Patent EP0261910A2 successfully refreshed from Google Patents.
EP0261910A2
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EP
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Water-developable photosensitive plate and its production
Assignee: Nippon Paint Co Ltd
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Filing: 1987-09-21
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Granted: —
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Expires: 2007-09-21
Abstract
Abstract A water-developable photosensitive resin plate suitable for the manufacture of a relief printing plate having high resistance to water-based inks, high resilience and excellent form stability, which comprises: (A) a copolymer comprising units of (i) an aliphatic conjugated diene monomer (ii) an α, β-ethylenically unsaturated carboxylic acid and (iii) a polyfunctional vinyl monomer, optionally with (iv) a monofunctional vinyl monomer, the content of the aliphatic conjugated diene monomer (i), the α, β-ethylenically unsaturated carboxylic acid (ii), the polyfunctional vinyl monomer (iii) and the monofunctional vinyl monomer (iv) being respectively from about 5 to 95 mol %, from about 1 to 30 mol %, from about 0.1 to 10 mol% and 0 to 70 mol% based on the combination of those monomeric components; (B) a basic nitrogen atom-containing compound; (C) an ethylenically unsaturated monomer; and (D) a photopolymerization initiator.
Inventors
- 👤 Katsukiyo Ishikawa
- 👤 Katsuji Konishi
- 👤 Hidefumi Kusuda
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-27 15:22
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/027; G03F7/032; G03F7/033
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
127 words
A water-developable photosensitive resin composition providing water resistance and resilience after development, which comprises: (A) a copolymer comprising units of (i) an aliphatic conjugated diene monomer, (ii) an α, β -ethylenically unsaturated carboxylic acid, and (iii) a polyfunctional vinyl monomer, optionally with (iv) a monofunctional vinyl monomer, the content of the aliphatic conjugated diene monomer (i) the α, β-ethylenically unsaturated carboxylic acid (ii), the polyfunctional vinyl monomer (iii) and the monofunctional vinyl monomer (iv) being respectively from about 5 to 95 mol % from about 1 to 30 mol %, from about 0.1 to 10 mol % and 0 to 70 mol % based on the combination of those monomeric components; (B) a basic nitrogen atom-containing compound; (C) an ethylenically unsaturated monomer; and (D) a photopolymerization initiator.
Claim 2
Dependent Claim
127 words
A water-developable photosensitive resin composition providing water resistance and resilience after development, which comprises: (A) a copolymer comprising units of (i) an aliphatic conjugated diene monomer, (ii) an α, β -ethylenically unsaturated carboxylic acid, and (iii) a polyfunctional vinyl monomer, optionally with (iv) a monofunctional vinyl monomer, the content of the aliphatic conjugated diene monomer (i) the α, β-ethylenically unsaturated carboxylic acid (ii), the polyfunctional vinyl monomer (iii) and the monofunctional vinyl monomer (iv) being respectively from about 5 to 95 mol % from about 1 to 30 mol %, from about 0.1 to 10 mol % and 0 to 70 mol % based on the combination of those monomeric components; (B) a basic nitrogen atom-containing compound; (C) an ethylenically unsaturated monomer; and (D) a photopolymerization initiator.
Claim 3
Dependent Claim
58 words
The photosensitive resin composition according to claim 1, wherein the content of the aliphatic conjugated diene monomer (i), the α, β-ethylenically unsaturated carboxylic acid (ii) and the polyfunctional vinyl monomer (iii) in the copolymer (A) are respectively from about 40 to 85 mol %, from about 2.5 to 10 mol %, from about 0.5 to 3 mol %.
Claim 4
Dependent Claim
83 words
The water-developable photosensitive resin composition according to claims 1 or 2, wherein the amounts of the copolymer (A), the ethylenically unsaturated monomer (C) and the photopolymerization initiator (D) are respectively from about 30 to 90 % by weight, from about 5 to 70 % by weight and fromm about 0.01 to 10 % by weight, and the amount of the basic nitrogen atom-containing compound (B) is from about 0.20 to 2 mol to 1 mol of the carboxyl groups in the copolymer (A).
Claim 5
Dependent Claim
24 words
The water-developable photosensitive resin composition according to claim 1 or 3, wherein the basic nitrogen atom-containing compound (B) is represented by the structural formulas:
Claim 6
Dependent Claim
38 words
The water-developable photosensitive resin composition according to claim 4, wherein the basic nitrogen atom-containing compound (B) is a photopolymerizable amine compound expressed in formula (I) or (II) except compounds corresponding to formula (II) in which Y is hydrogen.
Claim 7
Dependent Claim
20 words
The water-developable photosensitive resin composition according to any of claims 1 to 3, which is supported on a supporting material.
Claim 8
Dependent Claim
33 words
A relief printing plate having high resistance to water-based inks, high resilience and excellent form stability, which is prepared by the use of the photosensitive resin composition according to claims 1 or 3.
Claim 9
Dependent Claim
29 words
A photosensitive resin plate which comprises a support material and a photosensitive resin composition layer formed thereon, said photosensitive resin composition being that according to claim 1 or 3.
Claim 10
Dependent Claim
31 words
A relief printing plate having high resistance to waterbased inks, high resilience and excellent form stability, which is prepared by the use of the photosensitive resin plate according to claim 8.
Claim 11
Independent Claim
172 words
A method for preparing a water-developable photosensitive resin plate suitable for the manufacture of a relief printing plate having high resistance to water-based inks, high resilience and excellent form stability, which comprises: (A) a copolymer comprising units of (i) an aliphatic conjugated diene monomer, (ii) an α, β-ethylenically unsaturated carboxylic acid and (iii) a polyfunctional vinyl monomer, optionally with (iv) a monofunctional vinyl monomer, the content of the aliphatic conjugated diene monomer (i), the α, β-ethylenically unsaturated carboxylic acid (ii), the polyfunctional vinyl monomer (iii) and the monofunctional vinyl monomer (iv) being respectively from about 5 to 95 mol % from about 1 to 30 mol %, from about 0.1 to 10 mol % and 0 to 70 mol % based on the combination of those monomeric components; (B) a basic nitrogen atom-containing compound; (C) an ethylenically unsaturated monomer; and (D) a photopolymerization initiator, characterized in that a photosensitive composition comprising uniformly the components (A), (B), (C) and (D) without any solvent is molded in a melt state into an appropriate shape.
Claim 12
Independent Claim
172 words
A method for preparing a water-developable photosensitive resin plate suitable for the manufacture of a relief printing plate having high resistance to water-based inks, high resilience and excellent form stability, which comprises: (A) a copolymer comprising units of (i) an aliphatic conjugated diene monomer, (ii) an α, β-ethylenically unsaturated carboxylic acid and (iii) a polyfunctional vinyl monomer, optionally with (iv) a monofunctional vinyl monomer, the content of the aliphatic conjugated diene monomer (i), the α, β-ethylenically unsaturated carboxylic acid (ii), the polyfunctional vinyl monomer (iii) and the monofunctional vinyl monomer (iv) being respectively from about 5 to 95 mol % from about 1 to 30 mol %, from about 0.1 to 10 mol % and 0 to 70 mol % based on the combination of those monomeric components; (B) a basic nitrogen atom-containing compound; (C) an ethylenically unsaturated monomer; and (D) a photopolymerization initiator, characterized in that a photosensitive composition comprising uniformly the components (A), (B), (C) and (D) without any solvent is molded in a melt state into an appropriate shape.
Claim 13
Dependent Claim
56 words
The method according to claim 10, wherein the content of the aliphgatic conjugated diene monomer (i), the α, β-ethylenically unsaturated carboxylic acid (ii) and the polyfunctional vinyl monomer (iii) in the copolymer (A) are respectively from about 40 to 85 mol % from about 2.5 to 10 mol %, from about 0.5 to 3 mol %.
Claim 14
Independent Claim
77 words
The method according to claims 10 or 11, wherein the amount of the copolymer (A), the ethylenically unsaturated monomer (C) and the photopolymerization initiator (D) are respectively from about 30 to 90% by weight, from about 5 to 70% by weight and from about 0.01 to 10% by weight, and the amount of the basic nitrogen atom-containing compound (B) is from about 0.20 to 2 mol to 1 mol of the carboxyl groups in the copolymer (A).
Claim 15
Independent Claim
25 words
The method according to claims 10 or 12 in which the basic nitrogen atom-containing compound (B) is represented by the structural formulas; (I) or (II):
Claim 16
Dependent Claim
36 words
The method according to claim 13 in which the basic nitrogen atom-containing compound (B) is a photopolymerizable amine compound expressed in formula (I) or (II) except compounds corresponding to formula (II) in which Y is hydrogen.
Claim 17
Dependent Claim
21 words
The photosensitive resin composition of claim 1, 3 or 4 in which said ethylenically unsaturated monomer (C) includes a polyfunctional monomer.
Claim 18
Dependent Claim
59 words
A method for preparing a relief printing plate having high resistance to water-based inks, high resilience and excellent form stability, characterized in that the photosensitive resin plate prepared according to claim 10 is subjected to exposure to light through a negative film having an image and the photosensitive resin composition at the non-exposed part is washed out with water.
References Cited (Backward Citations)
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