Magnetron sputter etching system

Claim 2

A magnetron etching device, comprising in combination, a low pressure gas chamber for positioning an object having a surface to be etched; means for creating an RF field between said surface to be etched and a collector surface means; a magnetic source connected to a means for moving the magnetic source with respect to the object to be etched, such that the lines of magnetic flux created move above the etch surface of the object to be etched; whereby the etched material may be transferred from the object to the collector surface means and the motion of the magnetic source can etch the object uniformly.

Claim 3

The device of claim 1 further including, a plurality of magnetic sources, each of which is movable relative to the surface to be etched.

Claim 4

The device of claim 1 wherein: the means for moving the magnetic source include means for moving the magnetic source in random.

Claim 5

The device of claim 1 wherein: the means for moving the magnetic source include means for moving the magnetic source in a circular path.

Claim 6

The device of claim 1 wherein: the object having a surface to be etched is a disk.

Claim 7

The device of claim 1 wherein: the magnetic source is a plurality of permanent magnets radially oriented within a magnetically permeable ring encased in stainless steel and connected to a drive shaft driven by vanes adapted to be struck by a flow of coolant to cause the eccentric rotation of said magnetic source.

Claim 8

The device of claim 1 wherein: said object to be etched comprises a pair of planar substrates oriented in substantially parallel planes with said magnetic source intermediate to and in a parallel plane with said planar substrates

Claim 9

The device of claim 7 wherein: more than one pair of said substrates and magnetic source associated herewith may be located within said low pressure inert gas chamber.

Claim 10

The device of claim 1 wherein: said means for moving the magnetic source causes translational motion of said magnetic source.

Claim 11

A planar magnetron etching device comprising, in combination: a plurality of magnetic means; means for receiving the plurality of magnetic means and moving the magnetic means; a substrate supported in a parallel plane below the magnet means; means for applying an RF potential to said substrate; a process chamber in which the substrate is located; means for evacuating the process chamber; and means for injecting an inert gas into the process chamber whereby the magnetic means may be moved over the substrate to cause the lines of magnetic flux parallel to the surface of the substrate to move over the surface of the substrate at the same time the RF potential is applied in a low pressure environment of the inert gas, and the substrate may be uniformly etched.

Claim 12

A planar magnetron etching device comprising, in combination: a plurality of magnetic means; means for receiving the plurality of magnetic means and moving the magnetic means; a substrate supported in a parallel plane below the magnet means; means for applying an RF potential to said substrate; a process chamber in which the substrate is located; means for evacuating the process chamber; and means for injecting an inert gas into the process chamber whereby the magnetic means may be moved over the substrate to cause the lines of magnetic flux parallel to the surface of the substrate to move over the surface of the substrate at the same time the RF potential is applied in a low pressure environment of the inert gas, and the substrate may be uniformly etched.

Claim 13

The device of claim 10 wherein: the means for moving the magnetic means is a hydraulic pressure source positioned to act on a multi-vane.

Claim 14

The device of claim 10 wherein: the means for moving the magnetic means is an electric motor.

Claim 15

The device of claim 10 wherein: the magnetic means includes a plurality of permanent magnets arranged as radial spokes within a retaining ring.

Claim 16

The device of claim 10 wherein: the permanent magnets are arranged with alternating poles towards a center of the retaining ring.