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EP0175369A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Semiconductor radiation detector

Assignee: Fuji Electric Co Ltd
•
Filing: 1985-09-19
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Granted: —
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Expires: 2005-09-19
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Abstract

Abstract A semiconductor device for detecting incident gammaradia- tion wherein the output from the device is relatively independent of the energy of the incident radiation. The device includes a semiconductor substrate having a depletion layer formed therein by an applied voltage. The depletion layer is shaped such that it includes a plurality of elongated projections within a plane parallel to the surface of the substrate. The minimum distance between the edge of the substrate and the outer extent of the depletion layer is substantially equal to the average range of mobility of secondary electrons created by the gamma rays having the highest energy of the gamma-rays to be detected. The device further includes means for counting the current pulses generated in the depletion layer by secondary electrons created by the incident gamma rays.

Inventors

  • 👤 Noritada Fuji Electric Corporate Research Sato
  • 👤 Toshikazu Fuji Electric Company Ltd. Suzuki
  • 👤 Yasukazu Fuji Electric Corporate Research Seki

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-08 05:47
CPC Classifications
G; G01; G01T; G01T1/00; G01T1/16; G01T1/24; G01T1/241; H; H10; H10F; H10F30/00; H10F30/20; H10F30/29; H10F30/295; H10F30/2955; H10F77/00; H10F77/10; H10F77/14; H10F77/148; Y; Y02; Y02E; Y02E10/00; Y02E10/50

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 127 words
A semiconductor device for detecting incident gamma radiation, said device comprising: a semiconductor substrate; means for producing a depletion layer in said substrate by applying a voltage to separate surfaces of said substrate, said depletion layer being shaped such that it includes a plurality of elongated projections within a plane parallel to the surface of said substrate, the minimum distance between the edge of said substrate and the outer extent of said depletion layer being substantially equal to the average range of mobility of secondary electrons created by the gamma-rays having the highest energy of the gamma-rays to be detected; and means for counting current pulses due to electron-hole pairs generated in said depletion layer by secondary electrons created by interactions between gamma-rays incident on said substrate.
Claim 2
Dependent Claim 127 words
A semiconductor device for detecting incident gamma radiation, said device comprising: a semiconductor substrate; means for producing a depletion layer in said substrate by applying a voltage to separate surfaces of said substrate, said depletion layer being shaped such that it includes a plurality of elongated projections within a plane parallel to the surface of said substrate, the minimum distance between the edge of said substrate and the outer extent of said depletion layer being substantially equal to the average range of mobility of secondary electrons created by the gamma-rays having the highest energy of the gamma-rays to be detected; and means for counting current pulses due to electron-hole pairs generated in said depletion layer by secondary electrons created by interactions between gamma-rays incident on said substrate.
Claim 3
Dependent Claim 21 words
The device of claim 1, further comprising electrodes on said separate surfaces of said substrate to which said voltage is applied.
Claim 4
Dependent Claim 30 words
The device of claim 1 wherein said substrate consists essentially of silicon including a p-n junction, and said depletion layer is formed adjacent said p-n junction in said silicon substrate.
Claim 5
Dependent Claim 18 words
The device of claim 1 wherein said elongated projections emanate radially from a central portion of said substrate.
Claim 6
Dependent Claim 23 words
The device of claim 1 wherein said elongated projections are substantially parallel to one another and emanate from an elongated linear central position.
Claim 7
Dependent Claim 23 words
The device of claim 1 wherein said semiconductor substrate comprises an amorphous semiconductor film formed on a single crystal portion of said substrate.

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