Patent EP0214824A2 successfully refreshed from Google Patents.
EP0214824A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Manufacturing method for an optical memory element
Assignee: Sharp Corp
•
Filing: 1986-08-29
•
Granted: —
•
Expires: 2006-08-29
Abstract
Abstract A method for manufacturing an optical memory element comprising the steps of providing a substrate, disposing a resist film on the substrate, providing a photo-mask carrying a guide groove pattern on the resist film so as to position the photo-mask over a predetermined position of the substrate, forming guide groove pattern latent image on the resist film, developing the guide groove pattern latent image formed on the resist film, conducting an etching operation through the developed guide groove pattern sa as to form guide grooves in the substrate, removing the resit film from the substrate, and disposing a recording medium layer on the substrate having the guide grooves formed therein.
Inventors
- 👤 Kenji Ohta
- 👤 Junji Hirokane
- 👤 Akira Takahashi
- 👤 Tetsuya Inui
- 👤 Shohichi Katoh
- 👤 Toshihisa Daiya-Heights Deguchi
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-28 23:54
CPC Classifications
G; G11; G11B; G11B7/00; G11B7/24; G11B7/26; G11B7/261; Y; Y10; Y10S; Y10S430/00; Y10S430/136; Y10S430/146
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
110 words
A method for manufacturing an optical memory element, comprising the steps of: providing a substrate; disposing a resist film on said substrate; providing a photo-mask carrying a guide groove pattern on the resist film so as to position the photo-mask over a predetermined position of the substrate; forming guide groove pattern latent image on said resist film; developing said guide groove pattern latent image formed on said resist film; conducting an etching operation through said developed guide groove pattern so as to form guide grooves in said substrate; removing said resist film from said substrate; and disposing a recording medium layer on said substrate having said guide grooves formed therein.
Claim 2
Independent Claim
110 words
A method for manufacturing an optical memory element, comprising the steps of: providing a substrate; disposing a resist film on said substrate; providing a photo-mask carrying a guide groove pattern on the resist film so as to position the photo-mask over a predetermined position of the substrate; forming guide groove pattern latent image on said resist film; developing said guide groove pattern latent image formed on said resist film; conducting an etching operation through said developed guide groove pattern so as to form guide grooves in said substrate; removing said resist film from said substrate; and disposing a recording medium layer on said substrate having said guide grooves formed therein.
Claim 3
Dependent Claim
51 words
The method of claim 1, wherein said substrate is of disc shape having a hole in the center thereof and wherein said photo-mask has a marker of the shape corresponding to said center hole in the substrate and a pattern for guide trucks to be transcribed onto the optical memory element.
Claim 4
Dependent Claim
25 words
The method of claim 1, wherein a cut-away portion is preliminerily formed in said photo-mask at a position facing the rise of said resist film.
Claim 5
Dependent Claim
56 words
The method of claim 1, wherein the peripheral end portion of said substrate is ground to be inclined so that the rise of the resist film which is formed at the peripheral edge of the substrate when applied on the substrate is lower than the plane of the substrate portion where the guide grooves are formed.
Claim 6
Independent Claim
69 words
A method of forming a latent image in a photoresist film disposed on a surface of a substrate, in which a patterned photomask is placed in contact with the film and said film is exposed through said photomask to radiation, characterised in that a peripheral thickening of the film is accommodated within a corresponding widened portion of the gap between substrate surface and the opposed surface of the photomask.
Claim 7
Independent Claim
69 words
A method of forming a latent image in a photoresist film disposed on a surface of a substrate, in which a patterned photomask is placed in contact with the film and said film is exposed through said photomask to radiation, characterised in that a peripheral thickening of the film is accommodated within a corresponding widened portion of the gap between substrate surface and the opposed surface of the photomask.
Claim 8
Dependent Claim
27 words
A method according to claim 5 characterised in that said widened portion of the gap is formed by a recess in said opposed surface of the photomask.
Claim 9
Dependent Claim
30 words
A method according to claim 5 characterised in that said widened portion of the gap is formed by a peripheral chamfer, or like cut-away portion of the said substrate surface
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.