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EP0154078A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Plasma treatment apparatus

Assignee: Toshiba Corp
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Filing: 1984-10-29
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Granted: —
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Expires: 2004-10-29
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Abstract

Abstract A plasma treatment apparatus is disclosed in which a sample (100) is placed on a cathode (24) held in an etching chamber (34) which is filled with CF4 gas with a pressure of about 10<-><2> torr. A high frequency voltage is applied between the cathode (24) and anode (20) to produce a plasma. A magnetic field having a component perpendicularly intersecting an electric field is generated above the cathode (24) by a magnetic field generator (60). A magnetic core (62) involved in the magnetic field generator has a combed cross section and is comprised of a plurality of coils (70). Every third coil is connected together to form three groups of coils. The three groups (72, 74, 76) of coils are respectively connected to the terminals of a 3-phase AC power source (82) having different phases. A high density plasma region is produced by a magnetic field. The electrons constituting the plasma are made to present a cycloid movement by the magnetic field, and generate a large number of ions upon collision with the molecules of CF4 gas. Since the magnetic field is shifted along the surface of the cathode (24), the sample (100) set on the cathode is uniformly etched by being evenly affected by a high density plasma region.

Inventors

  • 👤 Haruo C/O Patent Division Okano
  • 👤 Yasuhiro C/O Patent Division Horiike
  • 👤 Teruo C/O Patent Division Azukizawa
  • 👤 Mimpei C/O Patent Division Morishita

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-07 12:04
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3411; H01J37/345; H01J37/3458; H01J37/3402; H01J37/3405; H01J37/3408

Claims Analysis

Total Claims: 14
Claim 1
Independent Claim 176 words
A plasma treatment apparatus for treating a sample by ionizing an excited gas which comprises: a housing (20, 120) having a chamber (34) therein; an anode (20, 120); a cathode (24, 132) which faces said anode in said chamber with the sample (100) placed between said cathode and anode; means (38) for introducing a gas to be activated in the chamber (34); means (43) for impressing a high frequency power between said anode and cathode to generate an electric field therebetween for producing a plasma; characterized by further comprising magnetic field-generating means (60) for providing a magnetic field movable on the sample (100), said magnetic field-generating means (60) being comprised of a magnetic core (62) involving a plurality of magnetic pole sections (64) arranged in a first direction (1) which is along the surface of the cathode, a plurality of coils (70) provided to the magnetic core to generate on the sample a magnetic field having a component perpendicularly intersecting said electric field, and means (82) for supplying said coils with alternative currents having different phases.
Claim 2
Dependent Claim 176 words
A plasma treatment apparatus for treating a sample by ionizing an excited gas which comprises: a housing (20, 120) having a chamber (34) therein; an anode (20, 120); a cathode (24, 132) which faces said anode in said chamber with the sample (100) placed between said cathode and anode; means (38) for introducing a gas to be activated in the chamber (34); means (43) for impressing a high frequency power between said anode and cathode to generate an electric field therebetween for producing a plasma; characterized by further comprising magnetic field-generating means (60) for providing a magnetic field movable on the sample (100), said magnetic field-generating means (60) being comprised of a magnetic core (62) involving a plurality of magnetic pole sections (64) arranged in a first direction (1) which is along the surface of the cathode, a plurality of coils (70) provided to the magnetic core to generate on the sample a magnetic field having a component perpendicularly intersecting said electric field, and means (82) for supplying said coils with alternative currents having different phases.
Claim 3
Dependent Claim 47 words
The plasma treatment apparatus according to claim 1, characterized in that said magnetic core (62) comprises a base (66), the magnetic pole sections (64) are spatially erected on said base, and the section of said magnetic core which extends in the first direction presents a combed pattern.
Claim 4
Dependent Claim 71 words
The plasma treatment apparatus according to claim 2, characterized in that the coils (70) are so wound as to surround three magnetic poles, every third coil is connected together to form first (72), second (74) and third (76) groups, the AC supplying means (82) is of the 3-phase type, and the first, second and third groups of coils are respectively connected to the corresponding different phases of said 3-phase AC source.
Claim 5
Dependent Claim 48 words
The plasma treatment apparatus according to claim 3, characterized by comprising a switch (80) connected between the first (72), second (74) and third (76) groups of coils and AC supplying means to change the phase of the current supplied to said first, second and third groups of coils.
Claim 6
Dependent Claim 51 words
The plasma treatment apparatus according to claim 4, characterized in that that portion of the magnetic core which extends in the first direction (1) and that section of said magnetic core which extends in a second direction (3) perpendicularly intersecting said first direction have a greater length than the sample (100).
Claim 7
Dependent Claim 39 words
The plasma treatment apparatus according to claim 5, characterized in that said housing (-20) comprises a magnetic field-generating chamber (36) separated from said chamber (34), and said magnetic field-generating means (60) is set in said magnetic field generating chamber.
Claim 8
Dependent Claim 30 words
The plasma treatment apparatus according to claim 5, characterized in that said magnetic field generating means (60) is evacuated to a pressure which is not higher than the atmospheric level.
Claim 9
Dependent Claim 35 words
The plasma treatment apparatus according to claim 5, characterized by comprising Helmholtz type coils (112, 114) provided near the cathode (24) to generate a magnetic field extending in parallel with the surface of the cathode.
Claim 10
Dependent Claim 35 words
The plasma treatment apparatus according to claim 5, characterized by comprising magnetic members (130) embedded ahead and behind of the sample (100) as viewed from the first direction (1) in which said sample is set.
Claim 11
Dependent Claim 36 words
The plasma treatment apparatus according to claim 5, characterized in that the cathode (132) and the magnetic core base respectively have an endless pattern, and a plurality of samples (100) are placed on said endless-shaped cathode.
Claim 12
Dependent Claim 28 words
The plasma treatment apparatus according to claim 1, characterized in that an excited gas produces ions, and said ions etch the sample (100) placed on the cathode (24).
Claim 13
Dependent Claim 30 words
The plasma treatment apparatus according to claim 1, characterized in that a film is formed on the surface of the sample (100) by the vapor growth of said excited gas.
Claim 14
Dependent Claim 39 words
The plasma treatment apparatus according to claim 1, characterized in that ions are sputtered on the target placed on the cathode (24), thereby causing the target-constituting material to be released on the sample (100) set on the anode (20).

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