Patent EP0158972A2 successfully refreshed from Google Patents.
EP0158972A2
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Method and apparatus for the vaporisation of a material in a vacuum chamber by an arc discharge
Assignee: Plasco Dr Ehrich Plasma Coating GmbH
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Filing: 1985-04-11
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Granted: —
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Expires: 2005-04-11
Abstract
Abstract For the vaporisation of material in vacuo or at a low gas pressure by electron bombardment from a vacuum arc discharge, using a cathode and anode, it is proposed that… a) to obtain a spontaneous discharge, the electrons are generated in the cathode spots of a vacuum arc discharge and… b) the electrons of the discharge vaporise the anode or a part of the anode and thus essentially generate the arc medium for maintaining a spontaneous self-sustaining arc discharge. …<IMAGE>…
Inventors
- 👤 Horst Dipl.-Phys. Dr. Ehrich
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-08 02:13
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32055; C; C23; C23C; C23C14/00; C23C14/04; C23C14/046; C23C14/22; C23C14/24; C23C14/32; C23C14/325; H01J37/30; H01J37/305; H01J37/3053
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