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EP0243520A1 Expired / Lapsed EP ⏱️ 0.0 years remaining

Interferometric mask-wafer alignment

Assignee: IBM Deutschland GmbH
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Filing: 1986-04-29
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Granted: —
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Expires: 2006-04-29
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Abstract

Abstract To align a grating (3a) on a mask (3) with respect to an equivalent grating (8a) of a wafer in an photolithographic system where the mask is imaged by an imaging system (7) onto the wafer, symmetrical diffraction orders (u+ 1 , u. 1 ) are focussed on the wafer grating and diffracted a second time to return colinear with the optical axis and to be deflected by a beam splitter (5) to a photo detector (6). The intensity of the super imposed outbeams depends on the relative phase differences of the diffracted beams, and hence on the displacements of the mask and wafer gratings. The phase of the electrical output signal is determined by introducing periodic phase differences in the diffracted beams of the mask grating by a wobbling parallel glass plate (4). For simultaneous X-, Y-alignment crossed gratings are used that operate on two pairs of diffracted beams; the polarisation direction of one of these pairs is rotated by 90° before impinging on the second grating so that each pair of diffracted beams can be fed to a separate photodetector. In a step-and repeat photolithographic system optical fine alignment can be performed by adjusting a fixed tilt angle of the glass plate after having determined the amount of misalignment.

Inventors

  • 👤 Günter Dipl.-Phys. Makosch

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-01 22:01
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F9/7065; G03F9/7049

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 124 words
Method for aligning two objects in conjugate planes of an imaging system, the objects having first (3a) and second (8a) optical gratings, resp., the first grating being illuminated by a light beam (2) characterized in that first symmetrical diffraction orders (u + , u- ) from the first grating (3a) are selected, that the selected diffraction orders are focussed by the imaging system (7) coincidently on the second grating (8a) to be diffracted a second time into second diffraction orders (u +1 , u. i ) colinear to the optical axis of the imaging system, that the phase relationship between the first diffracted beams is modulated periodically and that the relative phase of the second diffraction orders in the colinear output beam is evaluated.
Claim 2
Dependent Claim 124 words
Method for aligning two objects in conjugate planes of an imaging system, the objects having first (3a) and second (8a) optical gratings, resp., the first grating being illuminated by a light beam (2) characterized in that first symmetrical diffraction orders (u + , u- ) from the first grating (3a) are selected, that the selected diffraction orders are focussed by the imaging system (7) coincidently on the second grating (8a) to be diffracted a second time into second diffraction orders (u +1 , u. i ) colinear to the optical axis of the imaging system, that the phase relationship between the first diffracted beams is modulated periodically and that the relative phase of the second diffraction orders in the colinear output beam is evaluated.
Claim 3
Dependent Claim 25 words
The method of claim 1, wherein the gratings are linear and parallel to each other for alignment in a direction perpendicular to the grating bars.
Claim 4
Dependent Claim 44 words
The method of claim 1, wherein the gratings are crossed gratings for alignment in two orthogonal directions perpendicular to the bars of the crossed gratings and wherein the polarisation directions of the second diffraction orders in each orthogonal direction are perpendicular to each other.
Claim 5
Independent Claim 42 words
The method of one of the claims 1 - 3, wherein the relative phase of the super imposed second diffraction orders is determined by measuring the intensity after shifting the relative phase of the first diffraction orders by ± 2/3 7 r.
Claim 6
Independent Claim 33 words
The method of one of the claims 1 - 4, wherein the first grating is part of a photolithographic mask and the second grating is part of a wafer to be exposed photolithographically.
Claim 7
Independent Claim 28 words
The method of one of the claims 1 - 5, wherein the optical path of the diffracted beams is arranged at the periphery of the optical imaging system.
Claim 8
Dependent Claim 105 words
Apparatus for aligning two objects in conjugate planes of an imaging system, the objects having first and a second optical gratings, resp., and comprising means to illuminate the first optical with vertical incidence, for carrying out the method of one of the claims 1 - 6, characterized in that a tiltable glass plate (4) is arranged optically behind the first grating, that the second optical grating (8a) is a reflective grating, and that a semitransparent mirror (5) is arranged in the optical axis of the imaging system to direct the light diffracted at the second grating along the optical axis to a photo detector (6).
Claim 9
Dependent Claim 89 words
The apparatus of claim 6, wherein the first and second gratings are crossed gratings, each generating a pair of diffracted beams in orthogonal planes, wherein the axis of rotation of the tiltable glass plate is arranged under 45° with respect to orthogonal planes, wherein the semitransparent mirror (15) has areas covered by a X/2 layer at the intersections with one pair of diffracted beams and wherein a polarizing beam splitter (6c) is provided in the output beam to direct the pairs of diffracted beams to different photodetectors (6a, 6b).
Claim 10
Dependent Claim 18 words
The apparatus of claim 6 or 7, wherein the tiltable glass plate is oscillated by a galvanometric actuator.
Claim 11
Independent Claim 32 words
The apparatus of one of the claims 6 - 8, wherein the glass plate is tilted for fine adjustment of the objects by a constant angle in accordance with the measured misalignment.

References Cited (Backward Citations)

US3811779A Cited
US4251160A Cited
US4265542A Cited
EP0015173A1 Cited

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