Patent EP0234593A2 successfully refreshed from Google Patents.
EP0234593A2
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EP
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Silicon-containing coatings and a method for their preparation
Assignee: Dow Silicones Corp
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Filing: 1987-02-27
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Granted: —
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Expires: 2007-02-27
Abstract
Abstract The invention relates to the formation of silicon-containing coatings from the vapor phase thermal decomposition of halosilanes, polyhalodisilanes, poly- halosilanes or mixtures thereof in the presence of a metal catalyst. The instant invention also relates to the formation of silicon- and carbon-containing coatings and silicon- and titanium-containing coatings from the vapor phase thermal decomposition of alkyl halides and titanium halides, respectively, in the presence of a halosilane, polyhalosilane or halodisilane, and a metal catalyst.
Inventors
- 👤 Sudarsanan Varaprath
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-30 04:27
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/32; C23C16/325; C23C16/24; C23C16/42; Y; Y10; Y10S; Y10S438/00; Y10S438/903
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
104 words
A method of forming silicon-containing coatings on a solid substrate, which method comprises decomposing in a reaction chamber, a halosilane, halodisilane, or mixture of halosilanes, in the vapor phase, in the presence of a metal catalyst and a substrate, at a temperature in the range of 400 degrees to 600 degrees Centigrade, wherein the halosilanes and halodisilanes each contain at least one halogen atom selected from the group consisting of fluorine, chlorine, bromine, and iodine, and wherein the metal catalyst is selected from the group consisting of aluminum, chromium, magnesium, stainless steel, copper and zirconium, whereby a substrate containing a coating thereon is obtained.
Claim 2
Independent Claim
104 words
A method of forming silicon-containing coatings on a solid substrate, which method comprises decomposing in a reaction chamber, a halosilane, halodisilane, or mixture of halosilanes, in the vapor phase, in the presence of a metal catalyst and a substrate, at a temperature in the range of 400 degrees to 600 degrees Centigrade, wherein the halosilanes and halodisilanes each contain at least one halogen atom selected from the group consisting of fluorine, chlorine, bromine, and iodine, and wherein the metal catalyst is selected from the group consisting of aluminum, chromium, magnesium, stainless steel, copper and zirconium, whereby a substrate containing a coating thereon is obtained.
Claim 3
Dependent Claim
10 words
A coated substrate produced by the method of claim 1.
Claim 4
Dependent Claim
15 words
A coated substrate as claimed in claim 2 wherein the coating is a semiconductive coating.
Claim 5
Dependent Claim
15 words
A coated substrate as claimed in claim 2 wherein the coating is a hermetic coating.
Claim 6
Dependent Claim
12 words
An electronic device containing the coated substrate as claimed in claim 3.
Claim 7
Dependent Claim
12 words
An electronic device containing the coated substrate as claimed in claim 4.
Claim 8
Independent Claim
123 words
A method of forming a titanium silicide coating on a solid substrate which method comprises decomposing in a reaction chamber, essentially simultaneously, (A) a halosilane, halodisilane, or mixture of halosilanes, and ( B ) a titanium halide or mixture of titanium halides, in the vapor phase, in the presence of a metal catalyst, and a solid substrate, at a temperature in the range of 400 degrees to 600 degrees Centigrade, wherein the halosilanes and halodisilanes, and titanium halides each contain at least one halogen atom selected from the group consisting of fluorine, chlorine, bromine, and iodine, wherein the metal catalyst is selected from the group consisting of aluminum, chromium, magnesium, stainless steel, and zirconium, whereby a substrate containing a coating thereon is obtained.
Claim 9
Independent Claim
123 words
A method of forming a titanium silicide coating on a solid substrate which method comprises decomposing in a reaction chamber, essentially simultaneously, (A) a halosilane, halodisilane, or mixture of halosilanes, and ( B ) a titanium halide or mixture of titanium halides, in the vapor phase, in the presence of a metal catalyst, and a solid substrate, at a temperature in the range of 400 degrees to 600 degrees Centigrade, wherein the halosilanes and halodisilanes, and titanium halides each contain at least one halogen atom selected from the group consisting of fluorine, chlorine, bromine, and iodine, wherein the metal catalyst is selected from the group consisting of aluminum, chromium, magnesium, stainless steel, and zirconium, whereby a substrate containing a coating thereon is obtained.
Claim 10
Independent Claim
150 words
A method of forming a silicon carbide coating on a solid substrate which method comprises decomposing in a reaction chamber, essentially simultaneously, (A) a halosilane, halodisilane, or mixture of halosilanes, in the vapor phase, wherein the halosilanes and halodisilanes used contain at least one halogen atom per molecule selected from the group consisting of fluorine, chlorine, bromine, and iodine, and ( B ) an alkyl halide or mixture of alkyl halides wherein the alkyl halides each contain at least one halogen atom per molecule selected from the group consisting of fluorine, chlorine, bromine, and iodine, in the vapor phase, in the presence of a metal catalyst and a substrate, at a temperature in the range of 400 degrees to 600 degrees Centigrade, wherein the metal catalyst is selected from the group consisting of aluminum, chromium, magnesium, stainless steel, copper and zirconium, whereby a substrate containing a coating thereon is obtained.
Claim 11
Independent Claim
150 words
A method of forming a silicon carbide coating on a solid substrate which method comprises decomposing in a reaction chamber, essentially simultaneously, (A) a halosilane, halodisilane, or mixture of halosilanes, in the vapor phase, wherein the halosilanes and halodisilanes used contain at least one halogen atom per molecule selected from the group consisting of fluorine, chlorine, bromine, and iodine, and ( B ) an alkyl halide or mixture of alkyl halides wherein the alkyl halides each contain at least one halogen atom per molecule selected from the group consisting of fluorine, chlorine, bromine, and iodine, in the vapor phase, in the presence of a metal catalyst and a substrate, at a temperature in the range of 400 degrees to 600 degrees Centigrade, wherein the metal catalyst is selected from the group consisting of aluminum, chromium, magnesium, stainless steel, copper and zirconium, whereby a substrate containing a coating thereon is obtained.
References Cited (Backward Citations)
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