Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
286 words
A method for fabricating a printhead for use in an ink jet printing device, comprising the steps of: (a) cleaning first and second silicon substrates (28, 31), each having first and second parallel surfaces, the substrate surfaces being {100} planes; (b) depositing a layer (41) of insulative materials on the surfaces of the substrates; (c) forming an equally spaced, linear array of resistive material elements (34) on the first surface (30) of the first substrate (28) for use as heating elements and forming a pattern of electrodes (33) on the same substrate surface for enabling individual addressing of each heating element with current pulses; (d) photolithographically patterning the insulative layer on the first surface (44) of the second substrate (31) to produce at least one via therein for orientation dependent etching of at least one recess (45) in the second substrate bounded by {111} plane side walls; (e) forming a plurality of equally spaced, parallel grooves (48) in the first surface of the second substrate, one end of the grooves communicating with the recess (45) and the other ends of the grooves being open; (f) applying an adhesive to the insulative layer on the first surface of the second substrate; (g) aligning the first and second substrates - (28, 31) with their first surfaces confronting and contacting each other, so that each groove (48) contains a heating element (34 therein spaced a predetermined distance frorr the groove open end; and (h) curing the adhesive to bond the first ant second substrates together to form the prin thead, wherein the recess (45) serves as ar ink supplying manifold, the grooves (48) serve as capillary filled channels, and the groove open ends serve as the printhead nozzles (27).
Claim 2
Independent Claim
286 words
A method for fabricating a printhead for use in an ink jet printing device, comprising the steps of: (a) cleaning first and second silicon substrates (28, 31), each having first and second parallel surfaces, the substrate surfaces being {100} planes; (b) depositing a layer (41) of insulative materials on the surfaces of the substrates; (c) forming an equally spaced, linear array of resistive material elements (34) on the first surface (30) of the first substrate (28) for use as heating elements and forming a pattern of electrodes (33) on the same substrate surface for enabling individual addressing of each heating element with current pulses; (d) photolithographically patterning the insulative layer on the first surface (44) of the second substrate (31) to produce at least one via therein for orientation dependent etching of at least one recess (45) in the second substrate bounded by {111} plane side walls; (e) forming a plurality of equally spaced, parallel grooves (48) in the first surface of the second substrate, one end of the grooves communicating with the recess (45) and the other ends of the grooves being open; (f) applying an adhesive to the insulative layer on the first surface of the second substrate; (g) aligning the first and second substrates - (28, 31) with their first surfaces confronting and contacting each other, so that each groove (48) contains a heating element (34 therein spaced a predetermined distance frorr the groove open end; and (h) curing the adhesive to bond the first ant second substrates together to form the prin thead, wherein the recess (45) serves as ar ink supplying manifold, the grooves (48) serve as capillary filled channels, and the groove open ends serve as the printhead nozzles (27).
Claim 3
Dependent Claim
82 words
The method of Claim 1, wherein step (d) furthe comprises: photolithographically patterning the insulative laye on the second surface of the second substrate tc enable orientation dependent etching of a second recess in said second substrate bounded by {111} plane side walls, this second recess being dee f enough to penetrate the floor of the recess in the first surface of the second substrate to provide ar aperture for use as a fill hole to fill and maintain inl in said manifold.
Claim 4
Dependent Claim
25 words
The method of Claim 1, wherein the methoc further comprises providing means on each of the first and second substrates for aligning them to gether.
Claim 5
Dependent Claim
32 words
The method of Claim 3, wherein the means provided for alignment is accurately dicing twc adjacent comers on each substrate for use in align ment of the two substrates in a jig.
Claim 6
Dependent Claim
97 words
The method of Claim 3 wherein the means provided for alignment is at least two pattemed alignment marks on the first substrate first surface with the heating elements and addressing elec trodes, the alignment marks being placed at pre determined locations and at least two pattemec vias in the insulative layer on the first surface of the second substrate at predetermined locations in or der for alignment be to the etched in the seconc substrate, and wherein an infrared aligner may be used to align the two substrates by aid of the alignment marks and alignment pits.
Claim 7
Independent Claim
51 words
The method of any one of Claims 1 to 5 wherein the via patterned in step (d) is sized so that the orientation dependent etching etches en tirely through the second substrate, the open bot tom of the recess being for use as a fill hole for the subsequently formed manifold.
Claim 8
Independent Claim
108 words
The method of any one of Claims 1 to 6 wherein the grooves of step (e) are formed b) concurrent orientation dependent etching with the recess of step (d) by patterning a plurality of nar row, equally spaced, elongated vias in the insula tive layer spaced from and perpendicular to the recess via, the etched grooves being bounded by {111} plane side walls, the longer side walls converging to form grooves with a V-shaped cross-section, and wherein both ends of the grooves are diced open, so that the groove ends closer to the recess are in communication therewith and the other ends are open to serve as nozzles.
Claim 9
Independent Claim
192 words
The method of any one of Claims 1 to 6, wherein the grooves of step (e) are formed by concurrent orientation dependent etching with the recess of step (d) by patterning a plurality of relatively narrow, equally spaced, elongated vias in the insulative layer spaced from and perpendicular to the recess via, the distance between the ends of the grooves closer to the recess being shorter than the distance between the other ends of the grooves from a one of the second substrate edges, the etched grooves being bounded by {111} plane side walls, and wherein the ends of the grooves adjacent the recess are opened to the recess by first isotropic etching of the second substrate for a period of time sufficient to permit undercutting of the insulative layer between the grooves and the recess, cleaning the second substrate to stop the isotropic etching process, and then, orientation dependent etching of the second substrate a second time in order to open the grooves to the recess since the undercut region is exposed to the orientation dependent etchant, the other ends of the grooves being subsequently diced opened to form the nozzles.
Claim 10
Independent Claim
446 words
A method for fabricating a plurality of printheads, each printhead being usable in an ink jet printing device for emitting and propelling ink droplets toward a recording medium, the method comprising the steps of: (a) cleaning first and second (100) silicon wafers (28, 31), each having first and second substantially parallel surfaces; (b) depositing a layer of insulative material - (41) on the surfaces of the wafers; (c) forming a plurality of sets of equally spaced, linear arrays of resistive material elements (34) on the insulative layer on the first surface of the first wafer (28) for use as sets of heating elements, and forming a plurality of sets of addressing electrodes (33) on the same wafer surface for enabling individual addressing of each heating element with current pulse; (d) photolithographically patterning the insulative layer on the first surface of the second wafer (31) to produce a plurality of sets of vias (45, 54) of predetermined sizes and at predetermined locations thereon; (e) anisotropically etching the second wafer - (31) to produce sets of recesses (45) in its first surface, each recess being bounded by {111} plane side walls; (f) forming a plurality of sets of equally spaced, parallel grooves (48) through the first surface of the second wafer and its insulative layer each groove having a predetermined depth and first and second ends; the first ends of each set of grooves communicating with an associated one (45) of the set of recesses, the second ends of each set of grooves opening into another of the set of recesses (54); (g) applying an adhesive on the remaining unetched insulative layer of the first surface of the second wafer; (h) aligning the first and second wafers (28, 31) with their first surfaces confronting and contacting each other with the adhesive sandwiched therebetween, the alignment assuring that each groove (48) contains one of the heating elements (34) spaced a predetermined distance from the second, open, end thereof; (i) curing the adhesive to bond the first and second wafers together, so that each recess - (45) in the set of recesses communicating with a set of grooves serves as an ink supplying - manifold, while each set of grooves (48) serves as capillary filling channels, with the second, open, end of. the grooves serving as nozzles (27); and . (i) dicing the bonded wafers into a plurality of individual printheads, each printhead having a manifold (45), a set of channels (48) communicating with the manifold at one end thereof and having nozzles (27) at the other end with heating elements (34) in each a predetermined distance from the nozzles, and addressing electrodes (33) for selectively addressing the heating elements.
Claim 11
Independent Claim
446 words
A method for fabricating a plurality of printheads, each printhead being usable in an ink jet printing device for emitting and propelling ink droplets toward a recording medium, the method comprising the steps of: (a) cleaning first and second (100) silicon wafers (28, 31), each having first and second substantially parallel surfaces; (b) depositing a layer of insulative material - (41) on the surfaces of the wafers; (c) forming a plurality of sets of equally spaced, linear arrays of resistive material elements (34) on the insulative layer on the first surface of the first wafer (28) for use as sets of heating elements, and forming a plurality of sets of addressing electrodes (33) on the same wafer surface for enabling individual addressing of each heating element with current pulse; (d) photolithographically patterning the insulative layer on the first surface of the second wafer (31) to produce a plurality of sets of vias (45, 54) of predetermined sizes and at predetermined locations thereon; (e) anisotropically etching the second wafer - (31) to produce sets of recesses (45) in its first surface, each recess being bounded by {111} plane side walls; (f) forming a plurality of sets of equally spaced, parallel grooves (48) through the first surface of the second wafer and its insulative layer each groove having a predetermined depth and first and second ends; the first ends of each set of grooves communicating with an associated one (45) of the set of recesses, the second ends of each set of grooves opening into another of the set of recesses (54); (g) applying an adhesive on the remaining unetched insulative layer of the first surface of the second wafer; (h) aligning the first and second wafers (28, 31) with their first surfaces confronting and contacting each other with the adhesive sandwiched therebetween, the alignment assuring that each groove (48) contains one of the heating elements (34) spaced a predetermined distance from the second, open, end thereof; (i) curing the adhesive to bond the first and second wafers together, so that each recess - (45) in the set of recesses communicating with a set of grooves serves as an ink supplying - manifold, while each set of grooves (48) serves as capillary filling channels, with the second, open, end of. the grooves serving as nozzles (27); and . (i) dicing the bonded wafers into a plurality of individual printheads, each printhead having a manifold (45), a set of channels (48) communicating with the manifold at one end thereof and having nozzles (27) at the other end with heating elements (34) in each a predetermined distance from the nozzles, and addressing electrodes (33) for selectively addressing the heating elements.
Claim 12
Dependent Claim
60 words
The method of Claim 9, wherein step (d) further comprises: photolithographically paterning the insulative layer on the second surface of the second wafer to produce a plurality of vias therein at predetermined locations, so that at step (e), the vias in the second wafer second surface are etched anisotropically concurrently with those in the first surface of the second wafer.
Claim 13
Dependent Claim
323 words
The method of Claim 10, wherein at least two of the vias in the second surface of the second wafer are located and sized for anisotropic etching through the wafer to produce alignment openings suitable for enabling visual alignment of the second wafer with the first wafer, and wherein the remainder of the vias in the second surface of the second wafer are sized and positioned to coincide with a selected one of the vias in each set of vias on the first surface of the second wafer, in order that the anisotropic etching during step (e) produces a through-hole in each of the selected recesses of the first surface of the second wafer, this through-hole later serving as an ink filling hole.12. The method of Claim 9, wherein the step (f) of forming a plurality of sets of grooves is accomplished by patterning a plurality of sets of elongated vias in the insulative layer on the first surface of the second wafer concurrently with the patterning of the plurality of sets of vias during step (d), each set of elongated vias being located adjacent but spaced from a selected one of the vias of the set of vias of step (d) and being perpendicular to the closest edge of the selected vias, and the grooves being produced during step (e) wherein the second wafer is anisotropically etched at all locations not protected by the insulative layer to form recesses bounded by {111} plane side walls, the elongated vias being sized to produce grooves that have longer side walls which converge and make grooves with a V-shaped cross-section but that have closed ends, the closed ends of the grooves adjacent the selected recesses being opened to the selected recess by dicing prior to step (g) and the other closed end of the groove which is to serve eventually as nozzles being opened during step (j) when the plurality of individual printheads are obtained.
Claim 14
Dependent Claim
67 words
The method of Claim 12, wherein the closed ends of the grooves adjacent the selected recess are opened by isotropic etching the second wafer for a period of time sufficient to undercut the insulative layer between the grooves and its selected recess, cleaning the second wafer to remove the isotropic etch, and then anisotropic etching the second wafer again to open the grooves to its selected recess.