Patent EP0154980A1 successfully refreshed from Google Patents.
EP0154980A1
Expired / Lapsed
EP
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Negative working light-sensitive lithographic plate requiring no dampening solution and plate making process
Assignee: Fujifilm Holdings Corp
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Filing: 1985-03-12
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Granted: —
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Expires: 2005-03-12
Abstract
Abstract A negative working light-sensitive lithographic plate requiring no dampening solution and a plate making process are described. The negative working light-sensitive lithographic plate comprises a support and, in sequence, on said support, (A) a light-sensitive layer containing (1) an o-quinonediazide compound and (2) a coupling component which causes a diazo coupling reaction under a basic environment, and (B) a silicone rubber layer. The plate making process comprises imagewise exposing the negative working light-sensitive lithographic plate and developing said exposed plate to obtain a lithographic plate requiring no dampening solution, whereby a step of processing with base is carried out after imagewise exposure.
Inventors
- 👤 Hiroshi Takahashi
- 👤 Yasuhisa Narutomi
- 👤 Yoshimasa Aotani
- 👤 Keisuke Shiba
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-05 08:55
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/0226; G03F7/075; G03F7/0752
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
53 words
A negative working light-sensitive lithographic plate requiring no dampening solution, comprising a support and, in sequence, on said support (A) a light-sensitive layer containing (1) an o-quinonediazide compound and (2) a coupling component which causes a diazo coupling reaction with said o-quinonediazide compound under a basic environment, and (B) a silicone rubber layer.
Claim 2
Dependent Claim
53 words
A negative working light-sensitive lithographic plate requiring no dampening solution, comprising a support and, in sequence, on said support (A) a light-sensitive layer containing (1) an o-quinonediazide compound and (2) a coupling component which causes a diazo coupling reaction with said o-quinonediazide compound under a basic environment, and (B) a silicone rubber layer.
Claim 3
Dependent Claim
44 words
The negative working light-sensitive lithographic plate as claimed in Claim 1, wherein said o-quinonediazide compound is selected from an o-quinonediazide sulfonic acid ester obtained by condensing with a hydroxy group containing compound or an o-quinonediazide sulfonic acid amide obtained by condensing with an amine.
Claim 4
Dependent Claim
55 words
The negative working light-sensitive lithographic plate of Claim 1 or 2, wherein said coupling compo- nen is employed in such an amount that the amount of coupling residue thereof is in the range of 0.05 to 10 equivalents, preferably 0.1 to 1.0 equivalent , per equivalent of the o-quinonediazide compound contained in the light-sensitive layer.
Claim 5
Dependent Claim
73 words
The negative working light-sensitive lithographic plate of any of Claims 1 to 3, wherein said silicone rubber layer is composed of a linear organopolysiloxane having the following repeating unit as a main component: wherein n is an integer of 1 or more, and R 1 is an alkyl group having 1 to 10 carbon atoms, an alkenyl group or a phenyl group, and 60% or more of R 1 is a methyl group.
Claim 6
Dependent Claim
50 words
The negative working light-sensitive lithographic plate of any of Claims 1 to 4, wherein the thickness of said light-sensitive layer is in the range of 0.5 to 3 µm and that of the silicone rubber layer is in the range of 0.5 to 10 µm, preferably 1.0 to 3.0 µm.
Claim 7
Dependent Claim
50 words
A plate making process which comprises imagewise exposing a negative working light-sensitive lithographic plate according to any one of Claims 1 to 5 and developing said exposed plate to obtain a lithographic plate requiring no dampening solution, wherein a step of processing with base is carried out after imagewise exposure.
References Cited (Backward Citations)
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