support.
Claim 67
Dependent Claim
48 words
A composition of claim 55, wherein said support is selected from the group consisting of semiconductor materials, metals, planarizing, barrier or etch-resistant types of organic or inorganic layers, underlying films and coatings, other types of resist films, antireflective coatings, plastic films, wood, paper, ceramics, glass, laminates, and textiles.
Claim 68
Dependent Claim
25 words
A composition of claim 55, wherein said support is selected from the group consisting of a silicon-based or gallium arsenide-based wafer, aluminum and silicon dioxide.
Claim 69
Dependent Claim
50 words
A composition selected from the group of compositions as defined in claims 3, 4, 5, 7, 10, 11, 12, 14, 15, 16, 23, 29, 30, 41, and 42, further comprising one or more additives selected from a group consisting of colorants, dyes, anti-striation agents, plasticizers, speed-enhancers, contrast-enhancers, solvents and surfactants.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.