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Depletion mode thin film semiconductor photodetectors

Assignee: Xerox Corp
•
Filing: 1985-06-12
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Granted: —
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Expires: 2005-06-12
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Abstract

Abstract A depletion mode thin film semiconductor photodetector (10) comprises a crystalline silicon thin film (13) on an insulating substrate (12) with a source region (26), a drain region (28) and a thin film light sensing channel region (14,16) formed therebetween. A gate oxide (20) is formed over the channel region and a gate electrode (22) is formed on the gate oxide. A p-n junction (15) is located parallel to the surface of the substrate and within the thin film functioning as a space charge separation region in the channel. The lower portion (14) of the channel region is a p region extending to the substrate and the upper portion (16) of the channel region is a n region extending to the gate oxide. The channel region functions as a fully depleted channel when the photodetector is operated in its OFF state providing for high dynamic range and large photocurrent operation. With n + source and drain regions functioning as ohmic contacts to the channel n region the device is a thin film transistor photodetector which has high photoconductive gain at low light intensities when the n channel region is fully pinched off by an applied gate voltage to the gate electrode which is sufficiently negative as compared to the threshold voltage of the photodetector. When the drain region (28) is replaced by a p + region functioning as an ohmic contact to the channel p region, a depletion mode gated diode is formed (see Figure 7). When the channel region is extended to include a plurality of linearly spaced gate electrodes (22A, 22',228) formed on the gate oxide region with an input diode (lD) formed adjacent to the first of such gate electrodes (22A) and an output diode (OD) formed adjacent to the last of such gate electrodes (228) the photodetector functions as a charge coupled device (see Figure 8).

Inventors

  • 👤 Anne Chiang
  • 👤 Noble M. Johnson

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-08 18:39
CPC Classifications
H; H10; H10F; H10F30/00; H10F30/20; H10F30/21; H10F30/28; H10F30/282

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 133 words
. A depletion mode thin film semiconductor photodetector comprising a crystalline silicon thin film on an insulating substrate, with first and second regions and a thin film light sensing channel region formed therebetween, a gate oxide formed over said channel region, a gate electrode formed on said gate oxide, a p-n junction located parallel to the surface of said substrate and within said thin film and functioning as a space charge separation region therein, the lower portion of said channel region being a p region extending to said substrate and the upper portion of said channel region being an n region extending to said gate oxide, said channel region functioning as a fully depleted channel when said photodetector is operated in its OFF state providing for high dynamic range and large photocurrent operation.
Claim 2
Dependent Claim 133 words
. A depletion mode thin film semiconductor photodetector comprising a crystalline silicon thin film on an insulating substrate, with first and second regions and a thin film light sensing channel region formed therebetween, a gate oxide formed over said channel region, a gate electrode formed on said gate oxide, a p-n junction located parallel to the surface of said substrate and within said thin film and functioning as a space charge separation region therein, the lower portion of said channel region being a p region extending to said substrate and the upper portion of said channel region being an n region extending to said gate oxide, said channel region functioning as a fully depleted channel when said photodetector is operated in its OFF state providing for high dynamic range and large photocurrent operation.
Claim 3
Dependent Claim 84 words
The depletion mode thin film semiconductor photodetector of claim 1 in the form of a thin film transistor, wherein said first and second regions are n + source and drain regions functioning as ohmic contacts to said channel n region forming a thin film transistor, said photodetector having high photoconductive gain at low light intensities when said n channel region is fully pinched off by an applied gate voltage to said gate electrode sufficiently negative as compared to the threshold voltage of said photodetector.
Claim 4
Dependent Claim 91 words
The depletion mode thin film semiconductor photodetector of claim 1 in the form of a charge coupled device, wherein said first and second regions are source and drain regions and wherein said channel region is extended to include a plurality of linearly spaced gate electrodes formed on said gate oxide forming a plurality of spaced photodetectors, comprising an input diode formed over said source region and adjacent to the first of said gate electrodes, and an output diode formed over said drain region adjacent to the last of said gate electrodes.
Claim 5
Dependent Claim 55 words
The depletion mode thin film semiconductor photodetector of claim 1, wherein one of the first and second regions is an n+ region functioning as an ohmic contact to said channel n region and the other of said first and second regions is a p+ region functioning as an ohmic contact to said channel p region.
Claim 6
Dependent Claim 31 words
The depletion mode thin film semiconductor photodetector of any preceding claim wherein said lower portion channel region is doped n type and said upper portion channel region is doped p type.
Claim 7
Dependent Claim 17 words
The depletion mode thin film semiconductor photodetector of any preceding claim wherein said gate region is semi-transparent.
Claim 8
Dependent Claim 17 words
The depletion mode thin film semiconductor photodetector of any preceding claim wherein said insulating substrate is transparent.
Claim 9
Dependent Claim 37 words
The depletion mode thin film semiconductor photodetector of any preceding claim wherein the acceptor and donor concentrations and profiles are chosen to permit photoconduction in said channel region with said channel region fully depleted in the dark.
Claim 10
Dependent Claim 39 words
The depletion mode thin film semiconductor photodetector of any preceding claim wherein the acceptor and donor concentrations respectively in said channel p region and said channel n region are in the range from 10 16 /cm 3 to 1018/cm3.
Claim 11
Dependent Claim 28 words
The depletion mode thin film semiconductor photodetector of any preceding claim wherein the thickness of said channel region is in the range of 0.3 µm to 50 µm.

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