Patent EP0167703A2 successfully refreshed from Google Patents.
EP0167703A2
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A method of homogeneous chemical vapour deposition
Assignee: International Business Machines Corp
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Filing: 1985-02-22
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Granted: —
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Expires: 2005-02-22
Abstract
Abstract In a method of homogeneous chemical vapour deposition in which first (22) and second (20) gases are intermixed at a location (28) in the vicinity of a cool substrate (14) onto which a material is to be deposited, the first gas contains at least one constituent of the material to be deposited and is at a temperature less than its pyrolysis temperature and the second gas is heated (18) to a sufficiently high temperature that the intermixing of the gases causes the first gas to decompose.
Inventors
- 👤 Bernard Steele Meyerson
- 👤 Richard Michael Plecenik
- 👤 Bruce Albert Scott
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-28 09:13
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45563; C23C16/4557; C23C16/45514; C23C16/4558; C30; C30B; C30B25/00; C30B25/02; C30B25/14
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
78 words
A method of homogeneous chemical vapour deposition comprising intermixing first and second gases at a location in the vicinity of a cool substrate onto which a material is to be deposited, the first gas containing at least one constituent of the material to be deposited and being at a temperature less than its pyrolysis temperature and the second gas being heated to a sufficiently high temperature that the intermixing of the gases causes the first gas to decompose.
Claim 2
Independent Claim
78 words
A method of homogeneous chemical vapour deposition comprising intermixing first and second gases at a location in the vicinity of a cool substrate onto which a material is to be deposited, the first gas containing at least one constituent of the material to be deposited and being at a temperature less than its pyrolysis temperature and the second gas being heated to a sufficiently high temperature that the intermixing of the gases causes the first gas to decompose.
Claim 3
Dependent Claim
14 words
A method as claimed in claim 1, in which the first gas contains silicon.
Claim 4
Dependent Claim
24 words
A method as claimed in claim 1 or claim 2, in which the second gas contains a constituent of the material to be deposited.
Claim 5
Dependent Claim
14 words
A method as claimed in claim 3, in which the second gas contains oxygen.
Claim 6
Dependent Claim
14 words
A method as claimed in claim 3, in which the second gas contains nitrogen.
Claim 7
Dependent Claim
19 words
A method as claimed in claim 5, in which the second gas contains N0 2 or NH 3 .
Claim 8
Dependent Claim
26 words
A method as claimed in claim 1 or claim 2, in which the second gas does not decompose when the first and second gases are intermixed.
Claim 9
Dependent Claim
20 words
A method as claimed in claim 7, in which the second gas comprises He, Ne, N, H, Ar, or Xe.
Claim 10
Independent Claim
20 words
A method as claimed in any preceding claim, in which said location is between 1mm and 10cm from the substate.
Claim 11
Dependent Claim
86 words
Apparatus for homogeneous chemical vapour deposition comprising means (30) for delivering a first gas containing at least one constituent of a material to be deposited to a location (28) in the vicinity of a substrate(14) and means (12) for delivering a second gas - 0 said location so that the gases intermix at said location, the apparatus being characterised by further comprising means (18) for heating the second gas to a sufficiently high temperature that the intermixing of the gases causes the first gas to decompose.
Claim 12
Dependent Claim
86 words
Apparatus for homogeneous chemical vapour deposition comprising means (30) for delivering a first gas containing at least one constituent of a material to be deposited to a location (28) in the vicinity of a substrate(14) and means (12) for delivering a second gas - 0 said location so that the gases intermix at said location, the apparatus being characterised by further comprising means (18) for heating the second gas to a sufficiently high temperature that the intermixing of the gases causes the first gas to decompose.
Claim 13
Dependent Claim
25 words
Apparatus as claimed in claim 10, which includes cooling means to maintain the substrate at a temperature below the pyrolysis temperature of the first gas.
Claim 14
Dependent Claim
34 words
Apparatus as claimed in claim 10 or claim 11,in which the means for delivering the second gas comprises a tube and the means for heating the second gas comprises a furnace surrounding the tube.
Claim 15
Dependent Claim
35 words
Apparatus as claimed in claim 10 or claim 11, which includes a chamber having separate entry ports for the first and second gases and baffle means (42) for separately delivering the gases to said location.
Claim 16
Dependent Claim
40 words
Apparatus as claimed in claim 12 or claim 13, which is so arranged that the gases are delivered to a plurality of separate locations at which they are intermixed whereby material can be simultaneously deposited on a plurality of substrates.
References Cited (Backward Citations)
No citation records indexed.
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