§
Luxuse
Patent Intelligence
Sign In
Patent EP0145973A2 successfully refreshed from Google Patents.
← Back to Patent Explorer
EP0145973A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Positive photoresist stripping composition

Assignee: Hmc Patents Holding Co Inc
•
Filing: 1984-11-16
•
Granted: —
•
Expires: 2004-11-16
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract Piperazine containing positive photoresist strippin compositions are provided. Formulations include N aminoalkylpiperazines with the formula bis-N-aminoalkylpiperazines of the formula N-hydroxyalkylpiperazine of the formula and bis-hydroxyalkylpiperazines with structure In the above formulae n = 1-6. Also included are piperazine derivatives such as those of the above formulae with a branch chain alkyl of 1-6 C atoms, and 5-6 C atom cycloalkyl substituted compounds wherein the cycloalkyl is substituted for -(CH 2 ) n - Components which may be mixed with the above described piperazine in preparing the positive photoresist stripping compositions of the invention include alkyl or cycloalkyl-2-pyrrolidones of the formula Other amide type solvents with the boiling point in excess of 200°C as well as high boiling diethylene glycol ethers may also be incorporated.

Inventors

  • 👤 Evan Gower Thomas
  • 👤 Edmund Walter Smalley
  • 👤 Kane David Cook

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-04 08:06
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/425

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 161 words
A stripping composition for removing an organic positive photoresist composition from the surface of a substrate containing such photoresist comprising (a) from 10% to 100% of at least one piperazine selected from the group consisting of piperazines of the formula bis-N-aminoalkylpiperazines of the formula N-hydroxyalkylpiperazine of the formula and bis-hydroxyalkypiperazines with structure In the above formulae n = 1-6. Also included are piperazine derivatives such as those of the above formulae with a branch chain alkyl of 1-6 C atoms, and 5-6 C atom cycloalkyl substituted compounds wherein the cycloalkyl is substituted for -(CH 1 ) n - and (b) an alkyl-or cycloalkyl-2-pyrvolidone of the formula where R is an alkyl group of 1-6 carbon atoms or a 5 or 6 member cycloalkyl, and including aminoalkyl and hydroxyalkyl of 1-6 carbon atoms or a polar organic component which is compatible with and substantial miscible in (a) in amounts of from about 90 percent by weight to about 0 percent by weight.
Claim 2
Dependent Claim 15 words
The stripping composition of claim 1 wherein (a) comprises a blend of N-aminoethylpiperazine and N-hydroxyethylpiperazine.
Claim 3
Dependent Claim 64 words
The stripping composition of claim 1 wherein (b) is selected from the group consisting of an alkyl or cycloalkyl-2-pyyrolidone of the formula where R is an alkyl group of 1 - 6 carbon atoms; aminoalkyl-N-pyrrolidones and hydroxyalkyl-2-pyrrolidones where the alkyl group comprises 1-6 carbon atoms; monoethyl ether of diethylene ylycol, monobutyl ether of diethylene glycol, monohexyl ether of diethylene glycol formylmorpholine and mixtures thereof.
Claim 4
Dependent Claim 12 words
The stripping composition of claim 2 wherein the (b) component comprises N-methyl-2-pyrrolidone.
Claim 5
Dependent Claim 47 words
The stripping composition of claim 2 wherein (a) comprises a blend of N-aminoethylpiperazine and N -hydroxyethylpiperazine in a ratio respectively of 1:1 to about 10:1 in an amount of about 30 percent by weight and (b) comprises N-methyl-2-pyrrolidone in an amount ot about 70 percent by weight.
Claim 6
Dependent Claim 44 words
A method of stripping positive photoresist trom a substrate surface having a layer of said photoresist applied thereon comprising contacting the photoresist layer with the composition of claim 1 at a temperature between about 15°C and about 160°C until said photoresist is substantially removed.

References Cited (Backward Citations)

No citation records indexed.

USPTO Annuity & Maintenance Windows

Maintenance schedule is calculated for granted US utility patents.

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag