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EP0182121A1 Expired / Lapsed EP ⏱️ 0.0 years remaining

Semiconductor integrated circuit with CMOS gate array

Assignee: Toshiba Corp
•
Filing: 1985-10-21
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Granted: —
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Expires: 2005-10-21
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Abstract

Abstract A semiconductor integrated circuit includes p- and n-type semiconductor areas (10P and 10N) alternately arranged in a row direction, p-channel MOS transistor blocks arranged in each of the p-type semiconductor areas (10P) and each including two p-channel MOS transistors (TP11, TP12), n-channel MOS transistor blocks arranged in each of the n-type semiconductor areas (10N) and each including two n-channel MOS transistors (TN11, TN12), and p- and n-type diffusion areas (27P and 27N) formed, respectively, in each of the p-type semiconductor areas (10P) and each of the n-type semiconductor areas (10N). The MOS transistor blocks are arranged on two columns in each of the p- and n-type semiconductor areas (10P and 10N), and each of the diffusion areas (27P and 27N) is formed in a position defined by the gate electrodes of four MOS transistors (TP11, TP12, TN11, TN12) of the same channel type in the two MOS transistor blocks adjacent to each other in a row direction.

Inventors

  • 👤 Hiroaki C/O Patent Division Suzuki
  • 👤 Teruo C/O Patent Division Kobayashi

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-09 17:58
CPC Classifications
H; H10; H10D; H10D84/00; H10D84/90; H10D84/903; H10D84/907; H10D84/80; H10D84/82; H10D84/83; H10D84/85; H10D89/00; H10D89/10

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 320 words
A semiconductor integrated circuit comprising: a plurality of p- and n-type semiconductor areas (10P and 10N ) alternately arranged in a row direction; a plurality of p-channel MUS transistor blocks formed in each of said n-type semiconductor areas (10N), each of said plurality of p-channel MOS transistor blocks including a plurality of p-channel MOS transistors (TP11, TP12; Q2, Q4; Q5, Q6; Q7, Q8), arranged in a column direction, whose current paths are serially connected and whose gates are independently formed to extend in a row direction; a plurality of n-channel MOS transistor blocks formed in each of said p-type semiconductor areas (lOP), each of said plurality of n-channel MOS transistor blocks including a plurality of n-channel MOS transistors (TN11, TN12; Ql, Q3; Q9, Q10; Qll, Q12), arranged in a column direction, whose current paths are serially connected and whose gates are independently formed to extend in a row direction; and a plurality of p- and n-type regions (27P and 27N) formed, respectively, in said p- and n-type semiconductor areas (10P and 10N) , characterized in that said p-channel MOS transistor blocks (TP11, TP12; Q2, Q4; Q5, Q6; Q7, Q8) in each of said plurality of n-type semiconductor areas (10N) are arranged in a plurality of columns, said n-channel M OS transistor blocks (TN11, TN12; Ql, Q3; Q9, Q10; Qll, Q12) in each of said plurality of p-type semiconductor areas (10P) are arranged in a plurality of columns, each of said n-type regions (27N) is arranged in a position surrounded by the gate electrodes of the p-channel MOS transistors (Q2, Q4 to Q6) in two of said p-channel MOS transistor blocks adjacent to each other in a row direction, and each of said p-type regions (27P) is arranged in a position surrounded by the gate electrodes of the n-channel MOS transistors (Ql, Q3, Q9, Q10) in two of said n-channel MOS transistor blocks adjacent to each other in a row direction.
Claim 2
Dependent Claim 320 words
A semiconductor integrated circuit comprising: a plurality of p- and n-type semiconductor areas (10P and 10N ) alternately arranged in a row direction; a plurality of p-channel MUS transistor blocks formed in each of said n-type semiconductor areas (10N), each of said plurality of p-channel MOS transistor blocks including a plurality of p-channel MOS transistors (TP11, TP12; Q2, Q4; Q5, Q6; Q7, Q8), arranged in a column direction, whose current paths are serially connected and whose gates are independently formed to extend in a row direction; a plurality of n-channel MOS transistor blocks formed in each of said p-type semiconductor areas (lOP), each of said plurality of n-channel MOS transistor blocks including a plurality of n-channel MOS transistors (TN11, TN12; Ql, Q3; Q9, Q10; Qll, Q12), arranged in a column direction, whose current paths are serially connected and whose gates are independently formed to extend in a row direction; and a plurality of p- and n-type regions (27P and 27N) formed, respectively, in said p- and n-type semiconductor areas (10P and 10N) , characterized in that said p-channel MOS transistor blocks (TP11, TP12; Q2, Q4; Q5, Q6; Q7, Q8) in each of said plurality of n-type semiconductor areas (10N) are arranged in a plurality of columns, said n-channel M OS transistor blocks (TN11, TN12; Ql, Q3; Q9, Q10; Qll, Q12) in each of said plurality of p-type semiconductor areas (10P) are arranged in a plurality of columns, each of said n-type regions (27N) is arranged in a position surrounded by the gate electrodes of the p-channel MOS transistors (Q2, Q4 to Q6) in two of said p-channel MOS transistor blocks adjacent to each other in a row direction, and each of said p-type regions (27P) is arranged in a position surrounded by the gate electrodes of the n-channel MOS transistors (Ql, Q3, Q9, Q10) in two of said n-channel MOS transistor blocks adjacent to each other in a row direction.
Claim 3
Dependent Claim 45 words
A semiconductor integrated circuit according to claim 1, characterized in that the number of the MOS transistors (TP11, TP12; TN11, TN12; Ql, Q3; Q2, Q4; Q5, Q6; Q7, Q8; Q9, Q10; Qll, Q12) in each of said p- and n-channel MOS transistor blocks is 2.
Claim 4
Dependent Claim 38 words
A semiconductor integrated circuit according to claim 1 or 2, characterized in that the number of columns on which said MOS transistor blocks are arranged in each of said p- and n-type semiconductor areas (10P, 10N) is 2.
Claim 5
Dependent Claim 40 words
A semiconductor integrated circuit according to claim 1, 2 or 3, characterized in that each of said MOS transistors (TP11, TP12, TN11, TN12, Q1 to Q12) is formed to have a current path whose width is equal to four grids.

References Cited (Backward Citations)

EP0090704A1 Cited
EP0119059A2 Cited

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