Patent US839236A successfully refreshed from Google Patents.
Patent EP0252734A2 successfully refreshed from Google Patents.
EP0252734A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
X-ray reduction projection exposure system of reflection type
Assignee: Canon Inc
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Filing: 1987-07-08
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Granted: —
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Expires: 2007-07-08
Abstract
Abstract An X-ray exposure apparatus includes a stage (MS) for holding a mask having a pattern for circuit manufacturing, a stage (MF) for holding a wafer to be exposed to the pattern of the mask with X-rays, and a reflection reduction imaging system, disposed between the mask stage and the wafer stage, including reflecting mirror arrangement, containing at least three but not more than five reflecting mirrors (M1,M2,M3) coated with multi-layer films, for receiving X-rays from the mask and directing then to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale.
Inventors
- 👤 Masayuki Suzuki
- 👤 Noritaka Mochizuki
- 👤 Setsuo Minami
- 👤 Shigetaro Ogura
- 👤 Yasuaki Fukuda
- 👤 Yutaka Watanabe
- 👤 Yasuo Kawai
- 👤 Takao Kariya
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-27 18:17
CPC Classifications
G; G02; G02B; G02B17/00; G02B17/02; G02B17/06; G02B17/0626; G02B17/0636; B; B82; B82Y; B82Y10/00; G03; G03F; G03F7/00; G03F7/20; G03F7/2037; G03F7/2039; G03F7/70; G03F7/70008; G03F7/70033; G03F7/70216; G03F7/70233; G03F7/7025; G03F7/70691; G03F7/708; G03F7/70858; G03F7/70866; G03F7/70875; G03F7/70883; G03F7/70891
Claims Analysis
Total Claims: 52
Claim 1
Independent Claim
98 words
An X-ray exposure apparatus, comprising: a stage for holding a mask having a pattern for circuit manufacturing; a stage for holding a wafer to be exposed to the pattern of the mask with X-rays; and a reflection reduction imaging system, disposed between said mask stage and said wafer stage, including a reflecting mirror arrangement, containing at least three but not more than five reflecting mirrors coated with multi-layer films, for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale.
Claim 2
Dependent Claim
98 words
An X-ray exposure apparatus, comprising: a stage for holding a mask having a pattern for circuit manufacturing; a stage for holding a wafer to be exposed to the pattern of the mask with X-rays; and a reflection reduction imaging system, disposed between said mask stage and said wafer stage, including a reflecting mirror arrangement, containing at least three but not more than five reflecting mirrors coated with multi-layer films, for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale.
Claim 3
Dependent Claim
104 words
An X-ray exposure apparatus, comprising: a stage for holding a mask having a pattern for circuit manufacturing; a stage for holding a wafer to be exposed to the pattern of the mask with X-rays; and a reflection reduction imaging system, disposed between said mask stage and said wafer stage, including a reflecting mirror arrangement, containing at least one flat mirror and a plurality of non-flat mirrors, each of which mirrors are coated with multi-layer films, for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale.
Claim 4
Dependent Claim
104 words
An X-ray exposure apparatus, comprising: a stage for holding a mask having a pattern for circuit manufacturing; a stage for holding a wafer to be exposed to the pattern of the mask with X-rays; and a reflection reduction imaging system, disposed between said mask stage and said wafer stage, including a reflecting mirror arrangement, containing at least one flat mirror and a plurality of non-flat mirrors, each of which mirrors are coated with multi-layer films, for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale.
Claim 5
Dependent Claim
103 words
An X-ray exposure apparatus, comprising: a stage for holding a mask having a pattern for circuit manufacturing; a stage for holding a wafer to be exposed to the pattern of the mask with X-rays; and a reflection reduction imaging system, disposed between said mask stage and said wafer stage, including a reflecting mirror arrangement, containing a plurality of multi-layer film coated reflecting mirrors, at least one of which is provided with forced cooling means, for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale.
Claim 6
Dependent Claim
103 words
An X-ray exposure apparatus, comprising: a stage for holding a mask having a pattern for circuit manufacturing; a stage for holding a wafer to be exposed to the pattern of the mask with X-rays; and a reflection reduction imaging system, disposed between said mask stage and said wafer stage, including a reflecting mirror arrangement, containing a plurality of multi-layer film coated reflecting mirrors, at least one of which is provided with forced cooling means, for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale.
Claim 7
Dependent Claim
92 words
An X-ray exposure apparatus, comprising: a stage for holding a mask having a pattern for circuit manufacturing; a stage for holding a wafer to be exposed to the pattern of the mask with X-rays; means for forcingly cooling the mask; and a reflection reduction imaging system, disposed between said mask stage and said wafer stage, including a reflecting mirror coated with multi-layer films, for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in the reduced scale.
Claim 8
Dependent Claim
92 words
An X-ray exposure apparatus, comprising: a stage for holding a mask having a pattern for circuit manufacturing; a stage for holding a wafer to be exposed to the pattern of the mask with X-rays; means for forcingly cooling the mask; and a reflection reduction imaging system, disposed between said mask stage and said wafer stage, including a reflecting mirror coated with multi-layer films, for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in the reduced scale.
Claim 9
Dependent Claim
104 words
A reduction exposure apparatus, comprising: a stage for holding a mask having a pattern for circuit manufacturing; a stage for holding a wafer to be exposed to the pattern of the mask; a reflection reduction imaging system, disposed between said mask stage and said wafer stage, including a reflecting mirror arrangement, containing a plurality of reflecting mirrors which are coated with multi-layer films, for exposing the wafer to the pattern of the mask in the reduced scale in a rectangular area; and means for stepwisely moving said wafer stage to expose sequentially areas on the wafer having a configuration corresponding to the rectangular area.
Claim 10
Dependent Claim
104 words
A reduction exposure apparatus, comprising: a stage for holding a mask having a pattern for circuit manufacturing; a stage for holding a wafer to be exposed to the pattern of the mask; a reflection reduction imaging system, disposed between said mask stage and said wafer stage, including a reflecting mirror arrangement, containing a plurality of reflecting mirrors which are coated with multi-layer films, for exposing the wafer to the pattern of the mask in the reduced scale in a rectangular area; and means for stepwisely moving said wafer stage to expose sequentially areas on the wafer having a configuration corresponding to the rectangular area.
Claim 11
Dependent Claim
12 words
An apparatus according to claim 5, wherein said rectangular area is oblong.
Claim 12
Dependent Claim
20 words
An apparatus according to claim 6 or 7, wherein wafer is exposed to the pattern of the mask with X-rays.
Claim 13
Dependent Claim
121 words
An X-ray reduction exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask with X-rays; a plurality of reflecting mirrors for reflecting X-rays, disposed between said mask holding and said wafer holder, to expose the wafer to a pattern of the mask in a reduced scale; and means for detecting a mark on said wafer stage in an enlarged scale using visible light coming from the wafer by way of said reflecting mirrors in a direction opposite to a direction of travel of the X-rays for exposing the wafer, whereby the mark can be detected substantially free from aberration.
Claim 14
Dependent Claim
121 words
An X-ray reduction exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask with X-rays; a plurality of reflecting mirrors for reflecting X-rays, disposed between said mask holding and said wafer holder, to expose the wafer to a pattern of the mask in a reduced scale; and means for detecting a mark on said wafer stage in an enlarged scale using visible light coming from the wafer by way of said reflecting mirrors in a direction opposite to a direction of travel of the X-rays for exposing the wafer, whereby the mark can be detected substantially free from aberration.
Claim 15
Dependent Claim
21 words
An apparatus according to claim 8, wherein at least one of said plural mirrors is provided with a multi-layer film coating.
Claim 16
Dependent Claim
16 words
An apparatus according to claim 8 or 9, wherein the visible light is a laser beam.
Claim 17
Dependent Claim
119 words
A reduction exposure apparatus, comprising: a stage for vertically holding a mask having a pattern for circuit manufacturing; a synchrotron orbital radiation source for producing energy rays for application of the rays to the mask; a stage for horizontally holding a wafer to be exposed to the pattern of the mask with the rays; reduction imaging means, disposed between the mask and the wafer, for exposing the wafer to the pattern of the mask in a reduced scale, said imaging means including a plurality of reflecting mirrors at least one of which is coated with a multi-layer film; and means for sequentially moving said wafer stage for sequentially exposing plural exposure areas of the wafer to the reduced patterns.
Claim 18
Dependent Claim
119 words
A reduction exposure apparatus, comprising: a stage for vertically holding a mask having a pattern for circuit manufacturing; a synchrotron orbital radiation source for producing energy rays for application of the rays to the mask; a stage for horizontally holding a wafer to be exposed to the pattern of the mask with the rays; reduction imaging means, disposed between the mask and the wafer, for exposing the wafer to the pattern of the mask in a reduced scale, said imaging means including a plurality of reflecting mirrors at least one of which is coated with a multi-layer film; and means for sequentially moving said wafer stage for sequentially exposing plural exposure areas of the wafer to the reduced patterns.
Claim 19
Independent Claim
22 words
An apparatus according to any preceding claim, wherein space between at least two of the reflecting mirrors is filled with helium gas.
Claim 20
Dependent Claim
25 words
An apparatus as claimed in claim 12, wherein the space is a through space and the helium gas is caused to flow through the space.
Claim 21
Dependent Claim
107 words
An X-ray exposure apparatus, comprising: a stage for holding a mask having a pattern for circuit manufacturing; a stage for holding a wafer to be exposed to the pattern of the mask with X-rays; and a reflection reduction imaging system, disposed between said mask stage and said wafer stage, including a reflecting mirror arrangement, containing a plurality of reflecting mirrors coated with multi-layer films, for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale; wherein helium gas flows through space between at least two of said reflecting mirrors.
Claim 22
Dependent Claim
107 words
An X-ray exposure apparatus, comprising: a stage for holding a mask having a pattern for circuit manufacturing; a stage for holding a wafer to be exposed to the pattern of the mask with X-rays; and a reflection reduction imaging system, disposed between said mask stage and said wafer stage, including a reflecting mirror arrangement, containing a plurality of reflecting mirrors coated with multi-layer films, for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale; wherein helium gas flows through space between at least two of said reflecting mirrors.
Claim 23
Independent Claim
19 words
An apparatus according to any preceding claim, wherein at least one of reflecting mirrors has a non-spherical reflecting surface.
Claim 24
Independent Claim
24 words
An apparatus according to any preceding claim, wherein at least one of the reflecting mirrors is provided with forced cooling means for cooling it.
Claim 25
Dependent Claim
23 words
An apparatus as claimed in claim 16, wherein at least the two reflecting mirrors nearest the mask stage are provided with forced cooling.
Claim 26
Dependent Claim
52 words
An X-ray reflecting imaging system comprising: a first concave mirror having a multi-layer film reflecting surface; and a second concave mirror having a multi-layer reflecting film for receiving X-rays from said first concave mirror, said second concave mirror having an opening for allowing the X-rays to pass through said second concave mirror.
Claim 27
Dependent Claim
52 words
An X-ray reflecting imaging system comprising: a first concave mirror having a multi-layer film reflecting surface; and a second concave mirror having a multi-layer reflecting film for receiving X-rays from said first concave mirror, said second concave mirror having an opening for allowing the X-rays to pass through said second concave mirror.
Claim 28
Dependent Claim
40 words
A system according to claim 18, wherein said opening is formed prior to processing surface treatment of said second concave mirror, and during the surface treatment, the opening is plugged with a material which is removed after the surface treatment.
Claim 29
Dependent Claim
19 words
A system according to claim 18 or 19, wherein said first concave mirror is provided with forced cooling means.
Claim 30
Independent Claim
24 words
A system according to any of claims 18 to 20, wherein space between said first and second concave mirrors is filled with helium gas.
Claim 31
Dependent Claim
106 words
An X-ray reflecting imaging system comprising: a first concave mirror; a first mirror having a concave reflecting surface for reflecting X-rays; a second mirror having a convex reflecting surface for receiving the X-rays from said first mirror and reflecting them; a third mirror having a concave reflecting surface for receiving the X-rays from said second convex mirror and reflecting them; and wherein the reflecting surface of at least one of said first and third concave mirrors is non-spherical, whereby an image formed by the X-rays involves minimized aberrations; and wherein the reflecting surface of at least one of said mirrors is provided with a multi-layer coating.
Claim 32
Dependent Claim
106 words
An X-ray reflecting imaging system comprising: a first concave mirror; a first mirror having a concave reflecting surface for reflecting X-rays; a second mirror having a convex reflecting surface for receiving the X-rays from said first mirror and reflecting them; a third mirror having a concave reflecting surface for receiving the X-rays from said second convex mirror and reflecting them; and wherein the reflecting surface of at least one of said first and third concave mirrors is non-spherical, whereby an image formed by the X-rays involves minimized aberrations; and wherein the reflecting surface of at least one of said mirrors is provided with a multi-layer coating.
Claim 33
Dependent Claim
16 words
A system according to claim 22, wherein all of said mirrors are provided with multi-layer coatings.
Claim 34
Dependent Claim
20 words
A system according to claim 22 or 23, wherein minimized aberrations are maintained within an area in the rectangular form.
Claim 35
Independent Claim
19 words
A system according to any of claims 22 to 24, wherein said imaging system is a reduction imaging system.
Claim 36
Independent Claim
21 words
A system according to any of claims 22 to 24, wherein said imaging system is used as an enlarging imaging system.
Claim 37
Independent Claim
85 words
A system for converting an object to an image using X-rays, comprising: imaging means, provided between the object and a plane on which the image thereof is formed, for receiving and reflecting X-rays, said imaging means including plural X-ray reflecting elements provided with multi-layer coatings; and X-ray application means for applying the X-ray to said object inclinedly with respect to a surface of the object to cause the X-rays incident on the plane to be substantially parallel to a system axis of said imaging means.
Claim 38
Independent Claim
85 words
A system for converting an object to an image using X-rays, comprising: imaging means, provided between the object and a plane on which the image thereof is formed, for receiving and reflecting X-rays, said imaging means including plural X-ray reflecting elements provided with multi-layer coatings; and X-ray application means for applying the X-ray to said object inclinedly with respect to a surface of the object to cause the X-rays incident on the plane to be substantially parallel to a system axis of said imaging means.
Claim 39
Dependent Claim
22 words
A system according to Claim 27, wherein the object and the plane are located in the opposite sides of the system axis.
Claim 40
Dependent Claim
28 words
A system according to claim 27 or 28, wherein one half of said imaging means with respect to the system axis thereof is used for the image conversion.
Claim 41
Independent Claim
30 words
A system according to any of claims 27 to 29, wherein a position of a front focus of said imaging means is coincident with a position of an entrance pupil.
Claim 42
Dependent Claim
184 words
An X-ray projection exposure apparatus for exposing a member sensitive to X-rays to a pattern of a mask with the X-rays in a reduced scale; comprising: an inlet port for receiving X-rays travelling substantially in a horizontal direction; a mask holder for holding the mask substantially vertically for the mask to receive the X-rays through said inlet port; a first mirror for receiving the X-rays coming from the mask and reflecting them in a substantially vertical direction; a second mirror, disposed above said first mirror, having a bottom curved reflecting surface for receiving the X-rays from the first mirror and reflecting them; a third mirror, disposed below said first mirror, having a top curved reflecting surface for receiving the X-rays coming from said second mirror and reflecting them; a fourth mirror, disposed between said first and second mirrors, having a bottom curved reflecting surface for receiving the X-rays from said third mirror and reflecting them substantially vertically; and a holder for holding the sensitive member for holding the sensitive member substantially horizontally for the sensitive member to receive the X-rays from the fourth mirror.
Claim 43
Dependent Claim
184 words
An X-ray projection exposure apparatus for exposing a member sensitive to X-rays to a pattern of a mask with the X-rays in a reduced scale; comprising: an inlet port for receiving X-rays travelling substantially in a horizontal direction; a mask holder for holding the mask substantially vertically for the mask to receive the X-rays through said inlet port; a first mirror for receiving the X-rays coming from the mask and reflecting them in a substantially vertical direction; a second mirror, disposed above said first mirror, having a bottom curved reflecting surface for receiving the X-rays from the first mirror and reflecting them; a third mirror, disposed below said first mirror, having a top curved reflecting surface for receiving the X-rays coming from said second mirror and reflecting them; a fourth mirror, disposed between said first and second mirrors, having a bottom curved reflecting surface for receiving the X-rays from said third mirror and reflecting them substantially vertically; and a holder for holding the sensitive member for holding the sensitive member substantially horizontally for the sensitive member to receive the X-rays from the fourth mirror.
Claim 44
Dependent Claim
16 words
An apparatus according to claim 31, wherein said second, third and fourth mirrors are optically coaxial.
Claim 45
Dependent Claim
22 words
An apparatus according to claim 32, wherein said first mirror is eccentric from the axis of said second, third and fourth mirrors.
Claim 46
Independent Claim
35 words
An apparatus according to any of claims 31 to 33, wherein said third mirror has an eccentric opening to allow the X-rays toward and away from said second mirror to pass through said third mirror.
Claim 47
Independent Claim
33 words
An apparatus according to any of claims 31 to 34, wherein said fourth mirror has an eccentric opening for allowing the X-rays reflected by said third mirror to pass through said fourth mirror.
Claim 48
Independent Claim
31 words
An apparatus according to any of claims 31 to 35, wherein said mask stage allows the X-rays to pass therethrough, whereby the mask which is of a transmitting type is usable.
Claim 49
Independent Claim
24 words
An apparatus according to any of claims 31 to 36, wherein said mask stage is disposed between said inlet port and said first mirror.
Claim 50
Independent Claim
39 words
An apparatus according to any of claims 31 to 37, wherein said inlet port and said first mirror are faced to a same side of the mask holder, whereby the mask which is of a reflection type is usable.
Claim 51
Dependent Claim
60 words
An X-ray exposure apparatus, comprising a mask stage for holding a mask, a wafer stage for holding a wafer, means for projecting X-rays onto such a mask, and a projection imaging system suitable for and arranged to project X-rays from such a mask onto such a wafer to project an image of a pattern on the mask onto the wafer.
Claim 52
Dependent Claim
60 words
An X-ray exposure apparatus, comprising a mask stage for holding a mask, a wafer stage for holding a wafer, means for projecting X-rays onto such a mask, and a projection imaging system suitable for and arranged to project X-rays from such a mask onto such a wafer to project an image of a pattern on the mask onto the wafer.
References Cited (Backward Citations)
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