Patent EP0220578A2 successfully refreshed from Google Patents.
EP0220578A2
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EP
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A photoresist composition and a process using that photoresist composition
Assignee: International Business Machines Corp
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Filing: 1986-10-10
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Granted: —
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Expires: 2006-10-10
Abstract
Abstract A photoresist composition comprising a matrix resin and two photoactive additives, one of which causes acceleration of dissolution upon irradiation and one of which causes deceleration of dissolution upon irradiation, the photoactive additives being such that the dissolution-accelerating additive is activated by at least one narrow bandwidth of radiation which does not activate the dissolution-decelerating additive. Self aligned multilayer or multi-level structures can be made by a process using that photoresist composition.
Inventors
- 👤 William Dinan Hinsberg
- 👤 Carlton Grant Willson
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-30 19:27
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/095; G03F7/008; G03F7/022; G03F7/0226
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
56 words
A photoresist composition comprising a matrix resin and two photoactive additives, one of which causes acceleration of dissolution upon irradiation and one of which causes deceleration of dissolution upon irradiation, the photoactive additives being such that the dissolution-accelerating additive is activated by at least one narrow bandwidth of radiation which does not activate the dissolution-decelerating additive.
Claim 2
Dependent Claim
56 words
A photoresist composition comprising a matrix resin and two photoactive additives, one of which causes acceleration of dissolution upon irradiation and one of which causes deceleration of dissolution upon irradiation, the photoactive additives being such that the dissolution-accelerating additive is activated by at least one narrow bandwidth of radiation which does not activate the dissolution-decelerating additive.
Claim 3
Dependent Claim
16 words
A photoresist composition as claimed in claim 1, wherein the matrix resin is a phenol-formaldehyde resin.
Claim 4
Dependent Claim
14 words
A photoresist composition as claimed in claim 1, wherein the matrix resin is p-hydroxystyrene.
Claim 5
Dependent Claim
16 words
A photoresist composition as claimed in any preceding claim, wherein the dissolution-accelerating additive is a diazoketone.
Claim 6
Dependent Claim
20 words
A photoresist composition as claimed in any of claims 1 to 3, wherein the dissolution-accelerating additive is a 1-oxo-2-diazonaphthoquinone-5-sulfonate ester.
Claim 7
Dependent Claim
17 words
A photoresist composition as claimed in any preceding claim, wherein the dissolution-decelerating additive is a mono-or bis-azide.
Claim 8
Dependent Claim
21 words
A photoresist composition as claimed in any of claims 1 to 5, wherein the dissolution-decelerating additive is a diazido diphenyl sulfone.
Claim 9
Dependent Claim
21 words
A photoresist composition as claimed in any of claims 1 to 5, wherein the dissolution decelerating additive is a monoaryl azide.
Claim 10
Dependent Claim
19 words
A photoresist composition as claimed in any of claims 1 to 5, wherein the dissolution-decelerating additive is an azidochalcone.
Claim 11
Dependent Claim
114 words
A process for producing self-aligned structures, the process comprising the steps of: (1) coating a substrate with photoresist composition as claimed in any preceding claim, (2) exposing said composition to radiation through a mask which has opaque areas and two types of transparent areas, one of which is opaque to the bandwidth that activates the dissolution-decelerating additive, (3) developing by treatment with a solvent, (4) transferring the resulting image to the substrate, (5) flood exposing with radiation of a bandwidth that activates the dissolution-accelerating additive but does not activate the dissolution-decelerating additive, (6) developing by treatment with a solvent, (7) transferring the image to the substrate, and (8) stripping the resist from the substrate.
Claim 12
Dependent Claim
17 words
A process as claimed in claim 10, in which the image transfer steps are done by etching.
References Cited (Backward Citations)
No citation records indexed.
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